公开(公告)号：US06692219B2

公开(公告)日：2004-02-17

申请号：US09725823

申请日：2000-11-29

Applicant: Stephen D. Coomer ,  Stanislaw Kopacz ,  Glyn Reynolds ,  Michael James Lombardi ,  Todd Michael Visconti

Inventor： Stephen D. Coomer ,  Stanislaw Kopacz ,  Glyn Reynolds ,  Michael James Lombardi ,  Todd Michael Visconti

IPC: B25J1506

CPC classification number: H01L21/68728 ,  H01L21/68707 ,  Y10S414/135 ,  Y10S414/139 ,  Y10S414/14

Abstract: A wafer handling system and a method of retrofitting the system to an existing wafer handling apparatus are provided that make possible a method of handling wafers by contacting only a narrow area of not more than two millimeters wide adjacent the edge of the wafer, which is particularly useful for backside deposition where device side contact defines an area of exclusion that renders the wafer unusable in that area. The system provides a chuck on a wafer transfer arm that holds a wafer by gravity on a segmented, upwardly facing annular surface. A compatible annular surface is provided on an aligning station chuck so that wafers can be transferred by contact only with the exclusion area of the wafer surface. A load arm has two similarly compatible chucks further provided with pneumatically actuated grippers to allow the wafer to be loaded into a vertical processing apparatus. The wafer chucks are retrofitted into a processing apparatus in place of vacuum chucks and the vacuum lines that were provided to activate them are used for wafer detection. The electrical signals that were provided for vacuum chuck commands are utilized to actuate the grippers on the transfer arm so that no control software and little hardware need be altered for the retrofit.

Abstract translation: 提供了将晶片处理系统和将系统改装到现有的晶片处理装置的方法，其使得可以通过仅接触晶片边缘不超过两毫米宽的窄区域来处理晶片的方法，这尤其是 用于背面沉积，其中器件侧接触限定使晶片在该区域中不可用的排除区域。 该系统在晶片传送臂上提供卡盘，其通过重力将晶片保持在分段的面向上的环形表面上。 在对准站卡盘上提供相容的环形表面，使得晶片可以仅通过与晶片表面的排除区域接触而被传送。 负载臂具有两个类似地兼容的卡盘，其进一步设置有气动致动的夹持器，以允许将晶片装载到垂直处理装置中。 将晶片卡盘改装成处理装置代替真空吸盘，并将用于激活它们的真空管线用于晶片检测。 用于真空吸盘指令的电信号用于致动传送臂上的夹持器，从而不需要改变控制软件和小硬件。

公开(公告)号：US06626629B2

公开(公告)日：2003-09-30

申请号：US10152767

申请日：2002-05-22

Applicant: Alfred F. Herbermann ,  Jacob J. Van't Land ,  Michael A. Filipiak

Inventor： Alfred F. Herbermann ,  Jacob J. Van't Land ,  Michael A. Filipiak

IPC: B25J1506

CPC classification number: B23Q7/04 ,  B21D43/055 ,  B23Q1/5462 ,  B25J15/0061 ,  B25J15/0616

Abstract: An improved tool mount structure allows the infinite placement of a tool along a generally elongate cylindrical member at an infinite number of locations. The elongate cylindrical member is fixed at each axial end to a generally rigid moving member such as a robotic arm boom or transfer bar. The cylindrical member is fixed in a bracket at one axial end, and into a quick-release mount at an opposed axial end. The cylindrical member may be quickly released from the moving member such that the tool may be easily changed. At the same time, by fixing the cylindrical member at each axial end, a secure rigid connection is provided.

公开(公告)号：US06601888B2

公开(公告)日：2003-08-05

申请号：US09810408

申请日：2001-03-19

Applicant: Lon McIlwraith ,  Andrew Christie

Inventor： Lon McIlwraith ,  Andrew Christie

IPC: B25J1506

CPC classification number: H01L21/6838 ,  B65G47/911

Abstract: The present invention provides a method for the quiet, contactless handling of objects using pickup devices of the Bernoulli type. The method is particularly suitable for the contactless handling of items much larger than an individual pickup, for example the handling of lithographic printing plates. According to the method of the present invention, a flow of fluid is established between the pickup face of the Bernoulli pickup and the surface of the object to be supported. The fluid is made to flow over a laminar flow surface at a velocity sufficient to produce a pressure differential between the flowing fluid and a surrounding fluid medium. Bernoulli lift is maximized by making the laminar flow surface as smooth and protrusionúfree as possible, and by ensuring that the location and extent of the laminar flow surface substantially coincides with the maximal lateral limits of the low-pressure zone between the pickup face and the opposing object surface. As the pickup fluid flows beyond the periphery of the laminar flow surface, it flows over a vibrationúattenuating surface, reducing unwanted vibrations in the object.

