公开(公告)号：US20140341681A1

公开(公告)日：2014-11-20

申请号：US14452748

申请日：2014-08-06

申请人： Yukihiko INAGAKI ,  Kensaku ONISHI ,  Jun YAMAMOTO

发明人： Yukihiko INAGAKI ,  Kensaku ONISHI ,  Jun YAMAMOTO

IPC分类号： H01L21/677

CPC分类号： H01L21/67769 ,  B65G1/0407 ,  H01L21/67733 ,  H01L21/67766

摘要： In a substrate processing apparatus, a storage device, an indexer block, a processing block and an interface block are arranged to line up in this order. The storage device includes a plurality of openers on which a carrier storing a plurality of substrates can be placed. The carrier is carried in the storage device. In the storage device, the carrier is transported among the plurality of openers by a transport device. The transport device includes first and second hands configured to be able to hold the carrier and move in a horizontal direction and a vertical direction. The second hand is provided below the first hand.

摘要翻译： 在基板处理装置中，按照该顺序排列存储装置，分度块，处理块和接口块。 存储装置包括多个开放器，可以放置存储多个基板的载体。 载体被携带在存储装置中。 在存储装置中，通过运送装置在多个开放装置之间运送载体。 输送装置包括构造成能够保持载体并沿水平方向和垂直方向移动的第一和第二手。 第二只手是第二只手。

公开(公告)号：US20110222994A1

公开(公告)日：2011-09-15

申请号：US13042742

申请日：2011-03-08

申请人： Yukihiko INAGAKI ,  Kensaku ONISHI ,  Jun YAMAMOTO

发明人： Yukihiko INAGAKI ,  Kensaku ONISHI ,  Jun YAMAMOTO

IPC分类号： H01L21/677

CPC分类号： H01L21/67769 ,  B65G1/0407 ,  H01L21/67733 ,  H01L21/67766

摘要： In a substrate processing apparatus, a storage device, an indexer block, a processing block and an interface block are arranged to line up in this order. The storage device includes a plurality of openers on which a carrier storing a plurality of substrates can be placed. The carrier is carried in the storage device. In the storage device, the carrier is transported among the plurality of openers by a transport device. The transport device includes first and second hands configured to be able to hold the carrier and move in a horizontal direction and a vertical direction. The second hand is provided below the first hand.

摘要翻译： 在基板处理装置中，按照该顺序排列存储装置，分度块，处理块和接口块。 存储装置包括多个开放器，可以放置存储多个基板的载体。 载体被携带在存储装置中。 在存储装置中，通过运送装置在多个开放装置之间运送载体。 输送装置包括构造成能够保持载体并沿水平方向和垂直方向移动的第一和第二手。 第二只手是第二只手。

公开(公告)号：US20140161983A1

公开(公告)日：2014-06-12

申请号：US14084067

申请日：2013-11-19

申请人： Yukihiko INAGAKI

发明人： Yukihiko INAGAKI

IPC分类号： B05B13/02 ,  B08B3/04

CPC分类号： B05B13/0221 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/67742 ,  H01L21/67745

摘要： One processing block is arranged between an indexer block and another processing block. One substrate is transported to a main transport mechanism in the one processing block by a main transport mechanism in the indexer block, transported to a first processing section and a thermal processing section by the main transport mechanism in the one processing block and processing is performed on the substrate. The substrate after the processing is transported to the main transport mechanism in the indexer block by the main transport mechanism in the one processing block. Another substrate is transported to a sub-transport mechanism in a sub-transport chamber by the main transport mechanism in the indexer block, and is transported to a main transport mechanism in another processing block by the sub-transport mechanism in the sub-transport chamber. The substrate is transported to the sub-transport mechanism in the sub-transport chamber by the main transport mechanism in another processing block, and is transported to the main transport mechanism in the indexer block by the sub-transport mechanism in the sub-transport chamber.

