公开(公告)号：US20180251892A1

公开(公告)日：2018-09-06

申请号：US15900836

申请日：2018-02-21

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takeshi Kobayashi ,  Hitoshi Kato ,  Yukio Ohizumi

IPC: C23C16/458 ,  C23C16/455

CPC classification number: C23C16/4584 ,  C23C16/402 ,  C23C16/45544

Abstract: There is provided a rotation detection jig used for an apparatus in which a substrate is processed inside a processing container by rotating a mounting stand for a substrate provided on one surface side of a rotary table while revolving the mounting stand with rotation of the rotary table, and supplying a processing gas to a region through which the mounting stand passes, including: a rotating element configured to rotate about a rotation shaft of the mounting stand; an encoder main body configured to detect a rotation angle of the rotating element and configured to constitute a rotary encoder together with the rotating element; a fixing member configured to fix the encoder main body to a rotating portion including the rotary table; and a signal processing part provided in the rotating portion and configured to process a detection signal detected by the encoder main body.

公开(公告)号：US10002417B2

公开(公告)日：2018-06-19

申请号：US14281989

申请日：2014-05-20

Applicant: Tokyo Electron Limited

Inventor： Kiichi Takahashi ,  Takeshi Kobayashi ,  Yuji Takabatake ,  Naohide Ito ,  Katsuaki Sugawara

IPC: G01C5/00 ,  G06T7/00 ,  H04N7/18

CPC classification number: G06T7/0004 ,  G06T2207/30148

Abstract: A ready for rotation state detection device is configured to detect a state in which a substrate, which is placed on a concave portion formed in a surface of a turntable, will not fly out of the concave portion when the turntable is rotated in a chamber. The ready for rotation state detection device includes a ready for rotation state detection unit configured to detect that a height of a surface of an end of the substrate is equal to or lower than a predetermined value indicating that the turntable is rotatable, upon receiving the substrate on the concave portion.

公开(公告)号：US12131889B2

公开(公告)日：2024-10-29

申请号：US17502540

申请日：2021-10-15

Applicant: Tokyo Electron Limited

Inventor： Takeshi Kobayashi ,  Takeshi Ando ,  Kiwamu Ito ,  Yuki Tanaka

IPC: H01J37/32

CPC classification number: H01J37/32532 ,  H01J37/32091 ,  H01J37/32183 ,  H01J37/32458

Abstract: A plasma generating apparatus includes: an electrode pair including a first plasma electrode and a second plasma electrode that are arranged to face each other; an RF power supply that supplies an RF power to the electrode pair; and a matching unit provided between the RF power supply and the electrode pair. The matching unit includes: a first variable capacitor and a second variable capacitor that are connected in parallel with respect to a load between the electrode pair; a coil connected in series with the first plasma electrode; and a capacitor connected in series with the second plasma electrode.

公开(公告)号：US11702746B2

公开(公告)日：2023-07-18

申请号：US16874776

申请日：2020-05-15

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takeshi Kobayashi

IPC: C23C16/458 ,  C23C16/40 ,  C23C16/455 ,  H02K49/10 ,  H01L21/687

CPC classification number: C23C16/4584 ,  C23C16/401 ,  C23C16/45525 ,  C23C16/45563 ,  H01L21/68714 ,  H01L21/68771 ,  H01L21/68785 ,  H02K49/102

Abstract: There is provided a magnetic drive apparatus having a magnetic drive mechanism driven by a magnet. The magnetic drive apparatus includes a magnetizing yoke disposed in the magnetic drive apparatus at a standby position and configured to be moved to magnetize the magnet and a magnetizing yoke holder configured to hold the magnetizing yoke at a magnetizing position for magnetizing the magnet when the magnetic drive mechanism is stopped.

公开(公告)号：US11572625B2

公开(公告)日：2023-02-07

申请号：US15900836

申请日：2018-02-21

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takeshi Kobayashi ,  Hitoshi Kato ,  Yukio Ohizumi

IPC: C23C16/458 ,  C23C16/455 ,  H01L21/687 ,  C23C16/40

Abstract: There is provided a rotation detection jig used for an apparatus in which a substrate is processed inside a processing container by rotating a mounting stand for a substrate provided on one surface side of a rotary table while revolving the mounting stand with rotation of the rotary table, and supplying a processing gas to a region through which the mounting stand passes, including: a rotating element configured to rotate about a rotation shaft of the mounting stand; an encoder main body configured to detect a rotation angle of the rotating element and configured to constitute a rotary encoder together with the rotating element; a fixing member configured to fix the encoder main body to a rotating portion including the rotary table; and a signal processing part provided in the rotating portion and configured to process a detection signal detected by the encoder main body.

