Mesh and printing screen for screen printing and a method for the
preparation thereof
    1.
    发明授权
    Mesh and printing screen for screen printing and a method for the preparation thereof 失效
    丝网印刷丝网印刷及其制备方法

    公开(公告)号:US4741920A

    公开(公告)日:1988-05-03

    申请号:US883172

    申请日:1986-07-08

    IPC分类号: B41N1/24 G03F7/12 B05D3/06

    CPC分类号: B41N1/247 G03F7/12

    摘要: A greatly improved printing screen used for screen printing is provided in respect of the durability in printing, resistance against solvents and antistatic performance based on a mesh of polyester or nylon filaments. According to the invention, the base mesh is subjected to exposure to low temperature plasma of an inorganic gas prior to coating with a photosensitive resin composition in the form of an aqueous emulsion. When the plasma-treated mesh is coated, prior to coating with the photosensitive resin emulsion, with a surface active agent or when the photosensitive resin emulsion is admixed with a surface active agent, further improvement can be obtained in the antistatic performance of the screen. When a base screen dyed in yellow is used, the drawbacks caused by halation in the pattern-wise exposure of the screen to light can be greatly reduced.

    摘要翻译: 关于印刷耐久性,耐溶剂性和基于聚酯或尼龙丝网的抗静电性能,提供了用于丝网印刷的大大改进的印刷丝网。 根据本发明,在用水乳液形式的感光性树脂组合物涂布之前,将基底网暴露于无机气体的低温等离子体。 当等离子体处理的网被涂覆时,在用感光性树脂乳液涂布之前,用表面活性剂,或当将感光性树脂乳液与表面活性剂混合时,可以在屏幕的抗静电性能方面得到进一步的改进。 当使用黄色染色的基本屏幕时,可以大大降低由于屏幕对于光的图案曝光而产生的不利影响。

    COMPOSITE SUBSTRATE, METHOD FOR FORMING NANOCARBON FILM, AND NANOCARBON FILM

    公开(公告)号:US20180265360A1

    公开(公告)日:2018-09-20

    申请号:US15534652

    申请日:2015-12-16

    摘要: Provided is a composite substrate which is provided with: a single crystal silicon carbide thin film 11 having a thickness of 1μm or less; a handle substrate 12 which supports the single crystal silicon carbide thin film 11 and is formed from a heat-resistant material (excluding single crystal silicon carbide) having a heat resistance of not less than 1,100° C.; and an intervening layer 13 which has a thickness of 1μm or less and is arranged between the single crystal silicon carbide thin film 11 and the handle substrate 12, and which is formed from at least one material selected from among silicon oxide, silicon nitride, aluminum oxide, aluminum nitride, zirconium oxide, silicon and silicon carbide, or from at least one metal material selected from among Ti, Au, Ag, Cu, Ni, Co, Fe, Cr, Zr, Mo, Ta and W. This composite substrate according to the present invention enables the formation of a nanocarbon film having few defects at low cost.

    HEAT-CURABLE MALEIMIDE RESIN COMPOSITION FOR RTM, FIBER-REINFORCED COMPOSITE MATERIAL AND RADOME

    公开(公告)号:US20230133834A1

    公开(公告)日:2023-05-04

    申请号:US17957378

    申请日:2022-09-30

    IPC分类号: C08J5/04 C08L33/24

    摘要: Provided are a heat-curable maleimide resin composition for RTM that is used to produce a fiber-reinforced composite material such as FRP, and is superior in dielectric properties; and a fiber-reinforced composite material using such composition. The composition contains: (A-1) a maleimide compound having at least one dimer acid skeleton-derived hydrocarbon group per one molecule, and having a viscosity of not higher than 20 Pa·s; (A-2) a maleimide compound having at least one dimer acid skeleton-derived hydrocarbon group per one molecule, having a viscosity of greater than 20 Pa·s, and exhibiting a fluidity at 25° C.; (B) a radical polymerization initiator; and (C) a polymerization inhibitor, wherein the viscosities of the components (A-1) and (A-2) are measured in accordance with a method described in JIS Z8803:2011, at a measurement temperature of 25° C., and using a Brookfield-type rotary viscometer with a rotation rate of a spindle being set to 5 rpm.

    (POLY)THIOPHENE-(POLY)SILOXANE BLOCK COPOLYMER AND PRODUCTION METHOD THEREOF

    公开(公告)号:US20230125340A1

    公开(公告)日:2023-04-27

    申请号:US17915589

    申请日:2021-03-11

    发明人: Shoji FUJITA

    IPC分类号: C08G77/42 C08G77/48 C08G77/08

    摘要: Provided are a (poly)thiophene-(poly)siloxane block copolymer and a production method of a (poly)arylene-(poly)siloxane block copolymer, where the production method is capable of employing raw materials that are readily accessible, produces no metal salt as a by-product, and brings about a high conversion rate. The (poly)thiophene-(poly)siloxane block copolymer contains a structure represented by the following formula (1): wherein each R1 independently represents a hydrogen atom, a halogen atom, a hydroxy group, a hydrocarbon group having 1 to 20 carbon atoms, or an alkoxy group having 1 to 10 carbon atoms, and a bond may be formed between two R1s; each R2 independently represents a hydrocarbon group having 1 to 20 carbon atoms; a is a number of 1 to 1,000; b is a number of 2 to 2,000; c is a number of 1 to 1,000.

    Substrate defect inspection method and substrate defect inspection apparatus

    公开(公告)号:US11624712B2

    公开(公告)日:2023-04-11

    申请号:US17406743

    申请日:2021-08-19

    摘要: A substrate defect inspection method includes: irradiating a target substrate with an EUV beam from an EUV illumination source by using a first focusing optical system; guiding a scattered reflected beam, but no specularly-reflected beam, among beams reflected from the target substrate to a light receiving surface of a sensor by using a second focusing optical system; and determining that a defect is present at an irradiation spot of the target substrate with the EUV beam when an intensity of the received scattered reflected beam exceeds a predetermined threshold; the method further including, before the irradiation of the target substrate with the EUV beam: a reflectance acquisition step of acquiring a reflectance of the target substrate to the EUV beam; and a threshold computation step of setting the predetermined threshold based on the reflectance acquired in the reflectance acquisition step.