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1.发明授权公开(公告)号：US11708620B2
公开(公告)日：2023-07-25
申请号：US15316245
申请日：2015-05-28
发明人： Shinjiro Kuwayama
摘要： Steel sheets for hot stamping accommodated in a far-infrared radiation multi-stage type heating furnace are stably supported over a long period of time using steel sheet support members having a small projected area and inhibited from thermally deforming. The far-infrared radiation multi-stage type heating furnace includes: heating units and a ceiling unit arranged in a vertical direction with multiple stages to accommodate aluminum-coated steel sheets or zinc- coated steel sheets for hot stamping; and far-infrared radiation heaters disposed within the heating units and the ceiling unit to heat the steel sheets for hot stamping to a temperature ranging from the Ac3 transformation temperature to 950° C. Steel sheet support members are mounted to the heating units to support the steel sheets for hot stamping by point contact or line contact with the steel sheets for hot stamping.
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公开(公告)号：US08845955B2
公开(公告)日：2014-09-30
申请号：US13376946
申请日：2010-06-08
IPC分类号： C21D1/74 , H05B6/10 , C21D9/00 , F27B5/14 , H05B6/36 , F27B5/04 , F27D15/02 , C21D1/62 , F27B5/02 , C22F1/10 , H05B6/44 , F27D9/00 , C21D1/40 , F27B5/12 , C22F1/00
CPC分类号： F27B5/02 , C21D1/40 , C21D1/62 , C21D9/0018 , C21D9/0062 , C22F1/002 , C22F1/10 , F27B5/04 , F27B5/12 , F27B5/14 , F27D9/00 , F27D15/02 , H05B6/101 , H05B6/36 , H05B6/44 , Y02P10/253
摘要： A heating section 20 having heating elements using carbon which generates heat when a high-frequency electric current is fed to a coil whose pitch can be adjusted as desired is arranged in a heating chamber 10. A cooling chamber 80 configured to cool metal is disposed below the heating chamber 10 in communication with the heating chamber 10 via a connection section 60. A water-cooled vertically movable shaft 90 which is capable of supporting the metal to be heat-treated and entering the heating chamber 10 is disposed so as to penetrate through the bottom portion of the cooling chamber 80. A gas introducing pipe 81 configured to introduce gas for cooling heated metal to be heat-treated supported by the water-cooled vertically movable shaft 90 and moved from the heating chamber 10 to the cooling chamber 80 is disposed in the cooling chamber 80.
摘要翻译： 在加热室10内设置加热部20，该加热部20具有使用碳的发热元件，当将高频电流供给到可以根据需要进行调整的线圈的线圈时，产生热量。在冷却室80内配置冷却金属 加热室10经由连接部60与加热室10连通。能够支撑待热处理并进入加热室10的金属的水冷可升降轴90被设置成穿透 冷却室80的底部。气体导入管81，被配置为引导用于冷却由水冷可升降轴90支撑并被从加热室10移动到冷却室80的受热处理的加热金属的气体， 设置在冷却室80中。
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公开(公告)号：US08591824B2
公开(公告)日：2013-11-26
申请号：US13338378
申请日：2011-12-28
CPC分类号： F27B17/0025 , F27B5/02 , F27B5/04 , F27D7/06
摘要： The heat treating furnace for the gas reaction includes an outer body, an inner body, a heating mechanism, gas supplying mechanism, and a controller. Using the controller to control the amount of gas supply effectively keeps the first pressure (P1) in the gas circulation chamber outside the inner body greater than the second pressure (P2) in the reaction chamber inside the inner body all the time. In this way, the flow rate of gas inlet, reaction rate, cooling rate can be facilitated, and the uniformity of the thin film and the operational safety can be improved.
摘要翻译： 用于气体反应的热处理炉包括外体，内体，加热机构，供气机构和控制器。 使用控制器控制气体供给量有效地使内体内的气体循环室中的第一压力（P1）大于内体内的反应室中的第二压力（P2）。 这样，可以促进进气流量，反应速度，冷却速度，并且可以提高薄膜的均匀性和操作安全性。
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公开(公告)号：US20030071029A1
公开(公告)日：2003-04-17
申请号：US10268469
申请日：2002-10-10
IPC分类号： F27D011/00 , F27B005/14
CPC分类号： F26B25/06 , F26B5/04 , F26B5/044 , F26B25/063 , F27B5/02 , F27B5/04 , F27B17/00 , F27D19/00 , F27D21/0014
摘要： A vacuum oven for decontaminating items, a system incorporating multiple vacuum ovens and a method of operating such system are provided. The ovens are portable. They can have a vacuum drawn in them and can be heated by being coupled to a vacuum and a power source, respectively at a first location and then be decoupled from the vacuum and power sources and moved to a second location such as a glove box or clean room while still maintaining a vacuum.
摘要翻译： 提供用于净化物品的真空烘箱，包括多个真空炉的系统和操作该系统的方法。 烤箱是便携式的。 它们可以在其中吸入真空并且可以通过分别在第一位置处耦合到真空和电源来加热，然后与真空和电源分离并移动到第二位置，例如手套箱或 洁净室，同时保持真空。
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公开(公告)号：US4032290A
公开(公告)日：1977-06-28
申请号：US689554
申请日：1976-05-24
摘要： A muffle seal for a high temperature furnace in which a quartz or similar muffle is attached to an associated metal structure to provide substantial sealing of gas in the muffle even at extremely high operating temperatures. As employed in a multi-zone furnace having a high temperature quartz muffle section and a lower temperature metal muffle section joined thereto via a gas or gas and heat barrier, the quartz muffle is joined to the barrier by a peripheral chamber provided around the end of the quartz muffle confronting the barrier, the chamber being sealed to surfaces of the muffle and the barrier by porous gaskets. A sealing gas is introduced at above atmospheric pressure to the peripheral chamber, the gas being controllably transmitted through the porous gaskets to provide isolation against leakage of gas within the quartz muffle. The novel seal can also be employed to join quartz and metal muffle sections without a barrier therebetween.
