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81 条记录 (耗时 0.036 秒)

    Antireflective composition for photoresists
    2.
    发明授权
    Antireflective composition for photoresists 有权
    用于光致抗蚀剂的抗反射组合物

    公开(公告)号：US07638262B2

    公开(公告)日：2009-12-29

    申请号：US11502706

    申请日：2006-08-10

    申请人： Hengpeng Wu ,  Zhong Xiang ,  Hong Zhuang ,  Jianhui Shan ,  Jian Yin ,  Huirong Yao ,  PingHung Lu

    发明人： Hengpeng Wu ,  Zhong Xiang ,  Hong Zhuang ,  Jianhui Shan ,  Jian Yin ,  Huirong Yao ,  PingHung Lu

    IPC分类号： G03F7/095 ,  G03F7/11 ,  G03F7/38 ,  G03F7/09

    CPC分类号： G03F7/091 ,  Y10S438/952

    摘要： The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, A is a nonaromatic linking moiety, R′ and R″ are independently selected from hydrogen, Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbyl linking moiety, and, Y′ is independently a (C1-C20) hydrocarbyl linking moiety. The invention further relates to a process for imaging the antireflective coating composition.

    摘要翻译： 本发明涉及一种用于光致抗蚀剂层的抗反射涂料组合物，其包含聚合物，交联剂和酸产生剂，其中聚合物包含至少一个结构单元1，其中A是非芳族连接部分，R'和R' 独立地选自氢，Z和W-OH，其中Z是（C1-C20）烃基部分，W是（C1-C20）烃基连接部分，Y'独立地是（C1-C20）烃基 连接部分。 本发明还涉及一种用于对抗反射涂料组合物进行成像的方法。

    Antireflective composition for photoresists
    4.
    发明申请
    Antireflective composition for photoresists 有权
    用于光致抗蚀剂的抗反射组合物

    公开(公告)号：US20080038659A1

    公开(公告)日：2008-02-14

    申请号：US11502706

    申请日：2006-08-10

    申请人： Hengpeng Wu ,  Zhong Xiang ,  Hong Zhuang ,  Jianhui Shan ,  Jian Yin ,  Huirong Yao ,  PingHung Lu

    发明人： Hengpeng Wu ,  Zhong Xiang ,  Hong Zhuang ,  Jianhui Shan ,  Jian Yin ,  Huirong Yao ,  PingHung Lu

    IPC分类号： G03C1/00

    CPC分类号： G03F7/091 ,  Y10S438/952

    摘要： The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, A is a nonaromatic linking moiety, R′ and R″ are independently selected from hydrogen, Z and W—OH, where Z is a (C1-C20) hydrocarbyl moiety and W is a (C1-C20) hydrocarbyl linking moiety, and, Y′ is independently a (C1-C20) hydrocarbyl linking moiety. The invention further relates to a process for imaging the antireflective coating composition.

    摘要翻译： 本发明涉及一种用于光致抗蚀剂层的抗反射涂料组合物，其包含聚合物，交联剂和酸产生剂，其中聚合物包含至少一个结构单元1，其中A是非芳族连接部分，R'和R' '独立地选自氢，Z和W-OH，其中Z是（C 1 -C 20 -C 20）烃基部分，W是（C 1 H 12） C 20 -C 20烃基连接部分，Y'独立地为（C 1 -C 20）烃基连接部分 。 本发明还涉及一种用于对抗反射涂料组合物进行成像的方法。

    Underlayer composition for promoting self assembly and method of making and using
    5.
    发明授权
    Underlayer composition for promoting self assembly and method of making and using 有权
    促进自组装的底层成分及制作及使用方法

    公开(公告)号：US09093263B2

    公开(公告)日：2015-07-28

    申请号：US14039809

    申请日：2013-09-27

    申请人： Hengpeng Wu ,  Jian Yin ,  Guanyang Lin ,  JiHoon Kim ,  Jianhui Shan

    发明人： Hengpeng Wu ,  Jian Yin ,  Guanyang Lin ,  JiHoon Kim ,  Jianhui Shan

    IPC分类号： H01L21/02 ,  C03C15/00

    CPC分类号： H01L21/02118 ,  C08F220/14 ,  C08F220/40 ,  G03F7/00 ,  H01L21/02282 ,  C08F212/08

    摘要： Disclosed herein is a formulation for depositing a cured underlayer for promoting the formation of self assembled structures. The underlayer comprises: (a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure, (I): wherein R is chosen from H, C1-C4 alkyl, or halogen, and W is a divalent group chosen from C1-C6 alkylene, C6-C20 arylene, benzylene, or C2-C20 alkyleneoxyalkylene; (ii) optional thermal acid generator; and (c) a solvent. The invention also relates to processes of forming a pattern using the underlayer.

