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公开(公告)号:US10224401B2
公开(公告)日:2019-03-05
申请号:US15564498
申请日:2017-05-31
Applicant: Transphorm Inc.
Inventor: Umesh Mishra , Rakesh K. Lal , Geetak Gupta , Carl Joseph Neufeld , David Rhodes
IPC: H01L29/00 , H01L23/495 , H01L29/06 , H01L29/417 , H01L29/423 , H01L29/66 , H01L29/778 , H01L29/872 , H01L29/20 , H01L29/205 , H01L29/40 , H01L29/10
Abstract: A III-N device includes a III-N layer structure including a III-N channel layer, a III-N barrier layer over the III-N channel layer, and a graded III-N layer over the III-N barrier layer having a first side adjacent to the III-N barrier layer and a second side opposite the first side; a first power electrode and a second power electrode; and a gate between the first and second power electrodes, the gate being over the III-N layer structure. A composition of the graded III-N layer is graded so the bandgap of the graded III-N layer adjacent to the first side is greater than the bandgap of the graded III-N layer adjacent to the second side. A region of the graded III-N layer is (i) between the gate and the second power electrode, and (ii) electrically connected to the first power electrode and electrically isolated from the second power electrode.
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公开(公告)号:US20190198615A1
公开(公告)日:2019-06-27
申请号:US16287211
申请日:2019-02-27
Applicant: Transphorm Inc.
Inventor: Umesh Mishra , Rakesh K. Lal , Geetak Gupta , Carl Joseph Neufeld , David Rhodes
IPC: H01L29/06 , H01L29/205 , H01L29/20 , H01L29/778 , H01L29/40 , H01L29/872 , H01L29/66 , H01L29/423 , H01L29/417
CPC classification number: H01L29/0688 , H01L23/49562 , H01L29/0619 , H01L29/1066 , H01L29/1075 , H01L29/2003 , H01L29/205 , H01L29/402 , H01L29/408 , H01L29/41766 , H01L29/4236 , H01L29/66462 , H01L29/7785 , H01L29/7786 , H01L29/872
Abstract: A III-N device includes a III-N layer structure including a III-N channel layer, a III-N barrier layer over the III-N channel layer, and a graded III-N layer over the III-N barrier layer having a first side adjacent to the III-N barrier layer and a second side opposite the first side; a first power electrode and a second power electrode; and a gate between the first and second power electrodes, the gate being over the III-N layer structure. A composition of the graded III-N layer is graded so the bandgap of the graded III-N layer adjacent to the first side is greater than the bandgap of the graded III-N layer adjacent to the second side. A region of the graded III-N layer is (i) between the gate and the second power electrode, and (ii) electrically connected to the first power electrode and electrically isolated from the second power electrode.
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公开(公告)号:US20180158909A1
公开(公告)日:2018-06-07
申请号:US15564498
申请日:2017-05-31
Applicant: Transphorm Inc.
Inventor: Umesh Mishra , Rakesh K. Lal , Geetak Gupta , Carl Joseph Neufeld , David Rhodes
IPC: H01L29/06 , H01L29/205 , H01L29/20 , H01L29/40 , H01L29/423 , H01L29/778 , H01L29/66 , H01L29/872 , H01L23/495
CPC classification number: H01L29/0688 , H01L23/49562 , H01L29/0619 , H01L29/1066 , H01L29/1075 , H01L29/2003 , H01L29/205 , H01L29/402 , H01L29/408 , H01L29/41766 , H01L29/4236 , H01L29/66462 , H01L29/7785 , H01L29/7786 , H01L29/872
Abstract: A III-N device includes a III-N layer structure including a III-N channel layer, a III-N barrier layer over the III-N channel layer, and a graded III-N layer over the III-N barrier layer having a first side adjacent to the III-N barrier layer and a second side opposite the first side; a first power electrode and a second power electrode; and a gate between the first and second power electrodes, the gate being over the III-N layer structure. A composition of the graded III-N layer is graded so the bandgap of the graded III-N layer adjacent to the first side is greater than the bandgap of the graded III-N layer adjacent to the second side. A region of the graded III-N layer is (i) between the gate and the second power electrode, and (ii) electrically connected to the first power electrode and electrically isolated from the second power electrode.
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