Abstract translation: 本发明提供了一种使用伯努利类型的拾取装置安静地，非接触地处理物体的方法。 该方法特别适合于非接触式处理比单个拾取器大得多的物品，例如平版印刷版的处理。 根据本发明的方法，在伯努利拾取器的拾取面和待支撑物体的表面之间建立流体流。 使流体以足以在流动流体和周围流体介质之间产生压差的速度在层流表面上流动。 伯努利提升通过使层流表面尽可能平滑和突出而达到最大化，并且通过确保层流表面的位置和程度基本上与拾取面和相对面之间的低压区的最大横向极限一致 物体表面。 当拾取流体流过层流表面的周边时，其流过振动衰减表面，减少物体中的不必要的振动。

公开(公告)号：US06467824B2

公开(公告)日：2002-10-22

申请号：US09883661

申请日：2001-06-16

Applicant: Lev M. Bolotin ,  Bryan D. Powell ,  Rossen Atanassov Rachkov

Inventor： Lev M. Bolotin ,  Bryan D. Powell ,  Rossen Atanassov Rachkov

IPC: B25J1506

CPC classification number: H01L21/6838 ,  Y10T29/53191

Abstract: A pick and place system is provided with an actuator is responsive to the connection to an air power source to move to a pick-up position. The actuator moves a fork-type link which in turn moves a probe to compliantly move to pick up a micro device upon connection to the air power source. A replaceable precisor precisely aligns the micro device relative to the probe and a floating seal disposed around the probe and resting on the replaceable precisor seals the probe to the replaceable precisor. A system control, connectable to the electrical power source, is connected to the pneumatic and supply valves for selectively, electrically actuating the pneumatic and supply valves.

Abstract translation: 拾取和放置系统设置有致动器，响应于与空气动力源的连接以移动到拾取位置。 致动器移动叉式连杆，叉式连杆在连接到空气动力源时又移动探头以顺应地移动以拾取微型装置。 可更换的精密机构使微型装置相对于探头精确对准，并设置在探针周围的浮动密封件，并置于可更换的预干燥器上，将探头密封到可更换的预干燥器上。 可连接到电源的系统控制器连接到气动和供给阀，以选择性地，电动地驱动气动和供给阀。

公开(公告)号：US06419291B1

公开(公告)日：2002-07-16

申请号：US09792047

申请日：2001-02-26

Applicant: John Preta

Inventor： John Preta

IPC: B25J1506

CPC classification number: B25J15/0616 ,  A61B17/22031 ,  A61B17/22032 ,  A61B2017/306 ,  A61B2017/308 ,  B65G47/91 ,  Y10S294/902

Abstract: A flexible vacuum gripper device and method of gripping. The device includes a housing, an inflatable gripper element defining an internal chamber and being radially or circumferentially expandable, the inflatable gripper element having a front end which is adapted to grip an object and a rear end coupled to the housing, a vacuum source communicating with the internal chamber of the inflatable gripper element, and a pressure source communicating with the inflatable gripper, wherein the vacuum gripper device is adapted to grip the object using vacuum formed in the internal chamber and wherein the inflatable gripper element is adapted to be inflated using the pressure source. The method includes adjusting a position of the flexible gripper element with respect to the housing by moving the flexible gripper element towards or away from the housing, positioning the inflatable gripper against the object, inflating the inflatable gripper using the pressure source, and forming a vacuum in the internal chamber using the vacuum source, wherein the vacuum gripper device is adapted to vacuum grip the object while the inflatable gripper element is inflated.

