THERMOSENSITIVE RECORDING MEDIUM
    4.
    发明公开

    公开(公告)号:US20240190156A1

    公开(公告)日:2024-06-13

    申请号:US18283548

    申请日:2022-03-10

    IPC分类号: B41M5/327 B41M5/333 B41M5/44

    摘要: A thermosensitive recording medium comprising an undercoat layer provided on a substrate, and a thermosensitive recording layer containing a colorless or pale colored electron donating leuco dye and an electron accepting color developing agent provided on the undercoat layer, wherein the thermosensitive recording layer contains as the electron accepting color developing agent a urea compound represented by the following general formula (Formula 1)






    (wherein X represents —O— or —NH—, R1 represents a hydrogen atom or —SO2—R3, R3 represents a substituted or unsubstituted alkyl group, aralkyl group or aryl group, R2 represents a hydrogen atom or an alkyl group, m represents an integer of 0 to 2, and n represents 0 or 1), and wherein the undercoat layer contains 50 to 95 weight % of a pigment by solid and 50 weight % or more of plastic hollow particles by solid with respect to the pigment.

    Thermosensitive recording medium
    6.
    发明授权

    公开(公告)号:US11945249B2

    公开(公告)日:2024-04-02

    申请号:US17441059

    申请日:2020-02-25

    IPC分类号: B41M5/337 B41M5/323

    摘要: The present invention provides a thermosensitive recording medium having a high degree of water resistance and excellent surface qualities. The thermosensitive recording medium has a thermosensitive recording layer comprising a colorless or pale colored basic leuco dye and an electron accepting developing agent on a substrate, but does not have a protective layer on the thermosensitive recording layer, and the thermosensitive recording layer further comprises (i) a carboxy-modified polyvinyl alcohol as a binder, (ii) an epichlorohydrin resin and a modified polyamine/amide resin (excluding those contained in the category of epichlorohydrin resin) as crosslinking agents, and (iii) an acrylic resin with a glass transition temperature (Tg) of lower than or equal to 50 degree C. and a minimum film forming temperature (MFT) of higher than or equal to 40 degree C.