公开(公告)号：US3854982A

公开(公告)日：1974-12-17

申请号：US25262272

申请日：1972-05-12

Applicant: HYDROPLASTICS INC

Inventor： AELION R ,  FEREZY E

IPC: B29D11/00 ,  C03C17/32 ,  C08F220/28 ,  C08J7/18 ,  B44D1/50 ,  C08F3/50

CPC classification number: C08J7/18 ,  B29D11/00865 ,  C03C17/32 ,  C08F220/28 ,  Y10S522/912

Abstract: Hydrophilic polymers are formed in situ by irradiating a mixture of hydroxyalkyl methacrylate and a cross linking agent. The former polymer is optically clear and free of voids, obviating the discoloration and discontinuity deficiencies characterizing prior art polymerization employing foreign substances such as solvents, dispersing agents, catalysts and the like. In accordance with one aspect of the present invention, the hydrophilic polymer may be formed as a coating on a glass, plastic or other substrate.

Abstract translation: 通过照射甲基丙烯酸羟烷基酯和交联剂的混合物原位形成亲水聚合物。 前一种聚合物是光学透明的并且没有空隙，消除了表征现有技术聚合中使用异物如溶剂，分散剂，催化剂等的变色和不连续性缺陷。 根据本发明的一个方面，亲水性聚合物可以形成为玻璃，塑料或其它基底上的涂层。

公开(公告)号：US3645984A

公开(公告)日：1972-02-29

申请号：US3645984D

申请日：1969-04-30

Applicant: PPG INDUSTRIES INC

Inventor： DOWBENKO ROSTYSLAW ,  CHRISTENSON ROGER M

IPC: C08F20/20 ,  C08F3/50 ,  C07C69/52

CPC classification number: C08F20/20

Abstract: A NOVEL ACRYLIC MONOMER IS PREPARED BY REACTING A DIOL SUCH AS

HO-CH2-C(-CH3)2-CH2-OOC-C(-CH3)2-CH2-OH

WITH A ACRYLIC OR METHACRYLIC ACID OR THEIR ANHYDRIDES OR ACID CHLORIDES. THE REACTION PRODUCT IS A MONOMER WHICH MAY BE POLYMERIZED BY SUBJECTING IT TO IONINZING IRRADIATION, ACTINIC LIGHT, OR TO FREE-RADICAL CATALYSTS, AND THE RESULTING POLYMER IS A HARD, MAR-RESISTANT MATERIAL.

公开(公告)号：US3585169A

公开(公告)日：1971-06-15

申请号：US3585169D

申请日：1968-12-13

Applicant: NALCO CHEMICAL CO

Inventor： DOMBA ELEMER

IPC: C08F20/18 ,  C09D5/00 ,  C08F3/50 ,  C08F15/16

CPC classification number: C08F20/18 ,  C09D5/00

Abstract: WHEREIN R IS SELECTED FROM THE GROUP CONSISTING OF HYDROGEN, WATER-EMULSIFIABLE SALT-FORMING CATIONS, AND FLUOROALKYLRADICALS OF THE FORMULA -(CH2)B-(CYFIY)-CF2E; AND WHEREIN A IS HYDROGEN OR LOWER ALKYL (C1 TO C5); B IS OXYGEN OR NH; D AND E ARE HYDROGEN OR FLUORINE; M AND N ARE INTEGERS FROM 0 TO 4 INCLUSIVE, AND TOTALLING NO MORE THAN 4; X AND Y ARE INTEGERS FROM 1 TO 18 INCLUSIVE; AND A AND B ARE INTEGERS FROM 1-3 INCLUSIVE. THE MONOMER MAY BE COPOLYMERIZED WITH FLUORINE-CONTAINING OR FLUORINE-FREE MONOMERS. WHEN THE POLYMERS ARE APPLIED TO FABRICS, SOIL RELEASE PROPERTIES ARE FAVORED BY THE HALF ESTER (I.E., WHERE R IS HYDROGEN) AND ITS SALTS, AND OIL AND WATER REPELLENCY ARE FAVORED BY THE DIESTERS, WHERE R IS A FLUOROALKYL RADICAL.