摘要翻译： 一个处理块被布置在索引器块和另一个处理块之间。 一个基板通过分度器块中的主输送机构输送到一个处理块中的主输送机构，并通过一个处理块中的主输送机构输送到第一处理部和热处理部，并且对 底物。 处理后的基板通过一个处理块中的主传送机构传送到分度器块中的主传送机构。 另一基板通过分度器块中的主输送机构输送到副输送室中的副输送机构，并通过副输送室中的副输送机构输送到另一处理块中的主输送机构 。 基板通过另一处理块中的主输送机构输送到副输送室中的副输送机构，并通过副输送室中的副输送机构输送到分度器块中的主输送机构 。

公开(公告)号：US20110063588A1

公开(公告)日：2011-03-17

申请号：US12870402

申请日：2010-08-27

申请人： Masahito KASHIYAMA ,  Yukihiko INAGAKI ,  Kazuya AKIYAMA ,  Noriaki YOKONO ,  Isao TANIGUCHI

发明人： Masahito KASHIYAMA ,  Yukihiko INAGAKI ,  Kazuya AKIYAMA ,  Noriaki YOKONO ,  Isao TANIGUCHI

IPC分类号： G03B27/32

CPC分类号： G03F7/2028 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67225 ,  H01L21/67742

摘要： An edge exposure unit includes a projector, a projector holding unit, a substrate rotating unit, an outer edge detecting unit and a surface inspection processing unit. Each component of the projector holding unit operates to move the projector in an X direction and a Y direction. The projector irradiates a peripheral portion of a substrate with light transmitted from a light source for exposure through a light guide. Edge sampling processing is performed based on distribution of an amount of light received in a CCD line sensor of the outer edge detecting unit. Surface inspection processing is performed based on distribution of an amount of light received in a CCD line sensor of the surface inspection processing unit.

摘要翻译： 边缘曝光单元包括投影仪，投影仪保持单元，基板旋转单元，外缘检测单元和表面检查处理单元。 投影机保持单元的每个组件操作以沿X方向和Y方向移动投影仪。 投影仪利用从光源透射的光通过光导照射用于曝光的基板的周边部分。 基于在外部边缘检测单元的CCD线传感器中接收的光量的分布来执行边缘采样处理。 基于在表面检查处理单元的CCD线传感器中接收的光量的分布进行表面检查处理。

公开(公告)号：US20130089668A1

公开(公告)日：2013-04-11

申请号：US13633705

申请日：2012-10-02

申请人： Yukihiko INAGAKI ,  Tomohiro GOTO

发明人： Yukihiko INAGAKI ,  Tomohiro GOTO

IPC分类号： B05D3/04 ,  B05C5/02

CPC分类号： H01L21/6715 ,  B05C11/06 ,  B05D3/04

摘要： A coating head is constructed of a solvent feed mechanism connected to a forward side in a direction of movement of a coating solution feed mechanism, and a gas jet mechanism connected to a rearward side in the direction of movement. While moving the coating head relative to a substrate, a solvent is supplied onto the substrate from the solvent feed mechanism, then a coating solution is supplied onto a film of the solvent from the coating solution feed mechanism, and finally a gas is jetted to an uneven surface of the coating solution from the gas jet mechanism to smooth a thin film surface of the coating solution.

摘要翻译： 涂布头由在涂布液供给机构的移动方向上的前方连接的溶剂供给机构和与运动方向的后方连接的气体喷射机构构成。 在相对于基板移动涂布头时，从溶剂供给机构将溶剂供给到基板上，然后将涂布液从涂布液供给机构供给到溶剂的膜上，最后将气体喷射到 喷涂机构的涂层溶液表面不均匀，使涂层溶液的薄膜表面光滑。

公开(公告)号：US20130089664A1

公开(公告)日：2013-04-11

申请号：US13633726

申请日：2012-10-02

申请人： Yukihiko INAGAKI ,  Tomohiro GOTO

发明人： Yukihiko INAGAKI ,  Tomohiro GOTO

IPC分类号： B05D3/12 ,  B05C13/00 ,  B05D1/26 ,  B05C9/12

CPC分类号： H01L21/6715

摘要： A coating method includes a step of forming a film of a coating solution having a larger thickness in a central region of a substrate than in an edge region of the substrate by discharging droplets of the coating solution from a plurality of nozzles formed on an inkjet head to the substrate, and a step of moving the coating solution in the film from the central region toward the edge region of the substrate by rotating the substrate. This reduces a difference in thickness of the film between the central region and the edge region of the substrate, thereby to make the film thickness substantially uniform. At the same time, the movement of the coating solution in the film can make the surface of the film smoother.

