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公开(公告)号：US20110069895A1
公开(公告)日：2011-03-24
申请号：US12957018
申请日：2010-11-30
Applicant: Taketo Ueno , Yasuhiro Yoshitake
Inventor： Taketo Ueno , Yasuhiro Yoshitake
IPC: G06K9/68
CPC classification number: G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
Abstract: The present invention relates to a defect inspection system which can perform inspection condition setting easily in a relatively short period of time, can examine the inspection condition setting even when there is no sample, and further can provide an inspection condition and a defect signal intensity to a person, who sets the inspection condition, to assist the inspection condition setting. In the defect inspection system, a defective image, which is an inspection image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image are digitalized as a defect signal intensity and accumulated in association with the inspection condition, and the inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. After all the evaluations are completed, if there are a plurality of defects to be inspected, the work is repeated by times corresponding to the number of kinds of the defects and a recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and is provided to the person who sets the inspection condition. And, appearance inspection for detecting a pattern defect or a foreign material defect on a substrate is performed.
Abstract translation: 本发明涉及一种能够在较短时间内容易进行检查条件设定的缺陷检查系统，即使没有样本也能够检查检查条件设定，并且还可以提供检查条件和缺陷信号强度 设定检查条件的人员，以协助检查条件设定。 在缺陷检查系统中，作为检查图像的缺陷图像和与其对应的参考图像和缺陷图像和参考图像的不匹配部分被数字化为缺陷信号强度并且与检查条件相关联地累积， 并且在重复累积工作的同时改变检查条件以重复评估，直到完成对设定范围内的所有检查条件的评估。 在完成所有评估之后，如果存在多个待检查的缺陷，则对与缺陷的种类数量相对应的次数和包括具有高缺陷信号强度和检查的累积条件的配方文件重复工作 条件项目分配作为检查条件配方自动输出，并提供给设置检查条件的人员。 并且，进行用于检测基板上的图案缺陷或异物缺陷的外观检查。
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公开(公告)号：US20080068593A1
公开(公告)日：2008-03-20
申请号：US11853050
申请日：2007-09-11
Applicant: HIROYUKI NAKANO , Yasuhiro Yoshitake , Toshihiko Nakata , Taketo Ueno
Inventor： HIROYUKI NAKANO , Yasuhiro Yoshitake , Toshihiko Nakata , Taketo Ueno
IPC: G01N21/00
CPC classification number: G01N21/95623 , G01N21/21 , G01N21/95607 , G01N2201/0655
Abstract: A defect detecting apparatus for detecting defects on a substrate sample (wafer) having circuit patterns such as interconnections. The defect detecting apparatus is provided with stages that can be moved arbitrarily in each of the X, Y, Z, and θ directions in a state that the substrate sample is mounted thereon, an illumination optical system for illuminating the circuit patterns from one or plural directions, and a detection optical system for detecting reflection light, diffraction light, or scattered light coming from an inspection region being illuminated through almost the entire hemispherical surface having the substrate sample as the bottom surface. The NA (numerical aperture) thereby falls within a range of 0.7 to 1.0. Harmful defects or foreign substances can be detected so as to be separated from non-defects such as surface roughness of interconnections.
Abstract translation: 一种用于检测具有诸如互连之类的电路图案的衬底样品（晶片）上的缺陷的缺陷检测装置。 该缺陷检测装置设置有可以在其上安装衬底样品的状态下在X，Y，Z和θ方向中的任一个中任意移动的阶段，用于从一个或多个照明电路图案的照明光学系统 方向，以及用于检测来自检查区域的反射光，衍射光或散射光的检测光学系统，该检查区域被基底样品的几乎整个半球形表面照射作为底面。 NA（数值孔径）因此落在0.7至1.0的范围内。 可以检测有害的缺陷或异物，以便与诸如互连的表面粗糙度的无缺陷分离。
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公开(公告)号：US08275189B2
公开(公告)日：2012-09-25
申请号：US12957018
申请日：2010-11-30
Applicant: Taketo Ueno , Yasuhiro Yoshitake
Inventor： Taketo Ueno , Yasuhiro Yoshitake
CPC classification number: G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
Abstract: The present invention relates to a defect inspection system which can perform inspection condition setting easily in a relatively short period of time, can examine the inspection condition setting even when there is no sample, and further can provide an inspection condition and a defect signal intensity to a person, who sets the inspection condition, to assist the inspection condition setting. In the defect inspection system, a defective image, which is an inspection image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image are digitalized as a defect signal intensity and accumulated in association with the inspection condition, and the inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. After all the evaluations are completed, if there are a plurality of defects to be inspected, the work is repeated by times corresponding to the number of kinds of the defects and a recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and is provided to the person who sets the inspection condition. And, appearance inspection for detecting a pattern defect or a foreign material defect on a substrate is performed.
