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    Method of preparing high-purity aqueous silica sol
    1.
    发明授权
    Method of preparing high-purity aqueous silica sol 失效
    制备高纯度水性二氧化硅溶胶的方法

    公开(公告)号：US5100581A

    公开(公告)日：1992-03-31

    申请号：US496254

    申请日：1990-03-20

    申请人： Yoshitane Watanabe ,  Hiromi Suzuki ,  Mikio Ando

    发明人： Yoshitane Watanabe ,  Hiromi Suzuki ,  Mikio Ando

    IPC分类号： B01J13/00 ,  C01B33/148

    CPC分类号： B01J13/0013 ,  C01B33/148

    摘要： A high-purity stable aqueous silica sol is prepared which has an SiO.sub.2 concentration of from 30 to 50% by weight and which is substantially free from any other polyvalent metal oxides than silica and in which the colloidal silica has a mean particle size falling within the range of from 10 to 30 millimicrons. The silica sol obtained by the method of the present invention has an extremely low content of oxides of polyvalent metals such as iron or aluminum and may therefore be employed for uses which require the absence of such metals in the silica sol, for example, as an abrasive for semiconductors.

    摘要翻译： 制备SiO 2浓度为30〜50重量％且与二氧化硅基本上不含任何其它多价金属氧化物的高纯度稳定水溶硅溶胶，其中胶体二氧化硅的平均粒径落在 范围为10至30毫微克。 通过本发明的方法获得的硅溶胶具有极低的多价金属如铁或铝的氧化物含量，因此可用于在硅溶胶中不需要这种金属的用途，例如作为 半导体研磨剂。

    Elongated-shaped silica sol and method for preparing the same
    2.
    发明授权
    Elongated-shaped silica sol and method for preparing the same 失效
    细长形硅胶及其制备方法

    公开(公告)号：US5221497A

    公开(公告)日：1993-06-22

    申请号：US746634

    申请日：1991-08-19

    申请人： Yoshitane Watanabe ,  Mikio Ando ,  Kenji Tanimoto ,  Tsutomu Kagamimiya ,  Makoto Kawashima

    发明人： Yoshitane Watanabe ,  Mikio Ando ,  Kenji Tanimoto ,  Tsutomu Kagamimiya ,  Makoto Kawashima

    IPC分类号： C01B33/145 ,  C01B33/148

    CPC分类号： C01B33/148 ,  C01B33/145

    摘要： A method for preparing a stable silica sol having an SiO.sub.2 concentration of 40% or less, the colloidal particles of said silica having a particle size of 40 to 500 nm, as measured by dynamic light-scattering and having an elongated shape having a thickness of 5 to 40 nm and an elongation of 5 to 30 times the thickness in only one plane, the method comprising the steps (a), (b) and (c): (a) mixing an aqueous solution of Ca or Mg salt with an aqueous solution of active silicic acid having an SiO.sub.2 concentration of 1 to 6% and a pH value of 2 to 5, or with an aqueous acidic silica sol having a particle size of 3 to 30 nm, an SiO.sub.2 concentration of 0.5 to 25% and a pH value of 1 to 5 in a weight ratio of 1500 to 10000 ppm of (CaO or MgO)/SiO.sub.2 ; (b) mixing an alkali metal hydroxide with the solution obtained by step (a) in a molar ratio of 20 to 300 as SiO.sub.2 /M.sub.2 O, wherein M represents an alkali metal atom; and (c) heating the mixture obtained by step (b) at 60.degree. to 300.degree. C. for 0.5 to 40 hours.

    摘要翻译： 制备SiO 2浓度为40％以下的稳定的二氧化硅溶胶的方法，通过动态光散射测定的所述二氧化硅的粒径为40〜500nm的胶体粒子，其厚度为 （a），（b）和（c）的方法：（a）将Ca或Mg盐水溶液与 SiO 2浓度为1〜6％，pH值为2〜5的活性硅酸水溶液，或粒径为3〜30nm，SiO 2浓度为0.5〜25％的酸性硅酸水溶液，以及 （CaO或MgO）/ SiO 2的重量比为1500〜10000ppm的pH值为1〜5; （b）将碱金属氢氧化物与作为SiO 2 / M 2 O的摩尔比为20〜300的步骤（a）得到的溶液混合，其中M表示碱金属原子; 和（c）将步骤（b）获得的混合物在60℃至300℃下加热0.5至40小时。

