WORKPIECE PLACEMENT APPARATUS AND PROCESSING APPARATUS

    公开(公告)号:US20190279894A1

    公开(公告)日:2019-09-12

    申请号:US16293788

    申请日:2019-03-06

    Abstract: A placement apparatus for placing a workpiece is provided. The placement apparatus includes a stage on which a workpiece can be placed in a processing vessel; an edge ring including a locking part which is disposed on the stage so as to surround a periphery of the workpiece; a conductive connecting member connected with the edge ring at the locking part; and a first contacting member configured to cause the edge ring to contact the stage, while the edge ring is connected with the connecting member.

    STAGE AND PLASMA PROCESSING APPARATUS

    公开(公告)号:US20210210369A1

    公开(公告)日:2021-07-08

    申请号:US17143399

    申请日:2021-01-07

    Inventor: Naoki SUGAWA

    Abstract: A stage includes a first mounting part on which a substrate is mounted, a second mounting part on which an edge ring surrounding a peripheral edge of the substrate is mounted, the second mounting part being lower than the first mounting part, a first bonding layer configured to bond a base to the first mounting part, a second bonding layer configured to bond the base to the second mounting part, and a seal member configured to close a space between the first mounting part and the second mounting part by deformation of the seal member above the first bonding layer and the second bonding layer while contacting with each of the first mounting part and the second mounting part.

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