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公开(公告)号：US07643140B2
公开(公告)日：2010-01-05
申请号：US12046521
申请日：2008-03-12
Applicant: Taketo Ueno , Yasuhiro Yoshitake
Inventor： Taketo Ueno , Yasuhiro Yoshitake
CPC classification number: G01N21/95607
Abstract: A semiconductor defect inspection apparatus using a method of comparing an inspected image with a reference image includes the following: (1) a light source and an illuminating optical system, (2) plural defect optical imaging systems and photo detectors for scattered light detection, (3) a substrate holder and a stage for a scan, (4) means for obtaining the misalignment information on an adjacent die image using the inspection image of a defect optical imaging system with the highest spatial resolution, and means for transmitting the misalignment information to all the defect inspection image processing units, (5) means for correcting misalignment information so that a design and adjustment condition of each optical imaging system may be suited, and means for calculating a difference image between dies based on the corrected misalignment information, and (6) a defect detection and image processing unit for performing defect determination and detection processing based on the difference image between the dies.
Abstract translation: 使用将检查图像与参考图像进行比较的方法的半导体缺陷检查装置包括：（1）光源和照明光学系统，（2）多个缺陷光学成像系统和用于散射光检测的光电检测器（ 3）衬底保持器和用于扫描的台，（4）使用具有最高空间分辨率的缺陷光学成像系统的检查图像获得相邻裸片图像上的未对准信息的装置，以及用于将未对准信息发送到 所有缺陷检查图像处理单元，（5）用于校正未对准信息的装置，使得每个光学成像系统的设计和调整条件可能适合;以及用于基于校正的未对准信息计算管芯之间的差分图像的装置，以及（ 6）一种用于基于该差异执行缺陷确定和检测处理的缺陷检测和图像处理单元 模具之间的图像。
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公开(公告)号：US20070053581A1
公开(公告)日：2007-03-08
申请号：US11501815
申请日：2006-08-10
Applicant: Taketo Ueno , Yasuhiro Yoshitake
Inventor： Taketo Ueno , Yasuhiro Yoshitake
IPC: G06K9/00
CPC classification number: G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
Abstract: The present invention relates to a defect inspection system which can perform inspection condition setting easily in a relatively short period of time, can examine the inspection condition setting even when there is no sample, and further can provide an inspection condition and a defect signal intensity to a person, who sets the inspection condition, to assist the inspection condition setting. In the defect inspection system, a defective image, which is an inspection image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image are digitalized as a defect signal intensity and accumulated in association with the inspection condition, and the inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. After all the evaluations are completed, if there are a plurality of defects to be inspected, the work is repeated by times corresponding to the number of kinds of the defects and a recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and is provided to the person who sets the inspection condition. And, appearance inspection for detecting a pattern defect or a foreign material defect on a substrate is performed.
Abstract translation: 本发明涉及一种能够在较短时间内容易进行检查条件设定的缺陷检查系统，即使没有样本也能够检查检查条件设定，并且还可以提供检查条件和缺陷信号强度 设定检查条件的人员，以协助检查条件设定。 在缺陷检查系统中，作为检查图像的缺陷图像和与其对应的参考图像和缺陷图像和参考图像的不匹配部分被数字化为缺陷信号强度并且与检查条件相关联地累积， 并且在重复累积工作的同时改变检查条件以重复评估，直到完成对设定范围内的所有检查条件的评估。 在完成所有评估之后，如果存在多个待检查的缺陷，则对与缺陷的种类数量相对应的次数和包括具有高缺陷信号强度和检查的累积条件的配方文件重复工作 条件项目分配作为检查条件配方自动输出，并提供给设置检查条件的人员。 并且，进行用于检测基板上的图案缺陷或异物缺陷的外观检查。
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公开(公告)号：US20110069895A1
公开(公告)日：2011-03-24
申请号：US12957018
申请日：2010-11-30
Applicant: Taketo Ueno , Yasuhiro Yoshitake
Inventor： Taketo Ueno , Yasuhiro Yoshitake
IPC: G06K9/68
CPC classification number: G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
Abstract: The present invention relates to a defect inspection system which can perform inspection condition setting easily in a relatively short period of time, can examine the inspection condition setting even when there is no sample, and further can provide an inspection condition and a defect signal intensity to a person, who sets the inspection condition, to assist the inspection condition setting. In the defect inspection system, a defective image, which is an inspection image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image are digitalized as a defect signal intensity and accumulated in association with the inspection condition, and the inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. After all the evaluations are completed, if there are a plurality of defects to be inspected, the work is repeated by times corresponding to the number of kinds of the defects and a recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and is provided to the person who sets the inspection condition. And, appearance inspection for detecting a pattern defect or a foreign material defect on a substrate is performed.
