PLATING APPARATUS, PLATING METHOD AND MULTILAYER PRINTED CIRCUIT BOARD
    1.
    发明申请
    PLATING APPARATUS, PLATING METHOD AND MULTILAYER PRINTED CIRCUIT BOARD 有权
    电镀设备,镀层方法和多层印刷电路板

    公开(公告)号:US20120005888A1

    公开(公告)日:2012-01-12

    申请号:US13240626

    申请日:2011-09-22

    Abstract: A method for manufacturing a multilayer printed circuit board including providing a core substrate having a penetrating-hole, forming an electroless plated film on a surface of the substrate and an inner wall surface of the penetrating-hole, electrolytically plating the substrate while moving with respect to the surface of the substrate an insulating member in contact with the surface of the substrate such that an electrolytic plated film is formed on the electroless plated film, an opening space inside the penetrating-hole is filled with an electrolytic material, and a through-hole conductor structure is formed in the penetrating-hole, forming an etching resist having an opening pattern on the electrolytic plated film, and removing an exposed pattern of the electrolytic plated film exposed by the opening pattern and a pattern of the electroless plated film under the exposed pattern such that a conductor circuit is formed on the surface of the substrate.

    Abstract translation: 一种多层印刷电路板的制造方法,其特征在于,具有提供具有贯通孔的芯基板,在所述基板的表面上形成无电镀膜和所述贯通孔的内壁面,对所述基板进行电解电镀,同时相对于 在所述基板的表面上与所述基板的表面接触的绝缘构件,使得在所述无电镀膜上形成电解电镀膜,所述贯通孔内的开口空间填充有电解材料, 在导电孔中形成空穴导体结构,在电解镀膜上形成具有开口图案的抗蚀剂,并且除去由开口图案露出的电解电镀膜的露出图案,以及将化学镀膜的图案 使得在基板的表面上形成导体电路。

    Plating apparatus, plating method and multilayer printed circuit board
    2.
    发明授权
    Plating apparatus, plating method and multilayer printed circuit board 有权
    电镀装置,电镀方法和多层印刷电路板

    公开(公告)号:US08197659B2

    公开(公告)日:2012-06-12

    申请号:US13240626

    申请日:2011-09-22

    Abstract: A method for manufacturing a multilayer printed circuit board including providing a core substrate having a penetrating-hole, forming an electroless plated film on a surface of the substrate and an inner wall surface of the penetrating-hole, electrolytically plating the substrate while moving with respect to the surface of the substrate an insulating member in contact with the surface of the substrate such that an electrolytic plated film is formed on the electroless plated film, an opening space inside the penetrating-hole is filled with an electrolytic material, and a through-hole conductor structure is formed in the penetrating-hole, forming an etching resist having an opening pattern on the electrolytic plated film, and removing an exposed pattern of the electrolytic plated film exposed by the opening pattern and a pattern of the electroless plated film under the exposed pattern such that a conductor circuit is formed on the surface of the substrate.

    Abstract translation: 一种多层印刷电路板的制造方法,其特征在于,具有提供具有贯通孔的芯基板,在所述基板的表面上形成无电镀膜和所述贯通孔的内壁面,对所述基板进行电解电镀,同时相对于 在所述基板的表面上与所述基板的表面接触的绝缘构件,使得在所述无电镀膜上形成电解电镀膜,所述贯通孔内的开口空间填充有电解材料, 在导电孔中形成空穴导体结构,在电解镀膜上形成具有开口图案的抗蚀剂,并且除去由开口图案露出的电解电镀膜的露出图案,以及将化学镀膜的图案 使得在基板的表面上形成导体电路。

    Plating apparatus and method of plating
    9.
    发明授权
    Plating apparatus and method of plating 有权
    电镀装置及电镀方法

    公开(公告)号:US08679576B2

    公开(公告)日:2014-03-25

    申请号:US12186919

    申请日:2008-08-06

    Abstract: A plating apparatus and method to perform plating in non-through-hole openings or through-hole openings of a printed wiring board having at least either non-through holes or through-holes to form via-hole conductors or through-hole conductors. The plating method contacts a printed wiring board having the non-through holes or through-holes with a plating solution including plating ingredients, and plates metal on a surface of the printed wiring board while making contact with at least a portion of a pliable contact body.

    Abstract translation: 一种电镀装置和方法,用于在具有至少一个非通孔或通孔的印刷电路板的非通孔开口或通孔开口中执行电镀以形成通孔导体或通孔导体。 电镀方法在印刷电路板的表面上与具有非通孔或通孔的印刷电路板接触,其中电镀液包括电镀成分和板金属,同时与柔性接触体的至少一部分接触 。

    PHOTOCATALYTIC COATING FILM AND METHOD FOR PRODUCING SAME
    10.
    发明申请
    PHOTOCATALYTIC COATING FILM AND METHOD FOR PRODUCING SAME 有权
    光电涂层膜及其制造方法

    公开(公告)号:US20140106961A1

    公开(公告)日:2014-04-17

    申请号:US14124292

    申请日:2012-06-06

    Abstract: Provided is a photocatalytic coating film that can develop excellent photocatalytic activity and exhibit superior adhesion to an adherend surface.The photocatalytic coating film is obtained by applying and drying a photocatalytic coating composition containing at least rod-like or needle-like titanium oxide particles and a binder component so that the photocatalytic coating film contains the titanium oxide particles in a content of 0.5 g/m2 or more. The photocatalytic coating film contains the titanium oxide particle in a content per unit volume (1 m2 by 1 μm thick) of less than 3.0 g. The titanium oxide particles preferably have an aspect ratio of 1.5 or more, the aspect ratio specified as the ratio of a long side length to a short side length of particle. The compositional ratio (by weight) of the titanium oxide particles to the binder component in the photocatalytic coating film is preferably from 1:6 to 30:1.

    Abstract translation: 提供了可以显现出优异的光催化活性并且表现出对被粘物表面的优异粘附性的光催化涂膜。 通过涂布和干燥含有至少棒状或针状二氧化钛颗粒和粘合剂成分的光催化涂料组合物,使得光催化涂膜含有0.5g / m 2的氧化钛颗粒,得到光催化涂膜 或者更多。 光催化涂膜含有小于3.0g的每单位体积(1m 2×1μm)的氧化钛粒子。 优选氧化钛粒子的纵横比为1.5以上,纵横比规定为长边长与粒子的短边长的比例。 光催化性涂膜中的氧化钛粒子与粘合剂成分的组成比(重量比)优选为1:6〜30:1。

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