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16 条记录 (耗时 0.07 秒)

    Antireflective coating composition and process thereof
    1.
    发明授权
    Antireflective coating composition and process thereof 有权
    防反射涂料组合物及其工艺

    公开(公告)号：US08039201B2

    公开(公告)日：2011-10-18

    申请号：US11944105

    申请日：2007-11-21

    申请人： Huirong Yao ,  Zhong Xiang ,  Jian Yin ,  Weihong Liu

    发明人： Huirong Yao ,  Zhong Xiang ,  Jian Yin ,  Weihong Liu

    IPC分类号： G03C1/73 ,  G03F7/11

    CPC分类号： G03F7/091 ,  G03F7/0046

    摘要： The present invention relates to an antireflective composition comprising a polymer, a thermal acid generator and optionally a crosslinking agent, where the polymer comprises at least one hydrophobic unit (1), at least one chromophore unit (2), at least one unit with a crosslinking site (3) and optionally a unit capable of crosslinking the polymer, where, R1 to R8 are independently selected from hydrogen and C1-C4 alkyl, W1 is a fully or partially fluorinated alkylene group, X is selected from F, H and OH; W2 comprises a chromophore group, and W3 Y comprises a crosslinking site. The invention also relates to a process for using the antireflective coating composition.

    摘要翻译： 本发明涉及包含聚合物，热酸产生剂和任选的交联剂的抗反射组合物，其中所述聚合物包含至少一个疏水单元（1），至少一个生色团单元（2），至少一个具有 交联位点（3）和任选的能够交联聚合物的单元，其中R1至R8独立地选自氢和C1-C4烷基，W1是完全或部分氟化的亚烷基，X选自F，H和OH ; W2包含发色团，W3 Y包含交联位点。 本发明还涉及使用抗反射涂料组合物的方法。

    Antireflective Coating Composition and Process Thereof
    2.
    发明申请
    Antireflective Coating Composition and Process Thereof 有权
    防反射涂料组合物及其工艺

    公开(公告)号：US20090130591A1

    公开(公告)日：2009-05-21

    申请号：US11944105

    申请日：2007-11-21

    申请人： Huirong Yao ,  Zhong Xiang ,  Jian Yin ,  Weihong Liu

    发明人： Huirong Yao ,  Zhong Xiang ,  Jian Yin ,  Weihong Liu

    IPC分类号： G03C1/73 ,  G03C5/00

    CPC分类号： G03F7/091 ,  G03F7/0046

    摘要： The present invention relates to an antireflective composition comprising a polymer, a thermal acid generator and optionally a crosslinking agent, where the polymer comprises at least one hydrophobic unit (1), at least one chromophore unit (2), at least one unit with a crosslinking site (3) and optionally a unit capable of crosslinking the polymer, where, R1 to R8 are independently selected from hydrogen and C1-C4 alkyl, W1 is a fully or partially fluorinated alkylene group, X is selected from F, H and OH; W2 comprises a chromophore group, and W3 Y comprises a crosslinking site. The invention also relates to a process for using the antireflective coating composition.

    摘要翻译： 本发明涉及包含聚合物，热酸产生剂和任选的交联剂的抗反射组合物，其中所述聚合物包含至少一个疏水单元（1），至少一个生色团单元（2），至少一个具有 交联位点（3）和任选的能够交联聚合物的单元，其中R1至R8独立地选自氢和C1-C4烷基，W1是完全或部分氟化的亚烷基，X选自F，H和OH ; W2包含发色团，W3 Y包含交联位点。 本发明还涉及使用抗反射涂料组合物的方法。

    Positive photosensitive material
    10.
    发明授权
    Positive photosensitive material 有权
    正感光材料

    公开(公告)号：US09012126B2

    公开(公告)日：2015-04-21

    申请号：US13524790

    申请日：2012-06-15

    申请人： Weihong Liu ,  PingHung Lu ,  Chunwei Chen ,  Stephen Meyer ,  Medhat Toukhy ,  SookMee Lai

    发明人： Weihong Liu ,  PingHung Lu ,  Chunwei Chen ,  Stephen Meyer ,  Medhat Toukhy ,  SookMee Lai

    IPC分类号： G03F7/039 ,  G03F7/004

    CPC分类号： G03F7/004 ,  G03F7/0392 ,  G03F7/0397

    摘要： The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula: wherein R1-R5 are, independently, —H or —CH3, A is a linear or branched C1-C10 alkylene group, B is a C1-C12 alkyl or alicyclic group, D is a linking group that may be a chemical bond, a carboxylate group, wherein the carbonyl carbon is bonded to the polymer backbone, or a —COOCH2— group, wherein the carbonyl carbon is bonded to the polymer backbone, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C2-C10 alkylene group, G is an acid cleavable group. The invention further relates to a process for using the novel composition for forming an image.

    摘要翻译： 本发明涉及一种新型的正性光敏组合物，其具有：至少一种光致酸发生剂; 至少一种酚醛清漆聚合物; 至少一种具有聚合物主链的聚合物，所述聚合物包含下式的结构：其中R 1 -R 5独立地是-H或-CH 3，A是直链或支链C 1 -C 10亚烷基，B是C1 -C 12烷基或脂环基，D是可以是化学键的连接基团，其中羰基碳键合到聚合物主链上的羧酸酯基团或-COOCH 2 - 基团，其中羰基碳键合到聚合物上 骨架，Ar是取代或未取代的芳基或杂芳基，E是直链或支链C 2 -C 10亚烷基，G是酸可裂解基团。 本发明还涉及使用该组合物形成图像的方法。