Invention Grant
- Patent Title: Plating apparatus and method of plating
- Patent Title (中): 电镀装置及电镀方法
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Application No.: US12186919Application Date: 2008-08-06
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Publication No.: US08679576B2Publication Date: 2014-03-25
- Inventor: Toru Nakai , Satoru Kawai
- Applicant: Toru Nakai , Satoru Kawai
- Applicant Address: JP Ogaki-shi
- Assignee: Ibiden Co., Ltd.
- Current Assignee: Ibiden Co., Ltd.
- Current Assignee Address: JP Ogaki-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-045358 20060222
- Main IPC: B05D1/12
- IPC: B05D1/12

Abstract:
A plating apparatus and method to perform plating in non-through-hole openings or through-hole openings of a printed wiring board having at least either non-through holes or through-holes to form via-hole conductors or through-hole conductors. The plating method contacts a printed wiring board having the non-through holes or through-holes with a plating solution including plating ingredients, and plates metal on a surface of the printed wiring board while making contact with at least a portion of a pliable contact body.
Public/Granted literature
- US20090029037A1 PLATING APPARATUS AND METHOD OF PLATING Public/Granted day:2009-01-29
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