Abstract translation: 本发明涉及一种能够在较短时间内容易进行检查条件设定的缺陷检查系统，即使没有样本也能够检查检查条件设定，并且还可以提供检查条件和缺陷信号强度 设定检查条件的人员，以协助检查条件设定。 在缺陷检查系统中，作为检查图像的缺陷图像和与其对应的参考图像和缺陷图像和参考图像的不匹配部分被数字化为缺陷信号强度并且与检查条件相关联地累积， 并且在重复累积工作的同时改变检查条件以重复评估，直到完成对设定范围内的所有检查条件的评估。 在完成所有评估之后，如果存在多个待检查的缺陷，则对与缺陷的种类数量相对应的次数和包括具有高缺陷信号强度和检查的累积条件的配方文件重复工作 条件项目分配作为检查条件配方自动输出，并提供给设置检查条件的人员。 并且，进行用于检测基板上的图案缺陷或异物缺陷的外观检查。
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公开(公告)号：US08660336B2
公开(公告)日：2014-02-25
申请号：US13593227
申请日：2012-08-23
Applicant: Taketo Ueno , Yasuhiro Yoshitake
Inventor： Taketo Ueno , Yasuhiro Yoshitake
CPC classification number: G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
Abstract: A defect inspection system is disclosed for easily setting inspection conditions and providing an inspection condition and a defect signal intensity to an operator. The defect inspection system digitizes a defective image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image as a defect signal intensity and accumulates them in association with the inspection condition. The inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. A recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and provided to the operator.
Abstract translation: 公开了一种用于容易地设置检查条件并向操作者提供检查条件和缺陷信号强度的缺陷检查系统。 缺陷检查系统将缺陷图像，与其对应的参考图像和缺陷图像和参考图像的不匹配部分数字化为缺陷信号强度，并与检查条件相关联地累加它们。 更改检查条件以重复评估，同时重复累积工作，直到完成对设定范围内的所有检查条件的评估。 包括具有高缺陷信号强度的累积条件和作为检查条件配方的检查条件项目分配的配方文件被自动输出并提供给操作者。
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公开(公告)号：US07881520B2
公开(公告)日：2011-02-01
申请号：US11501815
申请日：2006-08-10
Applicant: Taketo Ueno , Yasuhiro Yoshitake
Inventor： Taketo Ueno , Yasuhiro Yoshitake
CPC classification number: G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
Abstract: The present invention relates to a defect inspection system which can perform inspection condition setting easily in a relatively short period of time, can examine the inspection condition setting even when there is no sample, and further can provide an inspection condition and a defect signal intensity to a person, who sets the inspection condition, to assist the inspection condition setting. In the defect inspection system, a defective image, which is an inspection image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image are digitalized as a defect signal intensity and accumulated in association with the inspection condition, and the inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. After all the evaluations are completed, if there are a plurality of defects to be inspected, the work is repeated by times corresponding to the number of kinds of the defects and a recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and is provided to the person who sets the inspection condition. And, appearance inspection for detecting a pattern defect or a foreign material defect on a substrate is performed.