    Polishing composition
    4.
    发明授权
    Polishing composition 失效
    抛光组成

    公开(公告)号：US06398827B1

    公开(公告)日：2002-06-04

    申请号：US09605542

    申请日：2000-06-29

    申请人： Isao Ota ,  Tohru Nishimura ,  Yoshitane Watanabe ,  Yoshiyuki Kashima ,  Kiyomi Ema ,  Yutaka Ohmori

    发明人： Isao Ota ,  Tohru Nishimura ,  Yoshitane Watanabe ,  Yoshiyuki Kashima ,  Kiyomi Ema ,  Yutaka Ohmori

    IPC分类号： C09K314

    CPC分类号： C09K3/1463 ,  C09G1/02

    摘要： The present invention relates to a polishing composition for polishing alumina disks, polishing substrates having silica surfaces and semiconductor wafers, comprising a stable aqueous silica sol containing moniliform colloidal silica particles having a ratio (D1/D2) of a particle diameter D1 nm (as measured by dynamic light scattering method) to a mean particle diameter D2 (as measured by nitrogen absorption method) of 3 or more, wherein D1 is between 50 to 800 nm and D2 is between 10 to 120 nm, said moniliform colloidal silica particles being composed of spherical colloidal silica particles and a metal oxide-containing silica bond which bonds these spherical colloidal silica particles together, wherein the spherical colloidal silica particles are linked together in rows in only one plane by observation through an electron microscope, and further wherein said polishing composition contains 0.5 to 50% by weight of said moniliform colloidal silica particles.

    摘要翻译： 本发明涉及一种用于抛光氧化铝盘的抛光组合物，具有二氧化硅表面的抛光衬底和半导体晶片，其包含稳定的含水二氧化硅溶胶，其含有粒径为D1nm（D1 / D2）的粒径为D1nm 通过动态光散射法）至平均粒径D2（通过氮吸收法测定）为3以上，其中D1为50〜800nm，D2为10〜120nm，所述观察胶体二氧化硅粒子为 球形胶体二氧化硅颗粒和将这些球形胶体二氧化硅颗粒结合在一起的含金属氧化物的二氧化硅结合体，其中通过电子显微镜观察，球形胶体二氧化硅颗粒在一个平面内以行排列在一起，并且其中所述抛光组合物含有 0.5〜50重量％的所述念珠状胶体二氧化硅粒子。

    Silica-magnesium fluoride hydrate composite sols and process for their preparation
    5.
    发明授权
    Silica-magnesium fluoride hydrate composite sols and process for their preparation 失效
    二氧化硅 - 氟化镁水合物复合溶胶及其制备方法

    公开(公告)号：US06291535B1

    公开(公告)日：2001-09-18

    申请号：US09455928

    申请日：1999-12-07

    申请人： Yoshitane Watanabe ,  Keitaro Suzuki ,  Osamu Tanegashima ,  Yoshinari Koyama

    发明人： Yoshitane Watanabe ,  Keitaro Suzuki ,  Osamu Tanegashima ,  Yoshinari Koyama

    IPC分类号： B01F312

    CPC分类号： B82Y30/00 ,  C01B33/14 ,  C01F5/28 ,  C01P2004/50 ,  C01P2004/64

    摘要： A sol comprising silica-magnesium fluoride hydrate composite colloidal particles used in an anti-reflection coating material for forming an anti-reflection coating and a process for its preparation are provided. A sol comprising silica-magnesium fluoride hydrate composite colloidal particles having a ratio of silica to magnesium fluoride hydrate MgF2.nH2O, n being in the range between 0.25 and 0.5, in terms of a SiO2/MgF2 weight ratio of from 0.01 to 5 and a primary particle size of 5 to 50 nm. A process for the preparation of an aqueous sol comprising silica-magnesium fluoride hydrate composite colloidal particles which comprises the steps of adding an aqueous fluoride solution to a mixture liquid of a silica sol and an aqueous magnesium salt solution to produce a slurry of an agglomerate comprising silica-magnesium fluoride hydrate composite colloidal particles and removing the salts formed as by-products. A process for the preparation of an organosol further comprising the step of replacing water in the aqueous sol with an organic solvent.

