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    Sample holding apparatus for electron microscope, and electron microscope apparatus
    1.
    发明授权
    Sample holding apparatus for electron microscope, and electron microscope apparatus 有权
    电子显微镜样品保持装置和电子显微镜装置

    公开(公告)号：US08835847B2

    公开(公告)日：2014-09-16

    申请号：US14114164

    申请日：2012-04-20

    申请人： Toshie Yaguchi ,  Akira Watabe ,  Yusuke Ominami

    发明人： Toshie Yaguchi ,  Akira Watabe ,  Yusuke Ominami

    IPC分类号： G01N23/00 ,  G21K7/00 ,  H01J37/20 ,  H01J37/26

    CPC分类号： H01J37/20 ,  H01J37/26 ,  H01J2237/006 ,  H01J2237/2003 ,  H01J2237/2065

    摘要： A sample holding apparatus for electron microscope includes: a sample holding assembly including an assembly of three components of an upper diaphragm holding part, a sample holding plate and a lower diaphragm holding part; and a holding part that holds the sample holding assembly replaceably. The sample holding assembly includes a cell defined between a diaphragm of the upper diaphragm holding part and a diaphragm of the lower diaphragm holding part, and a flow channel connected to the cell, in which a sample mounted at a protrusion of the sample holding plate is placed. The diaphragm of the upper diaphragm holding part, the sample and the diaphragm of the lower diaphragm holding part are disposed along an optical axis of an electron beam.

    摘要翻译： 用于电子显微镜的样品保持装置包括：样品保持组件，其包括上隔膜保持部，样品保持板和下隔膜保持部的三个部件的组件; 以及可替换地保持样品保持组件的保持部。 样品保持组件包括限定在上隔膜保持部的隔膜和下隔膜保持部的隔膜之间的单元，以及连接到电池的流路，其中安装在样品保持板的突起处的样品为 放置 上隔膜保持部的隔膜，下隔膜保持部的检体和隔膜沿电子束的光轴配置。

    SAMPLE HOLDING APPARATUS FOR ELECTRON MICROSCOPE, AND ELECTRON MICROSCOPE APPARATUS
    2.
    发明申请
    SAMPLE HOLDING APPARATUS FOR ELECTRON MICROSCOPE, AND ELECTRON MICROSCOPE APPARATUS 有权
    电子显微镜样品保存装置和电子显微镜装置

    公开(公告)号：US20140042318A1

    公开(公告)日：2014-02-13

    申请号：US14114164

    申请日：2012-04-20

    申请人： Toshie Yaguchi ,  Akira Watabe ,  Yusuke Ominami

    发明人： Toshie Yaguchi ,  Akira Watabe ,  Yusuke Ominami

    IPC分类号： H01J37/20

    CPC分类号： H01J37/20 ,  H01J37/26 ,  H01J2237/006 ,  H01J2237/2003 ,  H01J2237/2065

    摘要： A sample holding apparatus for electron microscope includes: a sample holding assembly including an assembly of three components of an upper diaphragm holding part, a sample holding plate and a lower diaphragm holding part; and a holding part that holds the sample holding assembly replaceably. The sample holding assembly includes a cell defined between a diaphragm of the upper diaphragm holding part and a diaphragm of the lower diaphragm holding part, and a flow channel connected to the cell, in which a sample mounted at a protrusion of the sample holding plate is placed. The diaphragm of the upper diaphragm holding part, the sample and the diaphragm of the lower diaphragm holding part are disposed along an optical axis of an electron beam.

    摘要翻译： 用于电子显微镜的样品保持装置包括：样品保持组件，其包括上隔膜保持部，样品保持板和下隔膜保持部的三个部件的组件; 以及可替换地保持样品保持组件的保持部。 样品保持组件包括限定在上隔膜保持部的隔膜和下隔膜保持部的隔膜之间的单元，以及连接到电池的流路，其中安装在样品保持板的突起处的样品为 放置 上隔膜保持部的隔膜，下隔膜保持部的检体和隔膜沿电子束的光轴配置。

    Electron microscope and sample holder
    4.
    发明授权
    Electron microscope and sample holder 有权
    电子显微镜和样品架

    公开(公告)号：US08878144B2

    公开(公告)日：2014-11-04

    申请号：US13577751

    申请日：2010-12-01

    申请人： Toshie Yaguchi ,  Yasuhira Nagakubo ,  Akira Watabe

    发明人： Toshie Yaguchi ,  Yasuhira Nagakubo ,  Akira Watabe

    IPC分类号： H01J37/20 ,  H01J37/26

    CPC分类号： H01J37/26 ,  H01J37/20 ,  H01J2237/006 ,  H01J2237/2003 ,  H01J2237/206 ,  H01J2237/2065

    摘要： The electron beam apparatus sample holding means has a diaphragm which is placed on upper and lower sides of a sample to form a cell for separating a gas atmosphere and a vacuum atmosphere of a sample chamber and sealing an ambient atmosphere of the sample; a gas supply means for supplying gas to an inside of the cell; and exhaust means for exhausting gas. The exhaust means includes a gas exhaust pipe provided in the inside of the cell and an openable/closable exhaust hole provided in a sidewall of the sample holding means so as to pass through the cell. The diaphragm is an amorphous film made of light elements which can transmit an electron beam, such as carbon films, oxide films, and nitride films.