CNH2N-COO-R

D-CF2-(C)X(F)2X-(CH2)A-OOC-CMH2M-CH(-B-CO-C(-A)=CH2)-

WATER- AND OIL-REPELLENT HOMOPOLYMERS AND COPOLYMERS ARE PREPARED FROM AN ACRYLYL MONOMER OF THE GENERAL FORMULA:

公开(公告)号：US3760047A

公开(公告)日：1973-09-18

申请号：US3760047D

申请日：1970-12-04

Applicant: BASF AG

Inventor： GAETH R ,  SCHMITT B ,  BLUM D

IPC: C08J9/00 ,  C08J9/02 ,  B29D27/08 ,  C08F3/50

CPC classification number: C08J9/02

Abstract: A process for the manufacture of foams by heating polymers containing polymerized units of esters of ethylenically unsaturated polymerizable acids having three or four carbon atoms with tert-butanol at elevated temperatures wherein a pH of from 2.0 to 0.1 is set up in aqueous systems of the polymers, the water is evaporated and the residue is heated to temperatures above the decomposition temperature of the carboxylic esters.

Abstract translation: 通过将含有三个或四个碳原子的烯属不饱和可聚合酸的酯的聚合单元的聚合物与叔丁醇在高温下加热泡沫的方法，其中将pH为2.0至0.1的聚合单元在聚合物的水性体系中 ，将水蒸发并将残余物加热至高于羧酸酯分解温度的温度。

公开(公告)号：US3640983A

公开(公告)日：1972-02-08

申请号：US3640983D

申请日：1966-11-09

Applicant: SHOJIRO HORIGUCHI ,  MICHIEI NAKAMURA

Inventor： HORIGUCHI SHOJIRO ,  NAKAMURA MICHIEI

IPC: C08F2/22 ,  C08F2/44 ,  C08F4/04 ,  C08F8/30 ,  C08F3/50 ,  C08F3/64 ,  C08F3/90

CPC classification number: C08F8/30 ,  C08F4/04 ,  Y10S526/915

Abstract: A METHOD OF MAKING A COUPLER-BONDED-POLYMER CAPABLE OF BEING COUPLED WITH A DIAZONIUM COMPOUND, WHICH COMPRISES THE STEPS OF DIAZOTIZING A COUPLER CONTAINING A PRIMARY AMINO RADICAL TO PRODUCE A DIAZOTIZED PRODUCT STABILIZING SUCH DIAZOTIZED PRODUCT WITH A STABILIZER TO PRODUCE A STABILIZED DIAZONIUM COMPOUND, MIXING THE STABILIZED DIAZONIUM COMPOUND WITH AN ETHYLENICALLY UNSATURATED POLYMERIZABLE MONOMER AND POLYMERIZING THE MONOMER BY UTILIZING THE STABILIZED DIAZONIUM COMPOUND AS A POLYMERIZATION INITIATOR TO PRODUCE A COUPLER-BONDEDPOLYMER. A METHOD OF COLORING ARTICLES WITH THE USE OF THE COUPLER-BONDED-POLYMER THUS PRODECED IS ALSO PROVIDED.

公开(公告)号：US3598792A

公开(公告)日：1971-08-10

申请号：US3598792D

申请日：1969-11-19

Applicant: GRACE W R & CO

Inventor： JEFFERSON DONALD E ,  MARANS NELSON S

IPC: C08F20/58 ,  C08F1/16 ,  C08F3/50 ,  C08F15/16

CPC classification number: C08F20/58

Abstract: POLYMERS AND COPOLYMERS OF DIESTERS OF N-ARCYLYLIMINODIACETIC ACIDS ARE PREPARED BY IRRADIATING SUCH DIESTERS OR MIXTURES THEREOF WITH METHYL ACRYLATE, METHYL METHACRYLATE, A VINYLPYRIDINE, N-VINYLPYRROLIDONE, STYRENE, ACRYLONITRILE, OR VINYL ACETATE. THESE POLYMERS AND COPOLYMERS ARE ALSO PREPARED BY TREATING SUCH DIESTERS OR MIXTURES THEREOF WITH METHYL ACRYLATE, METHYL METHACRYLATE, A VINYLPYRIDINE, N-VINYLPYRROLIDONE, STYRENE, ACRYLONITRILE, OR VINYL ACETATE WITH A FREE RADICAL INITIATOR. THESE POLYMERS CAN BE HYDROLYZED (OR SAPONIFIED AND ACIDIFIED) TO CONVERT THEM FROM THE ESTER FORM TO THE CARBOXYLIC FORM.

