摘要:
Embodiments disclosed herein include a method for cleaning a bevel area of a substrate support disposed within a plasma processing chamber. In one example the method begins by placing a cover substrate on a substrate support disposed in an interior volume of a processing chamber. A cleaning gas is provided into the interior volume of the processing chamber. A plasma is struck in the interior volume of the processing chamber. A cleaning gas is provided through the substrate support to a bevel edge area defined between an outer diameter of the cover substrate and an edge ring disposed on the substrate support.
摘要:
A vacuum exhaust method is for decreasing a pressure in a processing chamber in which a mounting table configured to mount thereon a substrate is provided by using a gas exhaust unit. The vacuum exhaust method includes mounting a non-evaporated getter (NEG) on the mounting table, and adsorbing an active gas in the processing chamber on the NEG mounted on the mounting table. In the adsorbing the active gas, the NEG is maintained at a predetermined temperature.
摘要:
This invention relates to utilizing tubes having a coaxial base in a non-coaxial circuit and more particularly, to a grid line structure, including a trough, constructed to have effect as a coaxial line having shunt discontinuities distributed in the form of tubes.
摘要:
An electron device incorporating a microchannel plate as a secondary emission electron source which in addition to the primary current provided by an electron emitter, such as a thermionic emitter, will provide high gains. By impressing the proper voltages thereon, the entrance and exit surfaces of the microchannel plate serve respectively as equivalents to the control grid and screen grid in a conventional type tube.
摘要:
Electrode structure for controlling flow of electrons from a cathode to an anode, characterized by the absence of electrodes in the flow path whereby electron flow is substantially unimpeded by physical structure and proceeds with high transmission efficiency. The structure is such as to establish an electron accelerating field and associated flow path between cathode and anode which bulges outwardly about an interposed control electrode and is thus not physically intercepted by same. By virtue of the high efficiency of electron transmission, the electrode structure may be advantageously incorporated in an Xray tube to provide X-ray pulses of increased intensity. In addition, the transmission characteristic in conjunction with the capability of the bulging field to enable the use of relatively small control voltages to govern electron flow render the electrode structure particularly well suited to the attainment of a high amplification factor in a high power amplifier tube for voltage regulation or switching applications.
摘要:
In a high vacuum electron control tube, a cathode comprised of a plurality of spaced parallel cathode wires or filaments arranged upon a generally cylindrical surface parallel to the cylinder axis cooperates with a common generally cylindrical anode concentric with the cathode structure and a control electrode composed of a plurality of planar loop-shaped control elements each arranged radially between adjacent pairs of cathode wires. Suitable oriented U-shaped metallic screens surrounding each of the cathode wires and a homogeneous magnetic field extending parallel to said wires coact to cause the electrons emitted from each cathode wire to follow cycloidal paths towards said anode with a minimum of electrons reaching said control electrode even in case of relatively high positive control voltages, while at the same time ensuring a high amplification factor of the tube.