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公开(公告)号：US11971216B1
公开(公告)日：2024-04-30
申请号：US17561152
申请日：2021-12-23
发明人： Kevin Lukhard , Timothy Western , Thomas Tran
CPC分类号： F27B5/02 , F27B5/12 , F27D5/0006
摘要： In some examples, a multilevel retort assembly. The assembly includes a base defining a base perimeter; and a plurality of shells. Each shell has a diffuser plate support and a perimeter with a substantially similar shape as the base perimeter. The plurality of shells are stacked on each other, mechanically supported by the base, and surround an inner retort volume. The at least one shell of the plurality of shells defines a removable window. The assembly also includes a plurality of diffuser plates, each diffuser plate supported by a corresponding diffuser plate support of the plurality of diffuser plate supports.
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公开(公告)号：US20170370648A1
公开(公告)日：2017-12-28
申请号：US15700479
申请日：2017-09-11
CPC分类号： F27B9/12 , C21D1/06 , C21D9/0018 , C21D9/0062 , C23C8/20 , F27B5/02 , F27B5/12 , F27B5/13 , F27B9/028 , F27B9/042 , F27B9/2407 , F27B17/0016 , F27B2009/122 , F27B2009/126 , F27D3/0024 , F27D7/00 , F27D9/00 , F27D15/0206 , F27D99/0073
摘要： A heat treatment system includes heating chambers configured to perform heat treatment on objects to be treated, and a conveyance device configured to load each of the objects to be treated into the heating chambers, unload the object to be treated from the heating chambers, and convey the object to be treated under an oxygen-free atmosphere, wherein the conveyance device includes a cooling device configured to perform cooling treatment on the object to be treated.
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公开(公告)号：US20170254592A1
公开(公告)日：2017-09-07
申请号：US15599062
申请日：2017-05-18
发明人： Kazuhiko KATSUMATA
CPC分类号： F27D7/06 , C21D1/76 , C21D1/773 , F27B5/02 , F27B5/04 , F27B2005/062 , F27D2007/063 , F27D2007/066 , F27D2009/0075
摘要： A thermal treatment device includes a heating chamber which heats an object to be treated; and a moisture removal chamber which is provided adjacent to the heating chamber to put in and out of the object to be treated toward the heating chamber, and in which a vacuum atmosphere is created in the periphery of the object to be treated.
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公开(公告)号：US20100059507A1
公开(公告)日：2010-03-11
申请号：US12417797
申请日：2009-04-03
申请人： Ga-Lane Chen
发明人： Ga-Lane Chen
CPC分类号： F27D11/12 , F27B5/02 , F27B5/04 , F27B17/0016 , F27D7/06
摘要： An apparatus for heat treating metals includes a container configured for receiving a metal therein for heat treatment, a first power supply configured for generating a first electric field and applying a first voltage U1 represented by a following formula: U 1 = { u 1 cos ( 2 π f t ) ( ( 2 n + 1 / 2 ) π ≤ 2 π f t ≤ ( 2 n + 3 / 2 ) π ) - u 2 ( 2 n π
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10.发明授权
公开(公告)号：US4543059A
公开(公告)日：1985-09-24
申请号：US631929
申请日：1984-07-18
申请人： J. S. Whang , Andrew F. Wollmann
发明人： J. S. Whang , Andrew F. Wollmann
CPC分类号： F27B5/02 , Y10S414/137 , Y10S414/14
摘要： A cantilever tube for carrying loaded wafer boats into a diffusion furnace and confining flow of gas through the wafers includes an elongated slot extending from an open end of the tube to a predetermined region in which the wafer boats are positioned, the wafer boats abutting each other and forming a sealing cover for the elongated slot. A narrow boat carrier supported on a carriage system extends through the elongated slot and carries a wafer boat loaded with wafers into the open end and to the predetermined region in the cantilever tube without allowing either the carrier, or the wafer boat, or the wafers to touch the cantilever tube. The carrier lowers the boat onto the bottom inner surface of the tube, causing the boat to cover a portion of the elongated slot. The procedure is repeated for subsequent wafer boats, each of which abuts the previous one, to effectively close and seal the elongated slot when all of the wafer boats are positioned inside the cantilever tube.
摘要翻译： 用于将加载的晶片舟携带到扩散炉中并且限制气体流过晶片的悬臂管包括从管的开口端延伸到晶片舟定位的预定区域的细长槽，晶片舟彼此邻接 并形成用于细长槽的密封盖。 支撑在托架系统上的窄船架延伸穿过细长槽并将装载有晶片的晶片舟携带在开放端和悬臂管中的预定区域，而不允许载体或晶片舟或晶片 触摸悬臂管。 载体将船降低到管的底部内表面上，导致船覆盖细长槽的一部分。 当所有的晶片舟都位于悬臂管内时，对于后续的晶片舟重复该过程，每个晶片舟都与前一个相邻，以便有效地关闭和密封细槽。
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