    摘要翻译： 提供一种包含用于形成抗反射涂层的防反射涂层材料中的二氧化硅 - 氟化镁水合物复合胶体颗粒及其制备方法。 包含二氧化硅 - 氟化镁水合物复合胶体粒子的溶胶，SiO 2 / MgF 2重量比为0.01〜5，二氧化硅与氟化镁水合物的比例为MgF 2·nH 2 O，n为0.25〜0.5的范围， 一次粒径为5〜50nm。 一种制备包含二氧化硅 - 氟化镁水合物复合胶体颗粒的水性溶胶的方法，包括以下步骤：向二氧化硅溶胶和镁盐水溶液的混合液中加入氟化钠水溶液，以产生附聚物的浆料，其包含 二氧化硅 - 氟化镁水合物复合胶体颗粒并除去作为副产物形成的盐。 一种制备有机溶胶的方法，还包括用有机溶剂代替水溶胶中的水的步骤。

    Coating compositions employing zinc antimonate anhydride particles
    6.
    发明授权
    Coating compositions employing zinc antimonate anhydride particles 失效
    使用锑酸锌酸酐颗粒的涂料组合物

    公开(公告)号：US5906679A

    公开(公告)日：1999-05-25

    申请号：US939202

    申请日：1997-09-29

    申请人： Yoshitane Watanabe ,  Keitaro Suzuki ,  Yoshinari Koyama

    发明人： Yoshitane Watanabe ,  Keitaro Suzuki ,  Yoshinari Koyama

    IPC分类号： C01G30/02 ,  C09K3/16 ,  C09K21/02 ,  C09D1/00 ,  C08K3/10 ,  C09D5/18 ,  C09K21/00

    CPC分类号： B82Y30/00 ,  C01G30/02 ,  C09K21/02 ,  C09K3/16 ,  C01P2002/72 ,  C01P2004/04 ,  C01P2004/10 ,  C01P2004/62 ,  C01P2004/64 ,  C01P2006/12 ,  C01P2006/22 ,  C01P2006/40 ,  C01P2006/60 ,  C01P2006/82 ,  Y10S524/911

    摘要： The invention relates to coating compositions employing zinc antimonate anhydride comprising zinc antimonate anhydride particles and a liquid of a part-hydrolyzed silane coupling agent, a liquid of hydrolyzed ethylsilicate, a liquid of hydrolyzed methylsilicate, or a resin emulsion. The zinc antimonate anhydride particle having a ZnO/Sb.sub.2 O.sub.5 molar ratio in a range of from 0.8 to 1.2, a crystal structure of zinc antimonate anhydride (Zn Sb.sub.2 0.sub.5), and a primary particle size in a range of from 5 to 500 nm. The particle production method comprises the steps of mixing a zinc compound with a colloidal antimony oxide at a ZnO/Sb.sub.2 O.sub.5 molar rate in a range of from 0.8 to 1.2, followed by calcining the mixture within a temperature range of from 500 to 1100.degree. C. The particles are applicable as a flame retardant for plastics, a smoke suppressant, antistatic agent for plastics and glasses, and resistor.

    摘要翻译： 本发明涉及使用包含锑酸锌酸酐颗粒和部分水解的硅烷偶联剂的液体，水解的硅酸乙酯的液体，水解的甲基硅酸的液体或树脂乳液的锑酸锌酸酐的涂料组合物。 ZnO / Sb 2 O 5摩尔比为0.8〜1.2的锑酸锌酸酐粒子，锑酸锌酸酐（Zn Sb 2 O 5）的结晶结构，一次粒径为5〜500nm。 粒子的制造方法包括以0.5〜1.2的ZnO / Sb 2 O 5摩尔比混合锌化合物和胶态氧化锑，然后在500〜1100℃的温度范围内煅烧。 该颗粒可用作塑料阻燃剂，防烟剂，塑料和眼镜用抗静电剂和电阻剂。