公开(公告)号：US3853578A

公开(公告)日：1974-12-10

申请号：US28753272

申请日：1972-09-08

Applicant: SENRI KIKAKU SOGO KK

Inventor： SUZUKI M ,  YAMAZAKI K

IPC: B05D3/06 ,  B05D5/06 ,  B44F1/06 ,  B44F11/06 ,  B44D1/50 ,  B44D1/52 ,  C08F3/50

CPC classification number: B05D3/067 ,  B05D1/32 ,  B05D5/06 ,  B05D7/08 ,  B44F1/06 ,  B44F11/06

Abstract: Decorative boards having depression patterns are obtained by applying to a patterned or colored substrate board an unsaturated polyester resin capable of being cured by irradiation of ultraviolet rays, covering a coating layer of said resin with a shading film formed of a photo-transmissible material and having thereon a shading pattern corresponding to a depression pattern to be formed in the resinous layer, irradiating the aforesaid resinous layer through the aforesaid shading film by ultraviolet rays to cure the resin in irradiated areas and peeling off the shading film. In case of decorative boards having a pattern like a face of laid bricks or tiles or stained glass where the shaded or unirradiated areas have relatively wide widths, uncured resin in the shaded areas is taken out with the shading film leaving depressions in the layer of cured resin. The resinous layer is, as it is or after application of a colorant to the depressions, cured completely to obtain a decorative board having a threedimensional pattern of a reality.

Abstract translation: 具有凹陷图案的装饰板通过向图案化或着色的基板施加能够通过紫外线照射固化的不饱和聚酯树脂，用由光致透射材料形成的遮光膜覆盖所述树脂的涂层而获得，并具有 在其上具有与在树脂层中形成的凹陷图形相对应的阴影图案，用紫外线照射上述遮光膜，使其在照射区域中固化，剥离遮光膜。 在装饰板具有像铺成的砖或瓷砖或彩色玻璃的图案的图案，其中阴影或未照射区域具有相对宽的宽度，阴影区域中的未固化树脂被取出，遮光膜在固化层中留下凹陷 树脂。 树脂层是在向凹部施加着色剂之后或之后完全固化以获得具有现实三维图案的装饰板。

公开(公告)号：US3847846A

公开(公告)日：1974-11-12

申请号：US26229372

申请日：1972-06-13

Applicant: KANSAI PAINT CO LTD

Inventor： ASADA K

IPC: C08F291/10 ,  H01B1/12 ,  C08F3/50

CPC classification number: H01B1/122 ,  C08F291/10 ,  C08F228/02 ,  C08F230/02

Abstract: 1. A COMPOSITION FOR PREPARING ELECTROCONDUCTIVE RESIN WHICH COMPRISES: (A) ONE OR MORE MEMBERS SELECTED FROM THE GROUP CONSISTING OF: (I) COMPOUNDS REPRESENTED BY THE FOLLOWING GENERAL FORMULA:

(H2C=C(-R1)-COO-(C(-R2)(-R3))N-SO3)X-M1

IN WHICH R1 IS A HYDROGEN ATOM OR A METHYL GROUP; EACH OF R2 AND R3 IS A HYDROGEN OR HALOGEN ATOM; N IS AN INTEGER FROM 1 TO 5; X IS AN INTEGER FROM 1 TO 3; AND M1 IS A HYDROGEN ATOM, NA, LI, K, AG, CU, MG, CA, ZN, BA, AL, AMMONIUM OR AMINE, (II) COMPOUNDS REPRESENTED BY THE FOLLOWING GENERAL FORMULA:

H2C=C(-R4)-COO-(C(-R5)(-R6))P-O-P(=O)(-O-M2)-O-M3

IN WHICH R4 IS A HYDROGEN ATOM OR A METHYL GROUP; EACH OF R5 AND R6 IS A HYDROGEN OR HALOGEN ATOM; P IS AN INTEGER FROM 1 TO 4; AND EACH OF M2 AND M3 IS A HYDROGEN ATOM, NA, LI, K, AG, AMMONIUM OR AMINE, AND (III) COMPOUNDS REPRESENTED BY THE FOLLOWING GENERAL FORMULA:

((H2C=C(-R7)-COO-(C(-R9)(-R8))Q-O)2-P(=O)-O)X-M3

IN WHICH R7 IS A HYDROGEN ATOM OR METHYL GROUP; EACH OF R8 AND R9 IS HYDROGEN OR HALOGEN ATOM; Q IS AN INTEGER FROM 1 TO 4; X IS AN INTEGER FROM 1 TO 3; AND M4 IS A HYDROGEN ATOM, NA, LI, K, AG, CU, MG, CA, ZN, BA, AL, AMMONIUM OR AMINE, AND (B) COMPOUNDS WHICH CONTAIN VICINAL EPOXY GROUPS IN THE MOLECULES.