Abstract translation: 本发明涉及一种能够在较短时间内容易进行检查条件设定的缺陷检查系统，即使没有样本也能够检查检查条件设定，并且还可以提供检查条件和缺陷信号强度 设定检查条件的人员，以协助检查条件设定。 在缺陷检查系统中，作为检查图像的缺陷图像和与其对应的参考图像和缺陷图像和参考图像的不匹配部分被数字化为缺陷信号强度并且与检查条件相关联地累积， 并且在重复累积工作的同时改变检查条件以重复评估，直到完成对设定范围内的所有检查条件的评估。 在完成所有评估之后，如果存在多个待检查的缺陷，则对与缺陷的种类数量相对应的次数和包括具有高缺陷信号强度和检查的累积条件的配方文件重复工作 条件项目分配作为检查条件配方自动输出，并提供给设置检查条件的人员。 并且，进行用于检测基板上的图案缺陷或异物缺陷的外观检查。
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公开(公告)号：US20080068593A1
公开(公告)日：2008-03-20
申请号：US11853050
申请日：2007-09-11
Applicant: HIROYUKI NAKANO , Yasuhiro Yoshitake , Toshihiko Nakata , Taketo Ueno
Inventor： HIROYUKI NAKANO , Yasuhiro Yoshitake , Toshihiko Nakata , Taketo Ueno
IPC: G01N21/00
CPC classification number: G01N21/95623 , G01N21/21 , G01N21/95607 , G01N2201/0655
Abstract: A defect detecting apparatus for detecting defects on a substrate sample (wafer) having circuit patterns such as interconnections. The defect detecting apparatus is provided with stages that can be moved arbitrarily in each of the X, Y, Z, and θ directions in a state that the substrate sample is mounted thereon, an illumination optical system for illuminating the circuit patterns from one or plural directions, and a detection optical system for detecting reflection light, diffraction light, or scattered light coming from an inspection region being illuminated through almost the entire hemispherical surface having the substrate sample as the bottom surface. The NA (numerical aperture) thereby falls within a range of 0.7 to 1.0. Harmful defects or foreign substances can be detected so as to be separated from non-defects such as surface roughness of interconnections.
Abstract translation: 一种用于检测具有诸如互连之类的电路图案的衬底样品（晶片）上的缺陷的缺陷检测装置。 该缺陷检测装置设置有可以在其上安装衬底样品的状态下在X，Y，Z和θ方向中的任一个中任意移动的阶段，用于从一个或多个照明电路图案的照明光学系统 方向，以及用于检测来自检查区域的反射光，衍射光或散射光的检测光学系统，该检查区域被基底样品的几乎整个半球形表面照射作为底面。 NA（数值孔径）因此落在0.7至1.0的范围内。 可以检测有害的缺陷或异物，以便与诸如互连的表面粗糙度的无缺陷分离。
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公开(公告)号：US08660336B2
公开(公告)日：2014-02-25
申请号：US13593227
申请日：2012-08-23
Applicant: Taketo Ueno , Yasuhiro Yoshitake
Inventor： Taketo Ueno , Yasuhiro Yoshitake
CPC classification number: G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
Abstract: A defect inspection system is disclosed for easily setting inspection conditions and providing an inspection condition and a defect signal intensity to an operator. The defect inspection system digitizes a defective image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image as a defect signal intensity and accumulates them in association with the inspection condition. The inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. A recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and provided to the operator.
