公开(公告)号：US20040137243A1

公开(公告)日：2004-07-15

申请号：US10689820

申请日：2003-10-21

申请人： Massachusetts Institute of Technology

发明人： Karen K. Gleason ,  Daniel D. Burkey

IPC分类号： H05H001/24 ,  B32B005/22

CPC分类号： H01L21/02126 ,  C23C16/401 ,  H01L21/02118 ,  H01L21/02203 ,  H01L21/02216 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/31695 ,  Y10T428/249953 ,  Y10T428/31663

摘要： Methods are disclosed for fabricating organosilicate glass (OSG) films that have both a low dielectric constant and superior mechanical strength are disclosed. Cyclic siloxane OSG precursors, such as 1,3,5-trivinyl-1,3,5-trimethylcyclotrisiloxane (V3D3), are used in conjunction with a mild oxidant to partially oxidize the cyclic structures leading to the formation of silanol groups. The silanol groups can be subsequently condensed to form a porous OSG film.

摘要翻译： 公开了用于制造具有低介电常数和优异的机械强度的有机硅酸盐玻璃（OSG）膜的方法。 环状硅氧烷OSG前体，例如1,3,5-三乙烯基-1,3,5-三甲基环三硅氧烷（V3D3）与温和氧化剂结合使用以部分氧化导致形成硅烷醇基团的环状结构。 硅烷醇基团可以随后冷凝以形成多孔OSG膜。

公开(公告)号：US20040121085A1

公开(公告)日：2004-06-24

申请号：US10327467

申请日：2002-12-20

发明人： Shulin Wang ,  Errol Antonio C. Sanchez ,  Aihua Chen

IPC分类号： H05H001/24 ,  C23C016/22

CPC分类号： H01L21/0217 ,  C23C16/34 ,  C23C16/345 ,  C23C16/56 ,  H01L21/022 ,  H01L21/02271 ,  H01L21/0234 ,  H01L21/3003 ,  H01L21/3185 ,  H01L29/665 ,  H01L29/6659

摘要： A method of forming a silicon nitride film is described. According to the present invention, a silicon nitride film is deposited by thermally decomposing a silicon/nitrogen containing source gas or a silicon containing source gas and a nitrogen containing source gas at low deposition temperatures (e.g., less than 550null C.) to form a silicon nitride film. The thermally deposited silicon nitride film is then treated with hydrogen radicals to form a treated silicon nitride film.

摘要翻译： 描述形成氮化硅膜的方法。 根据本发明，通过在低沉积温度（例如，低于550℃）下热分解含硅/氮的源气体或含硅源气体和含氮源气体来沉积氮化硅膜，以形成 氮化硅膜。 然后用氢自由基处理热沉积的氮化硅膜，以形成经处理的氮化硅膜。

公开(公告)号：US20040040460A1

公开(公告)日：2004-03-04

申请号：US10362783

申请日：2003-02-25

发明人： Wolfgang Frei ,  Andreas Ihme ,  Thomas Walther ,  Rainer Gebhardt

IPC分类号： B41F023/04 ,  H05H001/24

CPC分类号： B41F23/08

摘要： A method and apparatus for coating printed products, wherein the products are initially printed in at least one printing process and are provided with a layer that covers the printing ink on the printed product immediately thereafter in at least one coating process. According to the invention, a corona treatment device is arranged between the final printing station and a device for coating the printing products for subjecting the printing ink on the printing product to a corona treatment immediately after the printing process such that UV varnish can be directly applied onto the printing inks without the requirement of additional printing processes.

摘要翻译： 一种用于涂覆印刷产品的方法和装置，其中产品最初被印刷在至少一个印刷工艺中，并且在至少一个涂布工艺中立即在其后立即覆盖印刷产品上的印刷油墨层。 根据本发明，电晕处理装置设置在最终印刷站和用于涂布印刷产品的装置之间，用于使打印产品上的印刷油墨在印刷过程之后立即进行电晕处理，使得可以直接施加UV清漆 印刷油墨，而不需要额外的印刷工艺。

公开(公告)号：US20030177949A1

公开(公告)日：2003-09-25

申请号：US10371801

申请日：2003-02-20

申请人： Flex Products, Inc.