Abstract translation: 本发明涉及一种能够在较短时间内容易进行检查条件设定的缺陷检查系统，即使没有样本也能够检查检查条件设定，并且还可以提供检查条件和缺陷信号强度 设定检查条件的人员，以协助检查条件设定。 在缺陷检查系统中，作为检查图像的缺陷图像和与其对应的参考图像和缺陷图像和参考图像的不匹配部分被数字化为缺陷信号强度并且与检查条件相关联地累积， 并且在重复累积工作的同时改变检查条件以重复评估，直到完成对设定范围内的所有检查条件的评估。 在完成所有评估之后，如果存在多个待检查的缺陷，则对与缺陷的种类数量相对应的次数和包括具有高缺陷信号强度和检查的累积条件的配方文件重复工作 条件项目分配作为检查条件配方自动输出，并提供给设置检查条件的人员。 并且，进行用于检测基板上的图案缺陷或异物缺陷的外观检查。
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Patent Agency Ranking
公开(公告)号：US07643140B2
公开(公告)日：2010-01-05
申请号：US12046521
申请日：2008-03-12
Applicant: Taketo Ueno , Yasuhiro Yoshitake
Inventor： Taketo Ueno , Yasuhiro Yoshitake
CPC classification number: G01N21/95607
Abstract: A semiconductor defect inspection apparatus using a method of comparing an inspected image with a reference image includes the following: (1) a light source and an illuminating optical system, (2) plural defect optical imaging systems and photo detectors for scattered light detection, (3) a substrate holder and a stage for a scan, (4) means for obtaining the misalignment information on an adjacent die image using the inspection image of a defect optical imaging system with the highest spatial resolution, and means for transmitting the misalignment information to all the defect inspection image processing units, (5) means for correcting misalignment information so that a design and adjustment condition of each optical imaging system may be suited, and means for calculating a difference image between dies based on the corrected misalignment information, and (6) a defect detection and image processing unit for performing defect determination and detection processing based on the difference image between the dies.
Abstract translation: 使用将检查图像与参考图像进行比较的方法的半导体缺陷检查装置包括：（1）光源和照明光学系统，（2）多个缺陷光学成像系统和用于散射光检测的光电检测器（ 3）衬底保持器和用于扫描的台，（4）使用具有最高空间分辨率的缺陷光学成像系统的检查图像获得相邻裸片图像上的未对准信息的装置，以及用于将未对准信息发送到 所有缺陷检查图像处理单元，（5）用于校正未对准信息的装置，使得每个光学成像系统的设计和调整条件可能适合;以及用于基于校正的未对准信息计算管芯之间的差分图像的装置，以及（ 6）一种用于基于该差异执行缺陷确定和检测处理的缺陷检测和图像处理单元 模具之间的图像。
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公开(公告)号：US20070053581A1
公开(公告)日：2007-03-08
申请号：US11501815
申请日：2006-08-10
Applicant: Taketo Ueno , Yasuhiro Yoshitake
Inventor： Taketo Ueno , Yasuhiro Yoshitake
IPC: G06K9/00
CPC classification number: G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
Abstract: The present invention relates to a defect inspection system which can perform inspection condition setting easily in a relatively short period of time, can examine the inspection condition setting even when there is no sample, and further can provide an inspection condition and a defect signal intensity to a person, who sets the inspection condition, to assist the inspection condition setting. In the defect inspection system, a defective image, which is an inspection image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image are digitalized as a defect signal intensity and accumulated in association with the inspection condition, and the inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. After all the evaluations are completed, if there are a plurality of defects to be inspected, the work is repeated by times corresponding to the number of kinds of the defects and a recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and is provided to the person who sets the inspection condition. And, appearance inspection for detecting a pattern defect or a foreign material defect on a substrate is performed.
