发明申请
- 专利标题： Standard specimen for a charged particle beam apparatus, specimen preparation method thereof, and charged particle beam apparatus
- 专利标题（中）： 带电粒子束装置的标准试样，其试样制备方法和带电粒子束装置
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申请号： US11717094申请日： 2007-03-13
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公开(公告)号： US20080073521A1公开(公告)日： 2008-03-27
- 发明人: Toshie Yaguchi , Takeo Kamino , Yoshifumi Taniguchi
- 申请人： Toshie Yaguchi , Takeo Kamino , Yoshifumi Taniguchi
- 专利权人： HITACHI HIGH-TECHNOLOGIES CORPORATION
- 当前专利权人： HITACHI HIGH-TECHNOLOGIES CORPORATION
- 优先权： JP2006-068471 20060314
- 主分类号： G01N23/00
- IPC分类号： G01N23/00
摘要：
An object of the present invention is to provide a standard specimen for a charged particle beam enabling highly precise measurement of sub-micron to several 10 μm in size on an image and an apparatus using the standard specimen. In order to attain the above described object, the present invention provides a standard specimen for a charged particle beam including two different specimens for magnification or measurement calibration and a charged particle beam apparatus using the specimens.
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