    摘要翻译： 电子束装置样品保持装置具有隔膜，其被放置在样品的上侧和下侧，以形成用于分离气体气氛的单元和样品室的真空气氛并密封样品的周围空气; 气体供给装置，用于向所述电池内部供应气体; 以及用于排出气体的排气装置。 排气装置包括设置在电池内部的排气管和设置在样品保持装置的侧壁中以便通过电池的可打开/关闭的排气孔。 隔膜是由透光电子束如碳膜，氧化膜和氮化物膜的光元件制成的非晶膜。

    ELECTRON MICROSCOPE AND SAMPLE HOLDER
    5.
    发明申请
    ELECTRON MICROSCOPE AND SAMPLE HOLDER 有权
    电子显微镜和样品座

    公开(公告)号：US20120305769A1

    公开(公告)日：2012-12-06

    申请号：US13577751

    申请日：2010-12-01

    申请人： Toshie Yaguchi ,  Yasuhira Nagakubo ,  Akira Watabe

    发明人： Toshie Yaguchi ,  Yasuhira Nagakubo ,  Akira Watabe

    IPC分类号： H01J37/20 ,  H01J37/26

    CPC分类号： H01J37/26 ,  H01J37/20 ,  H01J2237/006 ,  H01J2237/2003 ,  H01J2237/206 ,  H01J2237/2065

    摘要： The electron beam apparatus sample holding means has a diaphragm which is placed on upper and lower sides of a sample to form a cell for separating a gas atmosphere and a vacuum atmosphere of a sample chamber and sealing an ambient atmosphere of the sample; a gas supply means for supplying gas to an inside of the cell; and exhaust means for exhausting gas. The exhaust means includes a gas exhaust pipe provided in the inside of the cell and an openable/closable exhaust hole provided in a sidewall of the sample holding means so as to pass through the cell. The diaphragm is an amorphous film made of light elements which can transmit an electron beam, such as carbon films, oxide films, and nitride films.

    摘要翻译： 电子束装置样品保持装置具有隔膜，其被放置在样品的上侧和下侧，以形成用于分离气体气氛的单元和样品室的真空气氛并密封样品的周围空气; 气体供给装置，用于向所述电池内部供应气体; 以及用于排出气体的排气装置。 排气装置包括设置在电池内部的排气管和设置在样品保持装置的侧壁中以便通过电池的可打开/关闭的排气孔。 隔膜是由透光电子束如碳膜，氧化膜和氮化物膜的光元件制成的非晶膜。

    Electron beam device and sample holding device for electron beam device
    6.
    发明授权
    Electron beam device and sample holding device for electron beam device 有权
    用于电子束装置的电子束装置和样品保持装置

    公开(公告)号：US08604429B2

    公开(公告)日：2013-12-10

    申请号：US13201820

    申请日：2010-01-20

    申请人： Toshie Yaguchi ,  Yasuhira Nagakubo ,  Takeo Kamino ,  Akira Watabe

    发明人： Toshie Yaguchi ,  Yasuhira Nagakubo ,  Takeo Kamino ,  Akira Watabe

    IPC分类号： H01J37/08 ,  H01J37/18

    CPC分类号： H01J37/20 ,  H01J2237/006 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2004

    摘要： An object of the invention is to provide an electron beam device and a sample holding device for the electron beam device that can observe the reaction between a sample and a gas at high resolution while a gas atmosphere is maintained even by using thin diaphragms.To solve one of the problems described above, in an electron beam device having the function of separately exhausting an electron beam irradiation portion of an optical column, a sample chamber and an observation chamber, a gas supply means for supplying a gas to a sample and an exhaust means for exhausting a gas are provided to sample holding means, diaphragms are disposed above and below the sample to separate the gas atmosphere and vacuum of the sample chamber and to constitute a cell sealing the atmosphere around the sample, and a mechanism for spraying a gas is provided to the outside of the diaphragms. The gas sprayed outside the diaphragms has low electron beam scattering performance such as hydrogen, oxygen or nitrogen. The diaphragm is an amorphous film formed of a light element such as a carbon film, an oxide film and a nitride film capable of transmitting the electron beam.

