PERIODIC-PATTERN BACKGROUND REMOVAL
    2.
    发明公开

    公开(公告)号:US20240020819A1

    公开(公告)日:2024-01-18

    申请号:US18220636

    申请日:2023-07-11

    IPC分类号: G06T7/00 G06T5/10

    摘要: Various examples described herein include various mechanisms, techniques, and methods to subtract collected signals caused by a periodic pattern formed on substrates to enable a higher level of defect detection on substrates. Signals detected by various types of metrology and substrate-inspection systems that are caused by periodic patterns on inspected substrates can be reduced or eliminated by, for example, a Fourier analysis of the detected signals. Both gray-scale value thresholds and area thresholds may be applied after the Fourier analysis of the image and are sufficient for defect detection on an image with a substantially-reduced number of false defects or no defects being present in a final image produced after processing. Other techniques and methods are also disclosed.

    MULTIPLE SOURCES OF SIGNALS FOR HYBRID METROLOGY USING PHYSICAL MODELING AND MACHINE LEARNING

    公开(公告)号:US20230418995A1

    公开(公告)日:2023-12-28

    申请号:US18339973

    申请日:2023-06-22

    IPC分类号: G06F30/20

    CPC分类号: G06F30/20

    摘要: Physical modeling and machine learning modeling are combined to analyze signals from multiple data sources, including metrology data acquired from different tool sets or at different process steps, and data related to processing equipment, such as sensor data, process parameters, Advanced Process Control (APC) parameters, context data, etc. At least one physical model is generated and used to analyze metrology signals from metrology tools to extract measurement results for key and non-key parameters of a structure on a sample. At least one machine learning model is built and trained to predict parameters of interest based on the extracted measurement results as well as additional data, including raw measured signals, reference data and/or design of experiment (DOE) data, and data from different tool sets or the same tool as used for the physical modeling.

    HIGH RESOLUTION MULTI-FIELD-OF-VIEW IMAGING SYSTEM

    公开(公告)号:US20230057470A1

    公开(公告)日:2023-02-23

    申请号:US17820474

    申请日:2022-08-17

    摘要: A multichannel tunable lens system may include a review channel with a fluidic focusing device, which can adjust the focus of the channel rapidly to mitigate environmental vibrations. The review channel may generate high resolution images with reduced blur caused by vibrations or air turbulence while increasing the operating speed of the system. The review channel may include a telescope objective and eyepiece with telecentricity to generate a real image of the pupil in the fluidic focusing device. The system may also include an inspection channel to generate lower resolution images in parallel and a focus channel to determine contour information.

    MULTI-LAYER CALIBRATION FOR EMPIRICAL OVERLAY MEASUREMENT

    公开(公告)号:US20220326626A1

    公开(公告)日:2022-10-13

    申请号:US17707776

    申请日:2022-03-29

    IPC分类号: G03F7/20 G01B11/27 G03F1/70

    摘要: Overlay is determined for a device using signals measured from the device and a signal response to overlay determined from a plurality of calibration targets. Each calibration target has the same design as the device, but includes a known overlay shift. The calibration targets may be located in a scribe line, within a product area on the wafer, or on a separate calibration wafer. Each calibration target may have a different overlay shift, including zero overlay shift. The device may serve as a calibration target with zero overlay shift. The overlay shift may be in two orthogonal directions. The signal response to overlay may be determined based on a set of signals obtained from the calibration targets. A second set of signals may then be obtained from the device and the overlay determined based on the second set of signals and the determined signal response to overlay.

    OPTO-ACOUSTIC MEASUREMENT OF A TRANSPARENT FILM STACK

    公开(公告)号:US20220317025A1

    公开(公告)日:2022-10-06

    申请号:US17217990

    申请日:2021-03-30

    IPC分类号: G01N21/17 G01B11/22 G01B11/06

    摘要: A non-destructive opto-acoustic metrology device detects the presence and location of non-uniformities in a film stack that includes a large number, e.g., 50 or more, transparent layers. A transducer layer at the bottom of the film stack produces an acoustic wave in response to an excitation beam. A probe beam is reflected from the layer interfaces of the film stack and the acoustic wave to produce an interference signal that encodes data in a time domain from destructive and constructive interference as the acoustic wave propagates upward in the film stack. The data may be analyzed across the time domain to determine the presence and location of one or more non-uniformities in the film stack. An acoustic metrology target may be produced with a transducer layer configured to generate an acoustic wave with a desired acoustic profile based on characteristics of the film stack.

    Active damper for semiconductor metrology and inspection systems

    公开(公告)号:US11280381B2

    公开(公告)日:2022-03-22

    申请号:US16422511

    申请日:2019-05-24

    摘要: A damper for a semiconductor metrology or inspection system includes a pair of parallel plates with a fluid with a variable viscosity retained between plates. At least one wire is disposed between the plates, which may include one or more sets of lands and grooves. In some implementations, both plates include intermeshed lands and grooves. A controller is configured to provide a current to the at least one wire in order to adjust an electromagnetic field or a current through the fluid. The fluid may be a magnetorheological fluid or an electrorheological fluid in which the viscosity of the fluid is variable based on the electromagnetic field or current through the fluid. The controller varies the current applied to the wire to adjust the viscosity of the fluid to alter the damping of the semiconductor metrology or inspection system based on movement of the stage.

    Optical metrology device using numerical aperture reduction

    公开(公告)号:US11162897B2

    公开(公告)日:2021-11-02

    申请号:US15931297

    申请日:2020-05-13

    IPC分类号: G01N21/47 G01B11/24

    摘要: A metrology device that can determine at least one characteristics of a sample is disclosed. The metrology device includes an optical system that uses spatially coherent light with a first and a second objective lens as well as a detector that detects light reflected from the sample. The objective lenses use numerical apertures sufficient to produce a small probe size, e.g., less than 200 μm, while a spatial filter is used to reduce the effective numerical aperture of the optical system as seen by the detector to avoid loss of information and demanding computation requirements caused by the large angular spread due to large numerical apertures. The spatial filter permits light to pass in a desired range of angles, while blocking the remaining light and is positioned to prevent use of the full spatial extent of at least one of the first objective lens and the second objective lens.

    ENHANCED HEAT TRANSFER IN LIQUEFIED GAS COOLED DETECTOR

    公开(公告)号:US20210310720A1

    公开(公告)日:2021-10-07

    申请号:US16839784

    申请日:2020-04-03

    发明人: James GIVENS

    IPC分类号: F25D19/00 F25B19/00

    摘要: A horizontal Dewar flask is used with an optical metrology device, which may advantageously reduce the vertical height of the device. A thermal transfer member provides thermal transfer between a liquefied gas cooled sensor and liquefied gas in a chamber of the Dewar flask. To compensate for the loss of thermal transfer from the sensor as the liquefied gas evaporates and changes to a gaseous state, the thermal transfer member biases heat transfer to the liquefied gas that is at the bottom of the chamber. The thermal transfer member may have a larger surface area at a bottom portion of the thermal transfer member than the upper portion. For example, the thermal transfer member may include one or more projections that extend into the liquefied gas with greater density at the bottom of the chamber than at the top of the chamber.