    摘要翻译： 本文公开了一种用于沉积固化的底层以促进自组装结构的形成的制剂。 底层包括：（a）包含至少一种具有以下结构的侧链乙烯基醚单体重复单元的聚合物：（I）：其中R选自H，C 1 -C 4烷基或卤素，W是选自 C1-C6亚烷基，C6-C20亚芳基，亚苄基或C2-C20亚烷基氧亚烷基; （ii）可选的热酸发生器; 和（c）溶剂。 本发明还涉及使用底层形成图案的工艺。

    Antireflective coating composition and process thereof
    6.
    发明授权
    Antireflective coating composition and process thereof 有权
    防反射涂料组合物及其工艺

    公开(公告)号：US08039201B2

    公开(公告)日：2011-10-18

    申请号：US11944105

    申请日：2007-11-21

    申请人： Huirong Yao ,  Zhong Xiang ,  Jian Yin ,  Weihong Liu

    发明人： Huirong Yao ,  Zhong Xiang ,  Jian Yin ,  Weihong Liu

    IPC分类号： G03C1/73 ,  G03F7/11

    CPC分类号： G03F7/091 ,  G03F7/0046

    摘要： The present invention relates to an antireflective composition comprising a polymer, a thermal acid generator and optionally a crosslinking agent, where the polymer comprises at least one hydrophobic unit (1), at least one chromophore unit (2), at least one unit with a crosslinking site (3) and optionally a unit capable of crosslinking the polymer, where, R1 to R8 are independently selected from hydrogen and C1-C4 alkyl, W1 is a fully or partially fluorinated alkylene group, X is selected from F, H and OH; W2 comprises a chromophore group, and W3 Y comprises a crosslinking site. The invention also relates to a process for using the antireflective coating composition.

    摘要翻译： 本发明涉及包含聚合物，热酸产生剂和任选的交联剂的抗反射组合物，其中所述聚合物包含至少一个疏水单元（1），至少一个生色团单元（2），至少一个具有 交联位点（3）和任选的能够交联聚合物的单元，其中R1至R8独立地选自氢和C1-C4烷基，W1是完全或部分氟化的亚烷基，X选自F，H和OH ; W2包含发色团，W3 Y包含交联位点。 本发明还涉及使用抗反射涂料组合物的方法。

    Antireflective Coating Composition and Process Thereof
    7.
    发明申请
    Antireflective Coating Composition and Process Thereof 有权
    防反射涂料组合物及其工艺

    公开(公告)号：US20090130591A1

    公开(公告)日：2009-05-21

    申请号：US11944105

    申请日：2007-11-21

    申请人： Huirong Yao ,  Zhong Xiang ,  Jian Yin ,  Weihong Liu

    发明人： Huirong Yao ,  Zhong Xiang ,  Jian Yin ,  Weihong Liu

    IPC分类号： G03C1/73 ,  G03C5/00

    CPC分类号： G03F7/091 ,  G03F7/0046

    摘要： The present invention relates to an antireflective composition comprising a polymer, a thermal acid generator and optionally a crosslinking agent, where the polymer comprises at least one hydrophobic unit (1), at least one chromophore unit (2), at least one unit with a crosslinking site (3) and optionally a unit capable of crosslinking the polymer, where, R1 to R8 are independently selected from hydrogen and C1-C4 alkyl, W1 is a fully or partially fluorinated alkylene group, X is selected from F, H and OH; W2 comprises a chromophore group, and W3 Y comprises a crosslinking site. The invention also relates to a process for using the antireflective coating composition.

    摘要翻译： 本发明涉及包含聚合物，热酸产生剂和任选的交联剂的抗反射组合物，其中所述聚合物包含至少一个疏水单元（1），至少一个生色团单元（2），至少一个具有 交联位点（3）和任选的能够交联聚合物的单元，其中R1至R8独立地选自氢和C1-C4烷基，W1是完全或部分氟化的亚烷基，X选自F，H和OH ; W2包含发色团，W3 Y包含交联位点。 本发明还涉及使用抗反射涂料组合物的方法。

    Inductor structure including inductors with negligible magnetic coupling therebetween
    9.
    发明授权
    Inductor structure including inductors with negligible magnetic coupling therebetween 有权

    公开(公告)号：US10529475B2

    公开(公告)日：2020-01-07

    申请号：US13538467

    申请日：2012-06-29

    申请人： Jian Yin ,  Michael Althar ,  Steve Rivet

    发明人： Jian Yin ,  Michael Althar ,  Steve Rivet

    IPC分类号： H01F27/24 ,  H01L27/08 ,  H01F3/08 ,  H01F3/10 ,  H01F17/04 ,  H01F27/255 ,  H02M3/158

    摘要： An embodiment of an apparatus includes first and second core regions, first and second conductors, and an isolation region. The first core region has a first permeability, and the first conductor is disposed in the first core region. The second core region has a second permeability, and the second conductor is disposed in the second core region. And the isolation region is disposed between the first and second core regions, and has a third permeability that is significantly different than the first and second permeabilities. For example, the first and second conductors may be windings of respective first and second inductors, and the isolation region, which may be attached to, or integral with, the first and second core regions, may reduce the amount of magnetic coupling between the inductors to a level that is negligible, such that the inductors may be used in applications that call for magnetically uncoupled inductors.