摘要翻译： 涂布方法包括以下步骤：通过从形成在喷墨头上的多个喷嘴排出涂布溶液的液滴，在基板的中心区域形成厚度大于涂层溶液的膜的步骤 并且通过旋转衬底，将膜中的涂布溶液从中心区域移动到衬底的边缘区域的步骤。 这减小了基板的中心区域和边缘区域之间的膜的厚度差，从而使膜厚度基本均匀。 同时，涂膜在胶片中的移动可以使胶片的表面更平滑。

公开(公告)号：US20140022521A1

公开(公告)日：2014-01-23

申请号：US13943198

申请日：2013-07-16

申请人： Masahiko HARUMOTO ,  Tadashi MIYAGI ,  Yukihiko INAGAKI ,  Koji KANEYAMA

发明人： Masahiko HARUMOTO ,  Tadashi MIYAGI ,  Yukihiko INAGAKI ,  Koji KANEYAMA

IPC分类号： B05C11/00 ,  H01J37/02

CPC分类号： C23C16/56 ,  B05C11/00 ,  C23C16/0227 ,  G03F7/0002 ,  G03F7/162 ,  G03F7/20 ,  G03F7/3021 ,  G03F7/32 ,  H01J37/02 ,  H01L21/0335 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/67115 ,  H01L21/67126 ,  H01L21/6715 ,  H01L21/67178

摘要： An underlayer is formed to cover the upper surface of a substrate and a guide pattern is formed on the underlayer. A DSA film constituted by two types of polymers is formed in a region on the underlayer where the guide pattern is not formed. Thermal processing is performed while a solvent is supplied to the DSA film on the substrate. Thus, a microphase separation of the DSA film occurs. As a result, patterns made of the one polymer and patterns made of another polymer are formed. Exposure processing and development processing are performed in this order on the DSA film after the microphase separation such that the patterns made of another polymer are removed.

摘要翻译： 形成底层以覆盖基板的上表面，并且在底层上形成引导图案。 在未形成引导图案的底层上的区域中形成由两种类型的聚合物构成的DSA膜。 在向基板上的DSA膜供给溶剂的同时进行热处理。 因此，发生DSA膜的微相分离。 结果，形成由一种聚合物制成的图案和由另一种聚合物制成的图案。 在微相分离之后，在DSA膜上依次进行曝光处理和显影处理，从而除去由另一种聚合物制成的图案。

公开(公告)号：US20130258299A1

公开(公告)日：2013-10-03

申请号：US13845211

申请日：2013-03-18

申请人： Kazuhiro NISHIMURA ,  Akihiko MORITA ,  Yukihiko INAGAKI

发明人： Kazuhiro NISHIMURA ,  Akihiko MORITA ,  Yukihiko INAGAKI

IPC分类号： G03F7/20

CPC分类号： G03F7/2012 ,  G03F7/0035 ,  G03F7/38

摘要： In an entire region exposure unit, a platform section and a local transfer mechanism are arranged in one direction. The local transfer mechanism is provided with a local transfer hand. A substrate on which a resist film having a predetermined pattern is formed is held by the local transfer hand. A light-emitting device is attached to the upper portion of the local transfer mechanism. Strip-shaped light is emitted from the light-emitting device toward below. The local transfer mechanism operates such that the local transfer hand is moved relative to the light-emitting device. At this time, the light-emitting device irradiates one surface of the substrate that is moving horizontally with the strip-shaped light. The resist film is modified by the light.

摘要翻译： 在整个区域曝光单元中，平台部分和局部传送机构沿一个方向布置。 本地传送机构设有本地传送手。 其上形成有预定图案的抗蚀剂膜的基板由本地转印手保持。 发光装置安装在本地传送机构的上部。 带状光从发光装置向下方射出。 本地传送机构的操作使得本地传送手相对于发光装置移动。 此时，发光装置照射与条状光水平移动的基板的一个面。 抗蚀剂膜被光改性。