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7 条记录 (耗时 0.016 秒)

    Heating oven for dynamo-electric machine component
    1.
    发明申请
    Heating oven for dynamo-electric machine component 失效
    加热炉用于发电机组件

    公开(公告)号：US20030064341A1

    公开(公告)日：2003-04-03

    申请号：US10234919

    申请日：2002-08-30

    发明人： Raffaele Becherucci ,  Gianfranco Stratico

    IPC分类号： F24J001/00 ,  F27B001/00

    CPC分类号： F26B11/04 ,  F24V40/00 ,  F26B11/028 ,  H02K15/12

    摘要： A heating oven for use in dynamo-electric machine component manufacture is provided. The oven uses forced air heating to raise the temperature of in-process component subassemblies to suitable process temperatures. The heating oven includes a rotating drum mounted in a cabinet. A number of open-ended tubular cradles are disposed in circular arrays between the drum faces. Batches of component subassemblies may be individually loaded into the cradles for heat treatment. Air flow channels are set up in the oven cabinet to evenly distribute heated air through individual cradles. Heated air after passing over the individual in-process subassemblies, exits the cradles through side slots in the cradle walls into the interior of the drum. The exiting air is reheated and recirculated through the heating oven.

    摘要翻译： 提供了一种用于发电机组件制造的加热炉。 烤箱使用强制空气加热将过程中组件组件的温度升高到适当的工艺温度。 加热炉包括安装在机柜中的旋转滚筒。 多个开口的管状托架以鼓形表面之间的圆形阵列设置。 批量的部件组件可以单独装载到支架中用于热处理。 空气流通道设置在烤箱柜中，以将热空气均匀地分布在单独的托架中。 经过单个进程中的组件后的加热空气通过摇篮壁中的侧槽离开托架进入滚筒的内部。 离开的空气被再加热并通过加热炉再循环。

    Soaking apparatus
    2.
    发明申请
    Soaking apparatus 失效
    浸泡设备

    公开(公告)号：US20030118965A1

    公开(公告)日：2003-06-26

    申请号：US10305505

    申请日：2002-11-27

    申请人： Showa Manufacturing Co., Ltd.

    发明人： Nobuo Iwatani ,  Akira Nishio ,  Masao Takahashi ,  Masaharu Kusuhara

    IPC分类号： F27B001/00

    CPC分类号： F27D99/0001 ,  C21D9/0006 ,  C21D11/00 ,  C21D11/005 ,  F27D19/00

    摘要： Provided is a soaking apparatus to treat materials which require higher accuracy in soaking and improved cleanliness. The soaking apparatus to soak a material 12 to be treated is provided with a heat treatment apparatus 14 having walls, a ceiling and a floor, each of the walls, the ceiling and the floor of the heat treatment apparatus 14 being divided into a plurality of sections, a heater block mounted on each of the sections, a thermal sensor 11 mounted to the heater block, and a thermal controller 13 to control heating of the heater block based on a temperature measured by the thermal sensor 11.

    摘要翻译： 提供了一种浸泡装置，用于处理需要更高的浸泡精度和改进的清洁度的材料。 浸泡待处理材料12的均热装置设有具有壁，天花板和地板的热处理设备14，热处理设备14的每个壁，天花板和地板被分成多个 部分，安装在每个部分上的加热器块，安装到加热器块的热传感器11，以及基于由热传感器11测量的温度来控制加热器块的加热的热控制器13。

    High-temperature, non-catalytic, infrared heater
    4.
    发明申请
    High-temperature, non-catalytic, infrared heater 失效
    高温，非催化，红外线加热器

    公开(公告)号：US20020146658A1

    公开(公告)日：2002-10-10

    申请号：US10057377

    申请日：2002-01-24

    发明人： Mounir Ibrahim ,  Thomas D. Briselden

    IPC分类号： F27D007/00 ,  F27B001/00 ,  F27D001/00 ,  B29C035/02 ,  B29C043/02 ,  B29C049/00 ,  B29C071/00

    CPC分类号： B29C51/42 ,  B29C35/045 ,  F23D14/12 ,  F23D2900/14122 ,  Y02P70/279

    摘要： A high-temperature, non-catalytic, infrared heater is formed within a housing having a bottom and at least one side lined with a refractory material. The burner includes a burner surface area and is positioned within the housing. A re-radiating surface is positioned above the burner and comprises a mesh having a re-radiating surface area greater than the burner surface area with the re-radiating surface operating between approximately 400null F. and 2200null F.