    摘要翻译： 本发明的目的是提供一种用于电子束装置的电子束装置和样品保持装置，其可以在通过使用薄隔膜保持气体气氛的同时以高分辨率观察样品和气体之间的反应。 为了解决上述问题之一，在具有分别排出光学柱的电子束照射部分，样品室和观察室的功能的电子束装置中，向样品供应气体的气体供给装置和 向样品保持装置提供用于排出气体的排气装置，在样品上方和下方设置隔膜以分离样品室的气体气氛和真空，并构成密封样品周围的气氛的单元，以及用于喷射的机构 气体被提供到隔膜的外部。 喷射在隔膜外部的气体具有低电子束散射性能，例如氢，氧或氮。 隔膜是由诸如碳膜，氧化膜和能够透射电子束的氮化物膜的光元件形成的非晶膜。

    ELECTRON BEAM DEVICE AND SAMPLE HOLDING DEVICE FOR ELECTRON BEAM DEVICE
    8.
    发明申请
    ELECTRON BEAM DEVICE AND SAMPLE HOLDING DEVICE FOR ELECTRON BEAM DEVICE 有权
    电子束装置和电子束装置的样品保持装置

    公开(公告)号：US20110303845A1

    公开(公告)日：2011-12-15

    申请号：US13201820

    申请日：2010-01-20

    申请人： Toshie Yaguchi ,  Yasuhira Nagakubo ,  Takeo Kamino ,  Akira Watabe

    发明人： Toshie Yaguchi ,  Yasuhira Nagakubo ,  Takeo Kamino ,  Akira Watabe

    IPC分类号： H01J37/26

    CPC分类号： H01J37/20 ,  H01J2237/006 ,  H01J2237/2002 ,  H01J2237/2003 ,  H01J2237/2004

    摘要： An object of the invention is to provide an electron beam device and a sample holding device for the electron beam device that can observe the reaction between a sample and a gas at high resolution while a gas atmosphere is maintained even by using thin diaphragms.To solve one of the problems described above, in an electron beam device having the function of separately exhausting an electron beam irradiation portion of an optical column, a sample chamber and an observation chamber, a gas supply means for supplying a gas to a sample and an exhaust means for exhausting a gas are provided to sample holding means, diaphragms are disposed above and below the sample to separate the gas atmosphere and vacuum of the sample chamber and to constitute a cell sealing the atmosphere around the sample, and a mechanism for spraying a gas is provided to the outside of the diaphragms. The gas sprayed outside the diaphragms has low electron beam scattering performance such as hydrogen, oxygen or nitrogen. The diaphragm is an amorphous film formed of a light element such as a carbon film, an oxide film and a nitride film capable of transmitting the electron beam.

    摘要翻译： 本发明的目的是提供一种用于电子束装置的电子束装置和样品保持装置，其可以在通过使用薄隔膜保持气体气氛的同时以高分辨率观察样品和气体之间的反应。 为了解决上述问题之一，在具有分别排出光学柱的电子束照射部分，样品室和观察室的功能的电子束装置中，向样品供应气体的气体供给装置和 向样品保持装置提供用于排出气体的排气装置，在样品上方和下方设置隔膜以分离样品室的气体气氛和真空，并构成密封样品周围的气氛的单元，以及用于喷射的机构 气体被提供到隔膜的外部。 喷射在隔膜外部的气体具有低电子束散射性能，例如氢，氧或氮。 隔膜是由诸如碳膜，氧化膜和能够透射电子束的氮化物膜的光元件形成的非晶膜。

    Focused ion beam system and a method of sample preparation and observation
    10.
    发明申请
    Focused ion beam system and a method of sample preparation and observation 有权
    聚焦离子束系统及样品制备与观察方法

    公开(公告)号：US20070187597A1

    公开(公告)日：2007-08-16

    申请号：US11654685

    申请日：2007-01-18

    申请人： Yuya Suzuki ,  Takeo Kamino ,  Toshie Yaguchi ,  Mitsuru Konno ,  Tsuyoshi Ohnishi

    发明人： Yuya Suzuki ,  Takeo Kamino ,  Toshie Yaguchi ,  Mitsuru Konno ,  Tsuyoshi Ohnishi

    IPC分类号： G21K7/00

    CPC分类号： H01J37/3056 ,  H01J37/3005 ,  H01J2237/2516 ,  H01J2237/31745

    摘要： A focused ion beam system capable of acquiring surface structure information, internal structure information, and internal composition information about a sample simultaneously from the same field of view of the sample. A method of sample preparation and observation employs such focused ion beam system to accurately set a sample processing position based on information about the structure and composition of the sample acquired from multiple directions of the sample, and to process and observe the sample. The system includes, in order to acquire the sample structure and composition information simultaneously, a secondary electron detector, a transmission electron detector, and an energy dispersive X-ray spectroscope or an electron energy loss spectroscope, and employs a stub having the sample rotating and tilting function. The method includes a marking process.

    摘要翻译： 一种聚焦离子束系统，能够从样品的同一视野同时获取关于样品的表面结构信息，内部结构信息和内部组成信息。 样品制备和观察的方法使用这种聚焦离子束系统基于从样品的多个方向获得的样品的结构和组成的信息来精确地设置样品处理位置，并且处理和观察样品。 为了同时获取样品结构和组成信息，该系统包括二次电子检测器，透射电子检测器和能量色散X射线分光镜或电子能量损失光谱仪，并且使用具有样品旋转的短截线和 倾斜功能。 该方法包括标记过程。