Abstract translation: 本发明涉及一种能够在较短时间内容易进行检查条件设定的缺陷检查系统，即使没有样本也能够检查检查条件设定，并且还可以提供检查条件和缺陷信号强度 设定检查条件的人员，以协助检查条件设定。 在缺陷检查系统中，作为检查图像的缺陷图像和与其对应的参考图像和缺陷图像和参考图像的不匹配部分被数字化为缺陷信号强度并且与检查条件相关联地累积， 并且在重复累积工作的同时改变检查条件以重复评估，直到完成对设定范围内的所有检查条件的评估。 在完成所有评估之后，如果存在多个待检查的缺陷，则对与缺陷的种类数量相对应的次数和包括具有高缺陷信号强度和检查的累积条件的配方文件重复工作 条件项目分配作为检查条件配方自动输出，并提供给设置检查条件的人员。 并且，进行用于检测基板上的图案缺陷或异物缺陷的外观检查。
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公开(公告)号：US08982332B2
公开(公告)日：2015-03-17
申请号：US13518727
申请日：2011-01-28
Applicant: Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
Inventor： Takehiro Tachizaki , Masahiro Watanabe , Tatsuo Hariyama , Yasuhiro Yoshitake , Tetsuya Matsui , Hirokazu Matsumoto , Kiyoshi Takamasu
CPC classification number: G01S17/36 , G01B9/02003 , G01B9/02007 , G01B9/02008 , G01B9/0207 , G01S7/4815 , G01S7/4911 , G01S17/42
Abstract: Disclosed is a distance measuring device using an optical comb. In order for the absolute distance to an object to be measured which has a surface with low reflection ratio or a scattering surface and is approximately 10 m apart, to be easily measured with accuracy of 0.1 mm or more using an optical and contactless method, the distance measuring device which measures the distance to the object to be measured is configured such that the distance to the object to be measured is measured by comparing the phase of the beat signal between a light source and a plurality of CW lasers which are reflected or scattered by the object with the phase of the beat signal between the light source and a plurality of CW lasers prior to being irradiated onto the object.
Abstract translation: 公开了使用光梳的距离测量装置。 为了使具有低反射率或散射面的表面的测量对象的绝对距离相差10微米，使用光学和非接触方法可以容易地测量精度为0.1mm以上， 测量到被测量物体的距离的距离测量装置被配置为通过比较反射或散射的光源和多个CW激光器之间的拍频信号的相位来测量到被测量物体的距离 在被照射到物体上之前，通过光源和多个CW激光器之间的拍频信号的相位的对象。
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9.发明授权Method and apparatus for measuring displacement of a sample using a wire grid polarizer to generate interference light 有权用于使用线栅偏振器测量样品的位移以产生干涉光的方法和装置公开(公告)号：US08659761B2
公开(公告)日：2014-02-25
申请号：US13302948
申请日：2011-11-22
Applicant: Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
Inventor： Toshihiko Nakata , Masahiro Watanabe , Shuichi Baba , Yasuhiro Yoshitake , Mineo Nomoto
IPC: G01B9/02
CPC classification number: G01B9/02057 , G01B9/02003 , G01B9/02081 , G01B2290/30 , G01B2290/70 , G03F7/70775
Abstract: In a displacement measurement apparatus using light interference, a probe light path is spatially separated from a reference light path. Therefore, when a temperature or refractive index distribution by a fluctuation of air or the like, or a mechanical vibration is generated, an optical path difference fluctuates between both of the optical paths, and a measurement error is generated. In the solution, an optical axis of probe light is brought close to that of reference light by a distance which is not influenced by any disturbance, a sample is irradiated with the probe light, a reference surface is irradiated with the reference light, reflected light beams are allowed to interfere with each other, and a displacement of the sample is obtained from the resultant interference light to thereby prevent the measurement error from being generated by the fluctuation of the optical path difference.
Abstract translation: 在使用光干涉的位移测量装置中，探针光路在空间上与参考光路分离。 因此，当通过空气等的波动或机械振动产生温度或折射率分布时，光路差在两个光路之间波动，并且产生测量误差。 在该解决方案中，将探测光的光轴靠近参考光的光轴不受任何干扰影响的距离，用探测光照射样品，用参考光照射参考表面，反射光 允许光束彼此干涉，并且从所得到的干涉光中获得样品的位移，从而防止由于光程差的波动而产生测量误差。
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公开(公告)号：US08553214B2
公开(公告)日：2013-10-08
申请号：US12876709
申请日：2010-09-07
Applicant: Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
Inventor： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
Abstract: An inspection apparatus and method includes a light source, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
Abstract translation: 一种检查装置和方法，包括光源，具有偏振控制器和物镜的照明单元，用于利用从光源发射并通过偏振控制器和物镜的光照射样本;检测单元，具有用于 检测由所述照明单元照射的样本的光;处理器，其处理从所述传感器输出的信号以检测所述样本上的缺陷;以及显示器，其显示从所述处理器输出的信息。 处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。
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