Abstract translation: 柔性真空夹具装置和夹持方法。 该装置包括壳体，限定内部腔室并且径向或周向可膨胀的可充气夹持器元件，该可膨胀夹持器元件具有适于夹持物体的前端和联接到壳体的后端，真空源与 所述可充气夹持器元件的内部腔室和与所述可膨胀夹具连通的压力源，其中所述真空夹持器装置适于使用形成在所述内部腔室中的真空夹持所述物体，并且其中所述可充气抓爪元件适于使用 压力源。 该方法包括通过将柔性夹持器元件朝向或远离壳体移动来调节柔性夹持器元件相对于壳体的位置，将可充气抓爪定位在对象上，使用压力源使可充气夹持器充气，并形成真空 在使用真空源的内部室中，其中真空夹持器装置适于在充气夹持器元件膨胀的同时真空地夹持物体。

公开(公告)号：US06341808B1

公开(公告)日：2002-01-29

申请号：US09607137

申请日：2000-06-29

Applicant: Robert L. Baan ,  Richard J. Cassidy ,  John R. Lankard, Jr. ,  Gerald Henry Leino ,  Raymond H. Turcotte ,  James Utter

Inventor： Robert L. Baan ,  Richard J. Cassidy ,  John R. Lankard, Jr. ,  Gerald Henry Leino ,  Raymond H. Turcotte ,  James Utter

IPC: B25J1506

CPC classification number: B65G47/91 ,  B25B11/005 ,  B25B11/007 ,  B25J15/0616

Abstract: Disclosed is a flexible sheet handling apparatus including a frame having a vacuum passage located around the periphery of the frame. There is also a porous, polymeric plug which covers the vacuum passage. When a vacuum is applied to the vacuum passage and the porous, polymeric plug, a flexible sheet in contact with the porous, polymeric plug is uniformly held only around the periphery of the flexible sheet by the applied vacuum.

Abstract translation: 公开了一种柔性片材处理装置，其包括具有位于框架的周边周围的真空通道的框架。 还有一个覆盖真空通道的多孔聚合物塞子。 当对真空通道和多孔聚合物塞施加真空时，通过施加的真空将与多孔聚合物塞接触的柔性片均匀地保持在柔性片的周边周围。

公开(公告)号：US06328362B1

公开(公告)日：2001-12-11

申请号：US09624859

申请日：2000-07-24

Applicant: Takeyoshi Isogai ,  Hiroshi Katsumi ,  Noriaki Iwaki

Inventor： Takeyoshi Isogai ,  Hiroshi Katsumi ,  Noriaki Iwaki

IPC: B25J1506

CPC classification number: H05K13/0409 ,  Y10T29/53178

Abstract: An electric-component mounting head, including a support member, a suction nozzle which applies a suction to an electric component and thereby holds the component, and a nozzle holder which is supported by the support member, which holds the nozzle such that the nozzle is movable relative to the support member in a direction parallel to an axis line of the nozzle, and which comprises a housing and a piston fitted in the housing such that one of the housing and the piston that is connected to the nozzle is movable relative to the other of the housing and the piston that is connected to the support member, the nozzle holder having at least one pressure chamber which is defined by at least one of axially opposite end surfaces of the piston and the housing, at least one communication opening which communicates with the one pressure chamber, two guide surfaces which are supported by the housing and the piston, respectively, and cooperate with each other to guide the relative movement of the housing and the piston, and a gas-supply passage which opens in a space provided between the two guide surfaces, at at least two positions axis-symmetric with each other with respect to an axis line of the piston, and supplies a pressurized gas to the space.

Abstract translation: 一种电气部件安装头，包括支撑构件，向电气部件施加吸力并由此保持部件的吸嘴，以及由支撑部件支撑的喷嘴保持器，其保持喷嘴，使得喷嘴为 在平行于喷嘴的轴线的方向上相对于支撑构件可移动，并且其包括壳体和装配在壳体中的活塞，使得连接到喷嘴的壳体和活塞中的一个可相对于 连接到支撑构件的壳体和活塞中的另一个，喷嘴保持器具有由活塞和壳体的轴向相对端表面中的至少一个限定的至少一个压力室，至少一个连通开口，其连通 一个压力室，分别由壳体和活塞支撑的两个引导表面，并相互配合以引导相对运动 壳体和活塞，以及气体供给通道，其在设置在两个引导表面之间的空间中，相对于活塞的轴线彼此轴对称的至少两个位置开口，并将加压气体 空间。