发明人： Roger W. Phillips ,  Vladimir Raksha

IPC分类号： C04B014/20 ,  C23C014/00 ,  B32B015/02 ,  C09C001/62 ,  H05H001/24

CPC分类号： C23C14/223 ,  C01P2004/03 ,  C01P2004/20 ,  C01P2006/60 ,  C01P2006/63 ,  C01P2006/64 ,  C01P2006/65 ,  C01P2006/66 ,  C09C1/0015 ,  C09C1/0021 ,  C09C3/063 ,  C09C2200/102 ,  C09C2200/1058 ,  C09C2200/1087 ,  C09C2200/24 ,  C09C2200/306 ,  C09C2220/20 ,  C09D5/36 ,  C23C14/50 ,  Y10T428/2911 ,  Y10T428/2991 ,  Y10T428/2993 ,  Y10T428/2996

摘要： Methods and apparatus are provided for uniformly depositing a coating material from a vaporization source onto a powdered substrate material to form a thin coalescence film of the coating material that smoothly replicates the surface microstructure of the substrate material. The coating material is uniformly deposited on the substrate material to form optical interference pigment particles. The thin film enhances the hiding power and color gamut of the substrate material. Physical vapor deposition process are used for depositing the film on the substrate material. The apparatus and systems employed in forming the coated particles utilize vibrating bed coaters, vibrating conveyor coaters, or coating towers. These allow the powdered substrate material to be uniformly exposed to the coating material vapor during the coating process.

摘要翻译： 提供的方法和装置用于将涂料从蒸发源均匀地沉积到粉末基质材料上以形成涂层材料的薄聚结膜，其平滑地复制基底材料的表面微观结构。 涂层材料均匀地沉积在基材上以形成光学干涉颜料颗粒。 该薄膜增强了基底材料的遮盖力和色域。 物理气相沉积工艺用于将膜沉积在基底材料上。 用于形成涂覆颗粒的设备和系统使用振动床涂布机，振动输送机涂布机或涂布塔。 这些允许粉末状基材在涂布过程中均匀地暴露于涂料蒸气。

公开(公告)号：US20030165636A1

公开(公告)日：2003-09-04

申请号：US10397674

申请日：2003-03-26

发明人： Pavel Koulik ,  Mikhail Samsonov ,  Alexander Cherepanov ,  Evguenii Petrov

IPC分类号： H05H001/24 ,  C23C016/00

CPC分类号： H01J37/32623 ,  H01J37/32321

摘要： A process for plasma treatment of an object's surface to be treated comprising the creation of a plasma, the application of the plasma to the surface to be treated, and the excitation of the surface to be treated, such that it vibrates and undulates. The energy for excitation of the surface may come from the process creating the plasma, from an external source, or from a combination of these two sources. The vibration preferably takes place while the plasma is being applied to the surface to be treated, but depending on the treatment to carry out, it may also take place just prior to and/or just after the application phase.

摘要翻译： 用于待处理物体的等离子体处理的方法，包括产生等离子体，将待处理的表面施加到被处理表面，以及激发待处理的表面，使其振动和起伏。 用于激发表面的能量可来自产生等离子体的过程，来自外部源或来自这两个源的组合。 振动优选在将等离子体施加到被处理表面的同时发生，但是根据要进行的处理，也可以在施加阶段之前和/或刚刚施加之后进行。

公开(公告)号：US20030157255A1

公开(公告)日：2003-08-21

申请号：US10365464

申请日：2003-02-13

申请人： CANON KABUSHIKI KAISHA

发明人： Yasuyuki Saito ,  Junri Ishikura ,  Kazuhiro Aoyama

IPC分类号： B05D003/02 ,  H05H001/24

CPC分类号： B41J2/1606 ,  B05D1/12 ,  B05D5/083

摘要： A method for manufacturing an inkjet head having orifice plates with improved ink-repellent properties and durability, including the step of forming the ink-repellent film on the surface of the substrate by using the gas deposition process is provided.

摘要翻译： 本发明提供一种制造喷墨头的方法，所述喷墨头具有改善的防油墨性能和耐久性的孔板，包括通过使用气相沉积工艺在基材表面上形成拒油膜的步骤。

公开(公告)号：US20030143402A1

公开(公告)日：2003-07-31

申请号：US10304966

申请日：2002-11-27

申请人： NATIONAL CHENG KUNG UNIVERSITY

发明人： Min-Hsiung Hon ,  Jiann Shieh

IPC分类号： B32B009/00 ,  C23C016/00 ,  H05H001/24

CPC分类号： C23C16/30 ,  Y10T428/30

摘要： A nanocomposite having titanium aluminum carbon nitride and amorphous carbon is disclosed, and the nanocomposite comprises a titanium aluminum carbon nitride grain of nanometer scale and an amorphous carbon matrix, wherein the titanium aluminum carbon nitride grain of nanometer scale is embedded into the amorphous carbon matrix. The method for coating the nanocomposite of titanium aluminum carbon nitride-amorphous carbon on a substrate comprises: depositing the substrate in a reaction chamber; and igniting plasma to clean and remove an oxide layer and adsorptive on the substrate; injecting a reaction gas. The reaction gas is activated and thermal decomposed by plasma to form the nanocomposite coating layer of titanium aluminum carbon nitride-amorphous carbon on the surface of the substrate.

