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    Cutting tool and processing method by the same
    1.
    发明申请
    Cutting tool and processing method by the same 失效
    切削刀具和加工方法相同

    公开(公告)号：US20080080939A1

    公开(公告)日：2008-04-03

    申请号：US11906548

    申请日：2007-10-02

    Applicant: Toshiki Hirukawa ,  Hideki Hayashi ,  Hiroki Nakagawa

    Inventor： Toshiki Hirukawa ,  Hideki Hayashi ,  Hiroki Nakagawa

    IPC: B23B51/00

    CPC classification number: B23B51/02 ,  B23B2251/241 ,  B23B2251/248 ,  B23B2251/62 ,  B23B2270/12 ,  Y10T408/03 ,  Y10T408/52 ,  Y10T408/567

    Abstract: A cutting tool is provided to process a processed member having an opening portion with a curved inner surface, so that a through hole is formed and a part of the inner surface of the opening portion corresponding to the through hole is processed. The through hole extends from a surface of the processed member to reach the opening portion. The cutting tool includes a shank member, and a processing member having a smaller diameter than the shank member. A groove portion of the processing member has a cutting edge, and a chip evacuation groove through which chip is expelled outward. A self guide portion of the processing member is arranged between the groove portion and the shank member and provided with a substantially cylindrical shape, to guide the cutting edge toward the part of the inner surface of the opening portion corresponding to the through hole in the processing.

    Abstract translation: 提供了一种切割工具来处理具有弯曲内表面的开口部分的加工构件，从而形成通孔，并且处理与通孔相对应的开口部分的内表面的一部分。 通孔从被处理构件的表面延伸到达开口部分。 切割工具包括柄部件和直径小于柄部件的加工部件。 处理部件的槽部具有切削刃，芯片排出槽通过芯片向外侧排出。 处理部件的自引导部分设置在槽部和柄部件之间并且设置有大致圆筒形状，以在加工中将切削刃朝向对应于通孔的开口部的内表面的一部分引导 。

    Cutting tool and processing method by the same
    2.
    发明授权
    Cutting tool and processing method by the same 失效
    切削刀具和加工方法相同

    公开(公告)号：US08052355B2

    公开(公告)日：2011-11-08

    申请号：US11906548

    申请日：2007-10-02

    Applicant: Toshiki Hirukawa ,  Hideki Hayashi ,  Hiroki Nakagawa

    Inventor： Toshiki Hirukawa ,  Hideki Hayashi ,  Hiroki Nakagawa

    IPC: B23B49/02

    CPC classification number: B23B51/02 ,  B23B2251/241 ,  B23B2251/248 ,  B23B2251/62 ,  B23B2270/12 ,  Y10T408/03 ,  Y10T408/52 ,  Y10T408/567

    Abstract: A cutting tool is provided to process a processed member having an opening portion with a curved inner surface, so that a through hole is formed and a part of the inner surface of the opening portion corresponding to the through hole is processed. The through hole extends from a surface of the processed member to reach the opening portion. The cutting tool includes a shank member, and a processing member having a smaller diameter than the shank member. A groove portion of the processing member has a cutting edge, and a chip evacuation groove through which chip is expelled outward. A self guide portion of the processing member is arranged between the groove portion and the shank member and provided with a substantially cylindrical shape, to guide the cutting edge toward the part of the inner surface of the opening portion corresponding to the through hole in the processing.

    Abstract translation: 提供了一种切割工具来处理具有弯曲内表面的开口部分的加工构件，从而形成通孔，并且处理与通孔相对应的开口部分的内表面的一部分。 通孔从被处理构件的表面延伸到达开口部分。 切割工具包括柄部件和直径小于柄部件的加工部件。 处理部件的槽部具有切削刃，芯片排出槽通过芯片向外侧排出。 处理部件的自引导部分设置在槽部和柄部件之间并且设置有大致圆筒形状，以在加工中将切削刃朝向对应于通孔的开口部的内表面的一部分引导 。

    Copolymer and top coating composition
    3.
    发明授权
    Copolymer and top coating composition 有权
    共聚物和顶涂组合物

    公开(公告)号：US08580482B2

    公开(公告)日：2013-11-12

    申请号：US13338569

    申请日：2011-12-28

    Applicant: Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

    Inventor： Takashi Chiba ,  Toru Kimura ,  Tomohiro Utaka ,  Hiroki Nakagawa ,  Hirokazu Sakakibara ,  Hiroshi Dougauchi

    IPC: G03F7/11 ,  C08F18/20 ,  C08F18/22 ,  C08F26/02 ,  C08F28/02

    CPC classification number: G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

    Abstract: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.