公开(公告)号：US06318777B1

公开(公告)日：2001-11-20

申请号：US09417300

申请日：1999-10-13

Applicant: Hideyuki Tanaka ,  Kazumi Okamoto

Inventor： Hideyuki Tanaka ,  Kazumi Okamoto

IPC: B25J1506

CPC classification number: H05K13/0409 ,  Y10S294/907

Abstract: A suction mechanism for an IC, in which a hollow shaft incorporating a suction pad at its lower end part is supported by a holder so as to be vertically slidable, and the suction pad is made into resilient contact with an IC accommodated in a recess on a tray when the holder is lowered. A stopper formed therein with a step part projected downward so as to laterally cover the suction pad is attached to the lower end part of the hollow shaft; the lower end of the step part is located above an IC contact surface of the suction pad, the lower surface of the stopper has at least a width with which the stopper is prevented from sinking into the recess on the tray, and a distance between the lower surface of the stopper to the IC contact surface of the suction pad is shorter than the depth of the recess on the tray.

Abstract translation: 一种用于IC的吸入机构，其中在其下端部处包括吸垫的空心轴由保持器支撑以便可上下滑动，并且吸盘与容纳在凹部中的IC形成弹性接触 当托架下降时托盘。 形成在其中的具有向下突出以便横向覆盖吸盘的台阶部的止动件安装在中空轴的下端部; 台阶部分的下端位于吸盘的IC接触表面的上方，止动件的下表面至少具有防止止动件下沉到托盘上的凹部中的宽度， 止动件的下表面到吸盘的IC接触表面比托盘上的凹槽的深度短。

公开(公告)号：US06817639B2

公开(公告)日：2004-11-16

申请号：US10212775

申请日：2002-08-07

Applicant: Kurt Schmalz ,  Thomas Eisele ,  Gernot Schmierer

Inventor： Kurt Schmalz ,  Thomas Eisele ,  Gernot Schmierer

IPC: B25J1506

CPC classification number: B65G47/91 ,  B25B11/005 ,  B25B11/007 ,  B25J15/0616 ,  Y10S294/907

Abstract: Under pressure handling device comprising an under pressure generator, a device for controlling the under pressure and several grippers which engage on a work piece to be handled, wherein each gripper is provided with a device for controlling the under pressure, a sensor for detecting state variables on the gripper and an evaluation electronics to which the device for controlling the under pressure and the sensor are connected.

Abstract translation: 在压力处理装置下，包括一个下压力发生器，一个用于控制下压力的装置和几个夹持器，其接合在待处理的工件上，其中每个夹具设置有用于控制欠压的装置，用于检测状态变量的传感器 在夹具和评估电子器件上连接用于控制欠压和传感器的装置。

公开(公告)号：US06631935B1

公开(公告)日：2003-10-14

申请号：US09632236

申请日：2000-08-04

Applicant: Sean A. Casarotti ,  Alexander J. Berger ,  Frank E. Kretz

Inventor： Sean A. Casarotti ,  Alexander J. Berger ,  Frank E. Kretz

IPC: B25J1506

CPC classification number: H01L21/67259 ,  H01L21/6838 ,  Y10S294/907 ,  Y10S414/141

Abstract: An end-effector includes multiple vortex chucks for supporting a wafer. Vortex chucks are located along the periphery of the end-effector to help prevent a flexible wafer from curling. The end-effector has limiters to restrict the lateral movement of a supported wafer. In one example, the end-effector has a detector for detecting the presence of a wafer. The detector is mounted at a shallow angle to allow the end-effector to be positioned close to a wafer to be picked-up, thereby allowing detection of deformed wafers contained in a wafer cassette. The shallow angle of the detector also minimizes the thickness of the end-effector. Also disclosed is a wafer station with features similar to that of the end-effector.

Abstract translation: 末端执行器包括用于支撑晶片的多个涡流卡盘。 涡流卡盘位于末端执行器的周边，以帮助防止柔性晶片卷曲。 末端执行器具有限制器以限制支撑的晶片的横向移动。 在一个示例中，末端执行器具有用于检测晶片存在的检测器。 检测器以较小的角度安装，以使末端执行器靠近晶片定位以便被拾起，从而允许检测包含在晶片盒中的变形的晶片。 检测器的浅角度也使端部执行器的厚度最小化。 还公开了具有与末端执行器相似的特征的晶片站