摘要翻译： 公开了具有氮化铝铝和无定形碳的纳米复合材料，并且纳米复合材料包括纳米级的钛铝氮化钛晶粒和无定形碳基体，其中将纳米级的钛铝氮化钛晶粒嵌入无定形碳基体中。 在衬底上涂覆钛铝碳氮化物 - 无定形碳的纳米复合材料的方法包括：将衬底沉积在反应室中; 并点燃等离子体以清洗和除去氧化物层并吸附在衬底上; 注入反应气体。 反应气体被激活并通过等离子体热分解以在衬底的表面上形成钛铝碳氮化物 - 无定形碳的纳米复合涂层。

公开(公告)号：US20030129324A1

公开(公告)日：2003-07-10

申请号：US10238470

申请日：2002-09-09

申请人： The Regents of the University of California

发明人： Francois Y. L. Genin ,  Brent C. Stuart

IPC分类号： H05H001/24 ,  H05B007/00

CPC分类号： C23C14/28 ,  C23C14/12

摘要： The invention relates to a pulsed laser deposition method to produce a plume of material that can be collected as a monolayer or multilayer film or to produce particles of target starting material on a substrate material without substantially decomposing it and without substantially altering its original composition.

摘要翻译： 本发明涉及一种脉冲激光沉积方法，用于产生可以作为单层或多层膜收集的材料的羽流，或者在基本材料上产生目标起始材料的颗粒，而基本上不分解它，而基本上不改变其原始组成。

公开(公告)号：US20030091753A1

公开(公告)日：2003-05-15

申请号：US10277801

申请日：2002-10-23

发明人： Jae-Jong Han ,  Kyoung-Seok Kim ,  Byung-Ho Ahn ,  Seung Mok Shin ,  Hwa-Sik Kim ,  Hong-Bae Park

IPC分类号： C23C016/00 ,  H05H001/24

CPC分类号： C23C16/4558 ,  C23C16/345 ,  C23C16/4404 ,  C23C16/4405 ,  C23C16/505 ,  H01J37/3244 ,  H01J37/32623

摘要： A plasma enhanced chemical vapor deposition apparatus and a method of forming a nitride layer using the same, wherein the plasma enhanced CVD apparatus includes a process chamber including an upper chamber with a dome shape, a lower chamber, and an insulator therebetween, a gas distributing ring, a susceptor for supporting a wafer and heating the process chamber, a plasma compensation ring surrounding the susceptor, a vacuum pump and an electric power source connected to the process chamber. The gas distributing ring has a plurality of upwardly inclined nozzles, allowing upward distribution of reactive gases. The method of forming a nitride layer includes forming a protective film on inner walls of a process chamber, the protective film having at least two layers of differeing dielectric constant, and sequentially supplying reactive gases to the process chamber. A nitride layer formed thereby has low hydrogen content, good density and oxidation resistance.

摘要翻译： 一种等离子体增强化学气相沉积装置和使用其形成氮化物层的方法，其中等离子体增强CVD装置包括处理室，该处理室包括具有圆顶形状的上室，下室和位于其间的绝缘体，气体分布 环，用于支撑晶片并加热处理室的基座，围绕基座的等离子体补偿环，真空泵和连接到处理室的电源。 气体分配环具有多个向上倾斜的喷嘴，允许反应气体向上分配。 形成氮化物层的方法包括在处理室的内壁上形成保护膜，所述保护膜具有至少两层不同的介电常数，并且将反应性气体顺序地供应到处理室。 由此形成的氮化物层具有低氢含量，良好的密度和抗氧化性。

公开(公告)号：US20030077400A1

公开(公告)日：2003-04-24

申请号：US09735313

申请日：2000-12-12

发明人： George Plester ,  Horst Ehrich ,  Mark Rule

IPC分类号： C23C016/00 ,  B05D003/06 ,  H05H001/24

CPC分类号： C23C14/10 ,  B29B17/0026 ,  B29K2709/08 ,  B29K2995/0067 ,  B29L2031/7158 ,  Y02W30/62

摘要： A method, composition and system for coating an external surface of containers and in particular, plastic containers, provides for low permeability to gases and vapors. The coating applied to the external surface of the containers is very thin and is comprised of one or several inorganic substances or layers of substances. For example, the coating can include silica which is bonded to the external surface of the container. This coating will be flexible and can be applied regardless of the container's internal pressure or lack thereof. The coating will firmly adhere to the container and possess an enhanced gas barrier effect after pressurization even when the coating is scratched, fractured, flexed and/or stretched. Moreover, this gas barrier enhancement will be substantially unaffected by filling of the container.

摘要翻译： 用于涂覆容器的外表面，特别是塑料容器的方法，组合物和系统提供对气体和蒸气的低渗透性。 施加到容器的外表面的涂层非常薄，并且由一种或多种无机物质或物质层组成。 例如，涂层可以包括结合到容器外表面的二氧化硅。 该涂层将是柔性的，并且可以施加，而不管容器的内部压力或其不足。 即使涂层被刮伤，断裂，弯曲和/或拉伸，涂层也将牢固地附着在容器上并且在加压之后具有增强的阻气效果。 此外，这种阻气增强将基本上不会通过填充容器而受到影响。