Abstract translation: 公开了一种用于容易地设置检查条件并向操作者提供检查条件和缺陷信号强度的缺陷检查系统。 缺陷检查系统将缺陷图像，与其对应的参考图像和缺陷图像和参考图像的不匹配部分数字化为缺陷信号强度，并与检查条件相关联地累加它们。 更改检查条件以重复评估，同时重复累积工作，直到完成对设定范围内的所有检查条件的评估。 包括具有高缺陷信号强度的累积条件和作为检查条件配方的检查条件项目分配的配方文件被自动输出并提供给操作者。
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Patent Agency Ranking
公开(公告)号：US07881520B2
公开(公告)日：2011-02-01
申请号：US11501815
申请日：2006-08-10
Applicant: Taketo Ueno , Yasuhiro Yoshitake
Inventor： Taketo Ueno , Yasuhiro Yoshitake
CPC classification number: G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
Abstract: The present invention relates to a defect inspection system which can perform inspection condition setting easily in a relatively short period of time, can examine the inspection condition setting even when there is no sample, and further can provide an inspection condition and a defect signal intensity to a person, who sets the inspection condition, to assist the inspection condition setting. In the defect inspection system, a defective image, which is an inspection image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image are digitalized as a defect signal intensity and accumulated in association with the inspection condition, and the inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. After all the evaluations are completed, if there are a plurality of defects to be inspected, the work is repeated by times corresponding to the number of kinds of the defects and a recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and is provided to the person who sets the inspection condition. And, appearance inspection for detecting a pattern defect or a foreign material defect on a substrate is performed.
Abstract translation: 本发明涉及一种能够在较短时间内容易进行检查条件设定的缺陷检查系统，即使没有样本也能够检查检查条件设定，并且还可以提供检查条件和缺陷信号强度 设定检查条件的人员，以协助检查条件设定。 在缺陷检查系统中，作为检查图像的缺陷图像和与其对应的参考图像和缺陷图像和参考图像的不匹配部分被数字化为缺陷信号强度并且与检查条件相关联地累积， 并且在重复累积工作的同时改变检查条件以重复评估，直到完成对设定范围内的所有检查条件的评估。 在完成所有评估之后，如果存在多个待检查的缺陷，则对与缺陷的种类数量相对应的次数和包括具有高缺陷信号强度和检查的累积条件的配方文件重复工作 条件项目分配作为检查条件配方自动输出，并提供给设置检查条件的人员。 并且，进行用于检测基板上的图案缺陷或异物缺陷的外观检查。
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公开(公告)号：US08275189B2
公开(公告)日：2012-09-25
申请号：US12957018
申请日：2010-11-30
Applicant: Taketo Ueno , Yasuhiro Yoshitake
Inventor： Taketo Ueno , Yasuhiro Yoshitake
CPC classification number: G01N21/9501 , G01N21/956 , G03F1/84 , G03F7/7065 , H01L21/67288
Abstract: The present invention relates to a defect inspection system which can perform inspection condition setting easily in a relatively short period of time, can examine the inspection condition setting even when there is no sample, and further can provide an inspection condition and a defect signal intensity to a person, who sets the inspection condition, to assist the inspection condition setting. In the defect inspection system, a defective image, which is an inspection image, and a reference image corresponding thereto and a mismatched portion of the defective image and the reference image are digitalized as a defect signal intensity and accumulated in association with the inspection condition, and the inspection conditions are changed to repeat evaluations while repeating accumulating works until the evaluation of all the inspection conditions in a set range is completed. After all the evaluations are completed, if there are a plurality of defects to be inspected, the work is repeated by times corresponding to the number of kinds of the defects and a recipe file including the accumulated conditions having the high defect signal intensity and an inspection condition item distribution as a inspection condition recipe is automatically outputted and is provided to the person who sets the inspection condition. And, appearance inspection for detecting a pattern defect or a foreign material defect on a substrate is performed.