公开(公告)号：US3799915A

公开(公告)日：1974-03-26

申请号：US17366171

申请日：1971-08-20

Applicant: WESTERN LITHO PLATE & SUPPLY

Inventor： DUNNAVANT W ,  HARRIS E ,  PARKER E ,  KURZ P ,  MARKLE R

IPC: C07C51/353 ,  C07C51/60 ,  C07D307/54 ,  C07D333/24 ,  C08F20/28 ,  G03F7/038 ,  C08F3/50 ,  C08F15/16

CPC classification number: G03F7/0388 ,  C07C51/353 ,  C07C51/60 ,  C07D307/54 ,  C07D333/24 ,  C08F20/28 ,  C07C57/42 ,  C07C57/72

Abstract: PHOTOSENSITIVE HOMOPOLYMERS AND SUBSTANTIALLY NONCROSSLINKED COPOLYMERS CONTAINING THE RECURRING UNIT:

-C(-R5)(-COO-R1-OOC-C(-R6)=C(-R7)-R2)-C(-R3)(-R4)-

R1 MAY BE SUBSTITUTED OR UNSUBSTITUTED ALKYLENE, ARALKYLENE, ALKOXYALKYLENE OR ARYLOXYALKYLEN. R2 IS A SUBSTITUTED OR UNSUBSTITUTED ARYL GROUP OR HETEROCYCLIC GROUP HAVING AROMATIC CHARACTER. R3, R4, AND R5 ARE HYDROGEN, HALOGEN OR LOWER ALKYL. R6 AND R7 MAY BE HYDROGEN, HALOGEN, NITRO, LOWER ALKYL, PHENYL, SUBSTITUTED PHENYL, PHENOXY AND LOWER ALKOXY. LITHOGRAPHIC PLATS BEARING THESE PHOTOSENSITIVE POLYMERS CAN BE STORED WITHOUT DETERIORATION FOR EXTENDED PERIODS PRIOR TO EXPOSURE, AND PRODUCE HIGHLY ABRASION RESISTANT PLATES ON BEING EXPOSED. THE PHOTOSENSITIVE POLYMERS OF THE INVENTION ARE PREFERABLY PRODUCED BY HOMOPOLYMERIZATION OF NOVEL MONOMERS HAVING THE GENERAL FORMULA:

R3-C(-R4)=C(-R5)-COO-R1''-OOC-C(-R6)=C(-R7)-R2

WHERE R1'' IS ALKYLENE HALOALKYLENE, ALKOXYALKYLENE, ANINO-ALKYLENE, CYCLOAKYLENE, ARALKYLENE, CYCLOALKYLALKYLENE, CYANOALKYLENE, AND ARYLOXYALKYLENE, AND R2, R3, R4, R5, R6, AND R7 ARE AS DEFINED ABOVE; AND BY COPOLYERIZATION OF THESE MONOMERS WITH ONE OR MORE ETHYLENICALLY UNSATURATED COMONOMERS. METHOD OF PREPARING THE PHOTOPOLYMERS AND THE NOVEL MONOMERS ARE ALSO DISCLOSED, AS ARE METHODS OF PREPARING AND EXPOSING PLATES BEARING THE POLYMERS.

公开(公告)号：US3594353A

公开(公告)日：1971-07-20

申请号：US3594353D

申请日：1969-08-06

Applicant: NALCO CHEMICAL CO

Inventor： DOMBA ELEMER

IPC: C08F2/38 ,  C08F22/18 ,  D06M15/277 ,  C08F3/50 ,  C08F15/16

CPC classification number: C08F22/18 ,  D06M15/277

Abstract: NEW AND USEFUL ETHYLENICALLY UNSATURATED FLUORINATED POLYMERS USED IN SIZING FABRICS TO IMPART BOTH REPELLENCY TO WATER AND RESISTANCE TO ABSORPTION AND SOILING BY OILY AND GREASY MATERIAL.