    Abstract translation: 用于形成表面涂层的树脂组合物可以形成在光致抗蚀剂膜上而不与光致抗蚀剂膜混合，可以保持在浸没光刻期间不溶于介质的稳定的膜涂层，在干燥曝光期间不损害图案轮廓（ 这不是浸没式光刻法），并且可以容易地溶解在碱性显影剂中。 树脂是包含至少一种选自由下式（1）表示的基团的重复单元，由下式（2）表示的基团的重复单元）的重复单元（I）的共聚物， 和具有羧基的重复单元和具有磺基的重复单元（II），所述共聚物的重均分子量通过凝胶渗透色谱法测定为2,000〜100,000。

    Upper layer film forming composition for liquid immersion and method of forming photoresist pattern
    5.
    发明授权
    Upper layer film forming composition for liquid immersion and method of forming photoresist pattern 有权
    用于液浸的上层成膜组合物和形成光致抗蚀剂图案的方法

    公开(公告)号：US08247165B2

    公开(公告)日：2012-08-21

    申请号：US10586187

    申请日：2005-01-14

    Applicant: Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

    Inventor： Toru Kimura ,  Yukio Nishimura ,  Tomohiro Utaka ,  Hiroaki Nemoto ,  Atsushi Nakamura ,  Takashi Chiba ,  Hiroki Nakagawa

    IPC: G03C1/00 ,  G03F7/00 ,  C08F18/20

    CPC classification number: G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

    Abstract: An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of α-position.

    Abstract translation: 提供了对于曝光波长248nm（KrF）和193nm（ArF）显示足够的透明度的浸没上层膜组合物，可以在光致抗蚀剂膜上形成保护膜而不与光致抗蚀剂膜混合，不会被洗脱到水中 在浸渍曝光期间使用以保持稳定的膜，并且可以容易地溶解在碱性显影剂中。 当使用通过设置在透镜和光致抗蚀剂膜之间的水照射的浸没曝光装置时，该组合物涂覆在光致抗蚀剂膜上，该组合物包含在照射期间形成水稳定膜并溶解在随后的显影剂中的树脂， 和含有6个以下碳原子的一元醇的溶剂，该树脂含有至少在α-位的碳原子上的侧链上含有氟烷基的具有醇羟基的树脂成分。

    Ejector
    6.
    发明申请
    Ejector 有权
    喷射器

    公开(公告)号：US20110236227A1

    公开(公告)日：2011-09-29

    申请号：US13065695

    申请日：2011-03-28

    Applicant: Gouta Ogata ,  Kazunori Mizutori ,  Masahiko Ikawa ,  Yasuhiro Tamatsu ,  Hiroki Nakagawa ,  Haruyuki Nishijima ,  Mika Gocho

    Inventor： Gouta Ogata ,  Kazunori Mizutori ,  Masahiko Ikawa ,  Yasuhiro Tamatsu ,  Hiroki Nakagawa ,  Haruyuki Nishijima ,  Mika Gocho

    IPC: F04F5/00

    CPC classification number: F04F5/20 ,  F04F5/46

    Abstract: A nozzle of an ejector depressurizes and injects fluid, which is supplied to the nozzle. The nozzle is received in a receiving space of a body. The nozzle and the body are formed by press working. The nozzle includes nozzle-side ribs, which extend in an axial direction and project radially outward. The body includes body-side ribs, which extend in the axial direction and project radially outward. In a predetermined cross section of each of the nozzle and the body, which is perpendicular to the axial direction and includes the corresponding ribs, the nozzle or the body is formed seamlessly as a continuous single piece member.

