公开(公告)号：US20190279894A1

公开(公告)日：2019-09-12

申请号：US16293788

申请日：2019-03-06

Applicant: Tokyo Electron Limited

Inventor： Yohei UCHIDA ,  Naoki SUGAWA ,  Katsushi ABE ,  Tsuyoshi HIDA

IPC: H01L21/687 ,  H01L21/67 ,  H01J37/32

Abstract: A placement apparatus for placing a workpiece is provided. The placement apparatus includes a stage on which a workpiece can be placed in a processing vessel; an edge ring including a locking part which is disposed on the stage so as to surround a periphery of the workpiece; a conductive connecting member connected with the edge ring at the locking part; and a first contacting member configured to cause the edge ring to contact the stage, while the edge ring is connected with the connecting member.

公开(公告)号：US20130306593A1

公开(公告)日：2013-11-21

申请号：US13948921

申请日：2013-07-23

Applicant: TOKYO ELECTRON LIMITED

Inventor： Tsuyoshi HIDA ,  Takashi YAMAMOTO

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  H01L21/67115 ,  H01L21/6831 ,  Y10T29/49986 ,  Y10T279/23

Abstract: An electrostatic chuck of a stack structure includes a metal layer interposed between insulating layers and a groove formed at a peripheral portion of the electrostatic chuck to have a thickness gradually increasing toward an outside, the groove being covered with a thermally sprayed insulating film. The thermally sprayed film covers at least a portion of the metal layer exposed at an inside of the groove such that the thermally sprayed film does not protrude from the groove.

Abstract translation: 堆叠结构的静电卡盘包括插入在绝缘层之间的金属层和形成在静电卡盘的周边部分处的具有朝向外部逐渐增加的厚度的槽，该槽被热喷涂的绝缘膜覆盖。 喷镀膜覆盖暴露在槽内部的金属层的至少一部分，使得喷镀膜不从槽突出。

公开(公告)号：US20220336257A1

公开(公告)日：2022-10-20

申请号：US17811121

申请日：2022-07-07

Applicant: Tokyo Electron Limited

Inventor： Yohei UCHIDA ,  Naoki SUGAWA ,  Katsushi ABE ,  Tsuyoshi HIDA

IPC: H01L21/687 ,  H01J37/32 ,  H01L21/67 ,  H01L21/683

Abstract: A placement apparatus for placing a workpiece is provided. The placement apparatus includes a stage on which a workpiece can be placed in a processing vessel; an edge ring including a locking part which is disposed on the stage so as to surround a periphery of the workpiece; a conductive connecting member connected with the edge ring at the locking part; and a first contacting member configured to cause the edge ring to contact the stage, while the edge ring is connected with the connecting member.

公开(公告)号：US20150170891A1

公开(公告)日：2015-06-18

申请号：US14567133

申请日：2014-12-11

Applicant: Tokyo Electron Limited

Inventor： Masanori TAKAHASHI ,  Tsuyoshi HIDA ,  Noboru TAKEMOTO ,  Hideaki YAKUSHIJI ,  Lin ChiaHung ,  Akitoshi HARADA

IPC: H01J37/34

CPC classification number: H01J37/32834 ,  H01J37/32844 ,  H01J37/32871 ,  Y02C20/30 ,  Y02P70/605

Abstract: A particle backflow preventing part, which is disposed inside of an evacuation pipe connecting a process chamber and an evacuation device, includes a first plate part, and a second plate part that has an opening and is spaced from the first plate part by a first gap and positioned closer to the evacuation device than the first plate part. The opening is covered by the first plate part in plan view.

Abstract translation: 设置在连接处理室和排气装置的抽气管内部的颗粒回流防止部分包括第一板部分和第二板部分，该第一板部分和第二板部分具有开口并且与第一板部分间隔开第一间隙 并且比第一板部更靠近排气装置。 开口在平面图中被第一板部分覆盖。