    摘要翻译： 高温非催化红外线加热器形成在具有底部和至少一个衬有耐火材料的一侧的壳体内。 燃烧器包括燃烧器表面区域并且位于壳体内。 重新辐射表面位于燃烧器上方，并且包括具有大于燃烧器表面积的再辐射表面积的网，其中再辐射表面在约400°F至2200°F之间运行。

    Quartz glass, heat treating apparatus using quartz glass, and heat treating method
    5.
    发明申请
    Quartz glass, heat treating apparatus using quartz glass, and heat treating method 失效

    公开(公告)号：US20010029006A1

    公开(公告)日：2001-10-11

    申请号：US09871979

    申请日：2001-06-04

    申请人： KABUSHIKI KAISHA TOSHIBA

    发明人： Hiroshi Tomita ,  Tsuneo Ishii ,  Chie Hongo

    IPC分类号： F27B001/00

    CPC分类号： C03B32/00 ,  C03B20/00 ,  C03C3/06 ,  C03C23/002 ,  C03C2201/20 ,  C03C2201/24 ,  C03C2201/26 ,  C03C2201/32 ,  C03C2203/10 ,  C03C2203/50 ,  Y10S501/905

    摘要： A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of Enull center as measured by means of an electron spin resonance analysis is 3null1019 cmnull3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of Enull center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.

    Method and device for controlling thermal distortion in elements of a lithography system
    6.
    发明申请
    Method and device for controlling thermal distortion in elements of a lithography system 审中-公开
    用于控制光刻系统元件中热变形的方法和装置

    公开(公告)号：US20030235682A1

    公开(公告)日：2003-12-25

    申请号：US10387161

    申请日：2003-03-11

    发明人： Michael R. Sogard

    IPC分类号： B32B003/10 ,  G03F007/20 ,  G03B027/52 ,  G03B027/68 ,  G03B027/54 ,  G03B027/32 ,  G01N021/00 ,  G02B001/00 ,  G02B003/00 ,  G02B009/00 ,  F27B009/12 ,  F27B001/00 ,  G03B021/16 ,  G03B021/18

    CPC分类号： G03F7/70233 ,  G03F7/70891 ,  Y10T428/24802

    摘要： An element control system (32) that reduces the effects on image quality of thermal distortions in an optical element (28) of a lithography system (10) includes a heat source (50) that primarily heats a non-illuminated region (44) of the optical element (28) to alter and/or control the shape of the illuminated part of the optical element (28). The heat source (50) directs heat to the non-illuminated region (44) and/or an illuminated region (42) to simplify and/or alter the shape of thermal distortions aberrations in the optical element (28).

    摘要翻译： 降低对光刻系统（10）的光学元件（28）中的热失真的图像质量的影响的元件控制系统（32）包括：热源（50），其主要加热非光照区域 所述光学元件（28）用于改变和/或控制所述光学元件（28）的被照射部分的形状。 热源（50）将热量引导到非照明区域（44）和/或照明区域（42）以简化和/或改变光学元件（28）中的热失真像差的形状。

    Rotary hearth furnace for producing reduced metal and method of producing reduced metal
    7.
    发明申请
    Rotary hearth furnace for producing reduced metal and method of producing reduced metal 有权
    用于生产还原金属的旋转炉底炉和生产还原金属的方法

    公开(公告)号：US20020123019A1

    公开(公告)日：2002-09-05

    申请号：US09988521

    申请日：2001-11-20

    申请人： Kabushiki Kaisha Kobe Seiko Sho Sobe Steel Ltd

    发明人： Takao Harada ,  Hidetoshi Tanaka

    IPC分类号： F27B009/16 ,  F27B001/00 ,  F27B003/00 ,  F27B009/14

    CPC分类号： F27B9/34 ,  C21B13/10 ,  C21B13/105 ,  F27B9/16 ,  F27B2009/3607 ,  F27D1/0043 ,  F27D1/04 ,  F27D1/12 ,  F27D99/0073 ,  Y02P10/136

    摘要： In a rotary hearth furnace for producing reduced metal through heating and reducing carbon containing materials composed of at least metal oxide-containing material and carbon-containing reduction material, a hearth structure is provided by which a refractory in a hearth lateral end is not damaged and carbon containing materials do not fall down to a water sealing section of the rotary hearth furnace. The upper part of a hearth lateral end 1a is covered with the lower end 2a of a side wall 2 of a hood covering the whole hearth, and a cooling means 3 is installed in the side wall lower end 2a.

    摘要翻译： 在通过加热制造还原金属的回转炉底炉中，至少含有含金属氧化物的材料和含碳还原材料的含碳材料减少的方法中，提供了一种炉床侧端部的耐火材料不被损坏的炉床结构， 含碳材料不会落到转底炉的水封部分。 炉床侧端部1a的上部被覆盖整个炉床的罩的侧壁2的下端2a覆盖，冷却装置3安装在侧壁下端2a中。