    Abstract translation: 喷射器的喷嘴减压并喷射供给喷嘴的流体。 喷嘴被容纳在身体的容纳空间中。 喷嘴和主体通过冲压加工形成。 喷嘴包括沿轴向延伸并径向向外突出的喷嘴侧肋。 主体包括沿轴向延伸并径向向外突出的主体侧肋。 在每个喷嘴和主体的垂直于轴向方向并且包括相应的肋的预定横截面中，喷嘴或主体无缝地形成为连续的单件构件。

    FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION
    8.
    发明申请
    FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION 有权
    含氟聚合物，纯化方法和辐射敏感性树脂组合物

    公开(公告)号：US20090202945A1

    公开(公告)日：2009-08-13

    申请号：US12294386

    申请日：2007-03-23

    Applicant: Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

    Inventor： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Harada ,  Yukio Nishimura ,  Takeo Shioya

    IPC: G03F7/039 ,  C08F20/22

    CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

    Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

    Abstract translation: 本发明的目的是提供一种含氟聚合物，其含有含氟聚合物的液浸光刻用的辐射敏感性树脂组合物，其导致具有优异形状和优异的焦深的图案，其中 在液浸光刻中曝光期间与抗蚀剂接触的液体浸液式液晶等液体中的洗脱组分的量很少，并且在抗蚀剂膜和用于液浸的液体之间提供较大的后退接触角 光刻法如水，以及纯化含氟聚合物的方法。 本发明的树脂组合物包含含有由通式（1）和（2）表示的重复单元并具有1,000-50,000的Mw的新的含氟聚合物（A），具有酸不稳定基团的树脂（B）， 辐射敏感性酸产生剂（C），含氮化合物（D）和溶剂（E）。

    Oxide semiconductor electrode, dye-sensitized solar cell, and, method of producing the same
    9.
    发明申请
    Oxide semiconductor electrode, dye-sensitized solar cell, and, method of producing the same 审中-公开
    氧化物半导体电极，染料敏化太阳能电池及其制造方法

    公开(公告)号：US20060219294A1

    公开(公告)日：2006-10-05

    申请号：US11393610

    申请日：2006-03-30

    Applicant: Yosuke Yabuuchi ,  Hiroki Nakagawa ,  Hiroyuki Kobori

    Inventor： Yosuke Yabuuchi ,  Hiroki Nakagawa ,  Hiroyuki Kobori

    IPC: H01L31/00

    CPC classification number: H01G9/2068 ,  H01G9/20 ,  H01G9/2027 ,  H01G9/2031 ,  Y02E10/542

    Abstract: An oxide semiconductor electrode is provided with a bonding layer with excellent temporal stability of adhesive force and excellent productivity in a transfer method including a dye-sensitized solar cell with the oxide semiconductor electrode; a method of producing an oxide semiconductor electrode that can produce an oxide semiconductor electrode excellent in the energy conversion efficiency at the high productivity is also provided. The oxide semiconductor electrode and method for making the same are disclosed noting that the oxide semiconductor electrode includes: a base material; a bonding layer formed on the base material made of a thermoplastic resin; a first electrode layer formed on the bonding layer made of a metal oxide; and a porous layer formed on the first electrode and made of the fine particle of a metal oxide semiconductor, wherein the thermoplastic resin includes a silane-modified resin.

    Abstract translation: 氧化物半导体电极设置有具有优异的粘合力的时间稳定性的粘结层和包括染料敏化太阳能电池与氧化物半导体电极的转印方法的优异的生产率; 还提供了一种能够以高生产率制造能量转换效率优异的氧化物半导体电极的氧化物半导体电极的制造方法。 公开了氧化物半导体电极及其制造方法，注意到氧化物半导体电极包括：基材; 形成在由热塑性树脂制成的基材上的粘合层; 形成在由金属氧化物构成的接合层上的第一电极层; 以及形成在第一电极上并由金属氧化物半导体的细颗粒制成的多孔层，其中热塑性树脂包括硅烷改性树脂。

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