Abstract translation: 本发明涉及一种能够在较短时间内容易进行检查条件设定的缺陷检查系统，即使没有样本也能够检查检查条件设定，并且还可以提供检查条件和缺陷信号强度 设定检查条件的人员，以协助检查条件设定。 在缺陷检查系统中，作为检查图像的缺陷图像和与其对应的参考图像和缺陷图像和参考图像的不匹配部分被数字化为缺陷信号强度并且与检查条件相关联地累积， 并且在重复累积工作的同时改变检查条件以重复评估，直到完成对设定范围内的所有检查条件的评估。 在完成所有评估之后，如果存在多个待检查的缺陷，则对与缺陷的种类数量相对应的次数和包括具有高缺陷信号强度和检查的累积条件的配方文件重复工作 条件项目分配作为检查条件配方自动输出，并提供给设置检查条件的人员。 并且，进行用于检测基板上的图案缺陷或异物缺陷的外观检查。
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公开(公告)号：US08970836B2
公开(公告)日：2015-03-03
申请号：US14235916
申请日：2012-05-14
Applicant: Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
Inventor： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
CPC classification number: G01N21/95 , G01B11/0641 , G01N21/211 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/9513 , G02F1/1303 , G02F1/136259
Abstract: An invention being applied is a defect detecting apparatus that has: an illuminating optical system with a laser light source for irradiating a sample on whose surface a pattern is formed with light; a detecting optical system with a sensor for detecting light generated from the sample illuminated by the illuminating optical system; and a signal processing unit that extracts a defect from an image based on the light detected by the detecting optical system, in which an amplification rate of the sensor is dynamically changed during a time when the light is detected by the detecting optical system.
Abstract translation: 一种应用的发明是一种缺陷检测装置，其具有：具有激光光源的照明光学系统，用于对其表面形成有图案的样品进行照射; 检测光学系统，其具有用于检测由照明光学系统照射的样本产生的光的传感器; 以及信号处理单元，其基于由检测光学系统检测到的光的时间期间传感器的放大率动态地改变的检测光学系统检测到的光，从图像中提取缺陷。
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公开(公告)号：US08289507B2
公开(公告)日：2012-10-16
申请号：US13118004
申请日：2011-05-27
Applicant: Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
Inventor： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Sachio Uto , Taketo Ueno , Hiroyuki Nakano , Takahiro Jingu , Hisashi Hatano , Yukihisa Mohara , Seiji Otani , Takahiro Togashi
IPC: G01N21/00
CPC classification number: G01N21/956
Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
Abstract translation: 通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射， 根据要检测的缺陷的种类从照明光源发射的光束。 通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率 形状光通量。 通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。
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公开(公告)号：US20120092484A1
公开(公告)日：2012-04-19
申请号：US13375239
申请日：2010-07-01
Applicant: Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Toshihiko Nakata
Inventor： Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Toshihiko Nakata
IPC: H04N7/18
CPC classification number: G01N21/956 , G01N21/9501
Abstract: To effectively utilize the polarization property of an inspection subject for obtaining higher inspection sensitivity, for the polarization of lighting, it is necessary to observe differences in the reflection, diffraction, and scattered light from the inspection subject because of polarization by applying light having the same elevation angle and wavelength in the same direction but different polarization. According to conventional techniques, a plurality of measurements by changing polarizations is required to cause a prolonged inspection time period that is an important specification of inspection apparatuses. In this invention, a plurality of polarization states are modulated in micro areas in the lighting beam cross section, images under a plurality of polarized lighting conditions are collectively acquired by separately and simultaneously forming the scattered light from the individual micro areas in the individual pixels of a sensor, whereby inspection sensitivity and sorting and sizing accuracy are improved without reducing throughput.
Abstract translation: 为了有效地利用检查对象的偏振特性以获得更高的检测灵敏度，对于照明的偏振，需要观察来自检查对象的反射，衍射和散射光的差异，因为通过施加具有相同的光的偏振 仰角和波长相同但偏振不同。 根据常规技术，需要通过改变极化的多个测量来引起作为检查设备的重要规格的延长的检查时间段。 在本发明中，在照明光束横截面的微小区域中调制多个偏振状态，通过分别并且同时形成来自各个像素中的各个微区域的散射光，共同地获得多个偏振光照条件下的图像 传感器，从而在不降低生产能力的情况下提高检测灵敏度和分选和尺寸精度。
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