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1.发明授权
公开(公告)号：US4741920A
公开(公告)日：1988-05-03
申请号：US883172
申请日：1986-07-08
申请人： Susumu Ueno , Toru Nakanishi , Kenji Fushimi , Keiichi Ishikawa , Yasuo Emori
发明人： Susumu Ueno , Toru Nakanishi , Kenji Fushimi , Keiichi Ishikawa , Yasuo Emori
摘要： A greatly improved printing screen used for screen printing is provided in respect of the durability in printing, resistance against solvents and antistatic performance based on a mesh of polyester or nylon filaments. According to the invention, the base mesh is subjected to exposure to low temperature plasma of an inorganic gas prior to coating with a photosensitive resin composition in the form of an aqueous emulsion. When the plasma-treated mesh is coated, prior to coating with the photosensitive resin emulsion, with a surface active agent or when the photosensitive resin emulsion is admixed with a surface active agent, further improvement can be obtained in the antistatic performance of the screen. When a base screen dyed in yellow is used, the drawbacks caused by halation in the pattern-wise exposure of the screen to light can be greatly reduced.
摘要翻译： 关于印刷耐久性，耐溶剂性和基于聚酯或尼龙丝网的抗静电性能，提供了用于丝网印刷的大大改进的印刷丝网。 根据本发明，在用水乳液形式的感光性树脂组合物涂布之前，将基底网暴露于无机气体的低温等离子体。 当等离子体处理的网被涂覆时，在用感光性树脂乳液涂布之前，用表面活性剂，或当将感光性树脂乳液与表面活性剂混合时，可以在屏幕的抗静电性能方面得到进一步的改进。 当使用黄色染色的基本屏幕时，可以大大降低由于屏幕对于光的图案曝光而产生的不利影响。
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公开(公告)号：US20180265360A1
公开(公告)日：2018-09-20
申请号：US15534652
申请日：2015-12-16
发明人： Shoji Akiyama , Yoshihiro Kubota , Makoto Kawai , Shigeru Konishi , Hiroshi Mogi
IPC分类号： C01B32/184 , B32B9/00 , B32B9/04 , B32B37/18 , B32B38/00 , C30B29/36 , C01B32/956 , H01L21/02 , H01L29/16 , H01L29/34
摘要： Provided is a composite substrate which is provided with: a single crystal silicon carbide thin film 11 having a thickness of 1μm or less; a handle substrate 12 which supports the single crystal silicon carbide thin film 11 and is formed from a heat-resistant material (excluding single crystal silicon carbide) having a heat resistance of not less than 1,100° C.; and an intervening layer 13 which has a thickness of 1μm or less and is arranged between the single crystal silicon carbide thin film 11 and the handle substrate 12, and which is formed from at least one material selected from among silicon oxide, silicon nitride, aluminum oxide, aluminum nitride, zirconium oxide, silicon and silicon carbide, or from at least one metal material selected from among Ti, Au, Ag, Cu, Ni, Co, Fe, Cr, Zr, Mo, Ta and W. This composite substrate according to the present invention enables the formation of a nanocarbon film having few defects at low cost.
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公开(公告)号：US20230135575A1
公开(公告)日：2023-05-04
申请号：US17796145
申请日：2021-02-02
发明人： Yu Yanase
摘要： The present invention provides a frame-shaped pellicle frame having an upper end surface on which a pellicle film is provided and a lower end surface facing a photomask, characterized in that the inner surface of the pellicle frame has a region where a roughness curve kurtosis (Rku) is 3.0 or less, and also provides a pellicle, an exposure original plate with a pellicle and an exposure method, and a method for manufacturing a semiconductor device or a liquid crystal display board. The present invention can provide a pellicle frame that prevents scattered light derived from the frame and facilitates inspection of foreign matter adhered to the frame surface, and can also provide a pellicle using the pellicle frame.
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4.发明申请公开(公告)号：US20230133834A1
公开(公告)日：2023-05-04
申请号：US17957378
申请日：2022-09-30
发明人： Yoshihiro TSUTSUMI , Tadaharu IKEDA
摘要： Provided are a heat-curable maleimide resin composition for RTM that is used to produce a fiber-reinforced composite material such as FRP, and is superior in dielectric properties; and a fiber-reinforced composite material using such composition. The composition contains: (A-1) a maleimide compound having at least one dimer acid skeleton-derived hydrocarbon group per one molecule, and having a viscosity of not higher than 20 Pa·s; (A-2) a maleimide compound having at least one dimer acid skeleton-derived hydrocarbon group per one molecule, having a viscosity of greater than 20 Pa·s, and exhibiting a fluidity at 25° C.; (B) a radical polymerization initiator; and (C) a polymerization inhibitor, wherein the viscosities of the components (A-1) and (A-2) are measured in accordance with a method described in JIS Z8803:2011, at a measurement temperature of 25° C., and using a Brookfield-type rotary viscometer with a rotation rate of a spindle being set to 5 rpm.
