- 专利标题: Optical metrology device using numerical aperture reduction
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申请号: US15931297申请日: 2020-05-13
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公开(公告)号: US11162897B2公开(公告)日: 2021-11-02
- 发明人: George Andrew Antonelli , Troy Daniel Ribaudo , Michael J. Hammond
- 申请人: Onto Innovation Inc.
- 申请人地址: US MA Wilmington
- 专利权人: Onto Innovation Inc.
- 当前专利权人: Onto Innovation Inc.
- 当前专利权人地址: US MA Wilmington
- 代理机构: Paradice and Li LLP
- 主分类号: G01N21/47
- IPC分类号: G01N21/47 ; G01B11/24
摘要:
A metrology device that can determine at least one characteristics of a sample is disclosed. The metrology device includes an optical system that uses spatially coherent light with a first and a second objective lens as well as a detector that detects light reflected from the sample. The objective lenses use numerical apertures sufficient to produce a small probe size, e.g., less than 200 μm, while a spatial filter is used to reduce the effective numerical aperture of the optical system as seen by the detector to avoid loss of information and demanding computation requirements caused by the large angular spread due to large numerical apertures. The spatial filter permits light to pass in a desired range of angles, while blocking the remaining light and is positioned to prevent use of the full spatial extent of at least one of the first objective lens and the second objective lens.
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