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公开(公告)号：US20230125340A1
公开(公告)日：2023-04-27
申请号：US17915589
申请日：2021-03-11
发明人： Shoji FUJITA
摘要： Provided are a (poly)thiophene-(poly)siloxane block copolymer and a production method of a (poly)arylene-(poly)siloxane block copolymer, where the production method is capable of employing raw materials that are readily accessible, produces no metal salt as a by-product, and brings about a high conversion rate. The (poly)thiophene-(poly)siloxane block copolymer contains a structure represented by the following formula (1): wherein each R1 independently represents a hydrogen atom, a halogen atom, a hydroxy group, a hydrocarbon group having 1 to 20 carbon atoms, or an alkoxy group having 1 to 10 carbon atoms, and a bond may be formed between two R1s; each R2 independently represents a hydrocarbon group having 1 to 20 carbon atoms; a is a number of 1 to 1,000; b is a number of 2 to 2,000; c is a number of 1 to 1,000.
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公开(公告)号：US11635691B2
公开(公告)日：2023-04-25
申请号：US16921023
申请日：2020-07-06
发明人： Daisuke Kori , Takashi Sawamura , Keisuke Niida , Seiichiro Tachibana , Takeru Watanabe , Tsutomu Ogihara
IPC分类号： G03F7/09 , C08G61/12 , C08G61/10 , C08J5/18 , G03F7/16 , G03F7/075 , G03F7/11 , G03F7/20 , G03F7/32 , H01L21/311 , H01L21/027
摘要： A composition for forming an organic film contains a polymer having a partial structure shown by the following general formula (1) as a repeating unit, and an organic solvent. Each of AR1 and AR2 represents a benzene ring or naphthalene ring which optionally have a substituent; W1 represents a particular partial structure having a triple bond, and the polymer optionally contains two or more kinds of W1; and W2 represents a divalent organic group having 6 to 80 carbon atoms and at least one aromatic ring. This invention provides: a polymer curable even under film formation conditions in an inert gas and capable of forming an organic film which has not only excellent heat resistance and properties of filling and planarizing a pattern formed in a substrate, but also favorable film formability onto a substrate with less sublimation product; and a composition for forming an organic film, containing the polymer.
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公开(公告)号：US11635690B2
公开(公告)日：2023-04-25
申请号：US16916453
申请日：2020-06-30
发明人： Jun Hatakeyama , Masaki Ohashi , Takayuki Fujiwara
IPC分类号： G03F7/039 , G03F7/004 , C08F220/18 , C08F212/14 , G03F7/32 , G03F7/16 , G03F7/20 , G03F7/38
摘要： A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of fluorosulfonic acid having an iodized or brominated aromatic ring, and recurring units (b1) having an acid labile group-substituted carboxyl group and/or recurring units (b2) having an acid labile group-substituted phenolic hydroxyl group exhibits a high sensitivity, high resolution, low edge roughness and dimensional uniformity, and forms a pattern of good profile after exposure and development.
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公开(公告)号：US20230117335A1
公开(公告)日：2023-04-20
申请号：US17793461
申请日：2021-01-15
发明人： Yu Yanase
IPC分类号： G03F1/64
摘要： Provided are a pellicle frame, a pellicle, a method for inspecting a pellicle, a pellicle-attached exposure original plate and exposure method, and a method for manufacturing a semiconductor or a liquid crystal display board.
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公开(公告)号：US11629119B2
公开(公告)日：2023-04-18
申请号：US17751974
申请日：2022-05-24
发明人： Takeshi Kinsho , Yusuke Nagae , Shogo Tsukaguchi , Yasuhiko Kutsuwada , Tatsuya Hojo , Takeru Watanabe
IPC分类号： C07C231/14 , C07C231/20
摘要： The present invention provides a process for preparing 2-methyl-N-(2′-methylbutyl) butanamide of the following formula (1):the process comprising: subjecting an α-arylethyl-2-methylbutylamine compound of the following general formula (2): wherein Ar represents a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, to N-2-methylbutyrylation to form an N-α-arylethyl-2-methyl-N-(2′-methylbutyl)butanamide compound of the following general formula (3): wherein Ar is as defined above, and removing the α-arylethyl group of the resulting compound (3) to form 2-methyl-N-(2′ -methylbutyl)butanamide (1).
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公开(公告)号：US11624712B2
公开(公告)日：2023-04-11
申请号：US17406743
申请日：2021-08-19
发明人： Tsuneo Terasawa , Yukio Inazuki , Hideo Kaneko
IPC分类号： G01N21/95 , G01N21/88 , G01N21/956
摘要： A substrate defect inspection method includes: irradiating a target substrate with an EUV beam from an EUV illumination source by using a first focusing optical system; guiding a scattered reflected beam, but no specularly-reflected beam, among beams reflected from the target substrate to a light receiving surface of a sensor by using a second focusing optical system; and determining that a defect is present at an irradiation spot of the target substrate with the EUV beam when an intensity of the received scattered reflected beam exceeds a predetermined threshold; the method further including, before the irradiation of the target substrate with the EUV beam: a reflectance acquisition step of acquiring a reflectance of the target substrate to the EUV beam; and a threshold computation step of setting the predetermined threshold based on the reflectance acquired in the reflectance acquisition step.
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