公开(公告)号：US11422008B2

公开(公告)日：2022-08-23

申请号：US16596001

申请日：2019-10-08

Applicant: TOKYO ELECTRON LIMITED

Inventor： Takeshi Kobayashi

IPC: G01D5/20 ,  C23C16/458 ,  B05C13/00 ,  G01D5/34

Abstract: A rotation angle detection apparatus includes a movable pattern prepared on an outer peripheral side surface of a rotary shaft and having a shape that changes along a circumferential direction of the outer peripheral side surface; and a stationary pattern fixedly arranged around the rotary shaft so as to face the movable pattern. An overlapping state between the movable pattern and the stationary pattern changes by rotation of the rotary shaft. A physical quantity changing according to a change in the overlapping state between the movable pattern and the stationary pattern is detected, and a rotation angle of the rotary shaft is detected based on the physical quantity.

公开(公告)号：US11136669B2

公开(公告)日：2021-10-05

申请号：US16225788

申请日：2018-12-19

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hitoshi Kato ,  Takeshi Kobayashi ,  Toshiyuki Nakatsubo

IPC: C23C16/458 ,  C23C14/54 ,  H01L21/683 ,  C23C16/455 ,  H01L21/687

Abstract: A film formation apparatus includes a rotary table provided in a processing container; a mounting table mounting a substrate and revolved by rotation of the rotary table; a film formation gas supply part configured to supply a film formation gas to a region through which the mounting table passes by the rotation of the rotary table; a spinning shaft rotatably provided on a portion rotating together with the rotary table; a driven gear provided on the spinning shaft; a driving gear configured to rotate while facing a revolution orbit of the driven gear and provided along an entire circumference of the revolution orbit so as to constitute a magnetic gear mechanism with the driven gear, and a relative-distance-changing mechanism configured to change a relative distance between the revolution orbit of the driven gear and the driving gear.

公开(公告)号：US11118267B2

公开(公告)日：2021-09-14

申请号：US16416609

申请日：2019-05-20

Applicant: TOKYO ELECTRON LIMITED

Inventor： Hitoshi Kato ,  Toshiyuki Nakatsubo ,  Takeshi Kobayashi ,  Tomoya Hasegawa

IPC: C23C16/458 ,  C23C16/455

Abstract: A method of processing a substrate, includes: mounting at least one substrate on at least one substrate holder configured to rotate about an axis of the at least one substrate holder, the at least one substrate holder being provided along a circumferential direction of a rotary table installed inside a processing chamber; holding the at least one substrate by the at least one substrate holder in a contact manner by bringing a substrate contact portion into contact with at least three points on a lateral surface of the at least one substrate mounted on the at least one substrate holder; and performing a substrate process while rotating the rotary table and rotating the at least one substrate holder about the axis of the at least one substrate holder in a state where the at least one substrate is held by the at least one substrate holder in the contact manner.

公开(公告)号：US11972921B2

公开(公告)日：2024-04-30

申请号：US17089949

申请日：2020-11-05

Applicant: Tokyo Electron Limited

Inventor： Takeshi Kobayashi ,  Tatsuo Matsudo

IPC: G01K11/00 ,  C23C16/458 ,  C23C16/50 ,  C23C16/52 ,  G01B11/06 ,  H01J37/244 ,  H01J37/32

CPC classification number: H01J37/244 ,  C23C16/4584 ,  C23C16/50 ,  C23C16/52 ,  G01B11/0616 ,  G01K11/00 ,  H01J37/32715 ,  H01J2237/20214 ,  H01J2237/24578 ,  H01J2237/24585 ,  H01J2237/332

Abstract: A temperature measurement system includes: a thickness calculating unit that calculates an optical thickness of a substrate; a rotation position detecting unit that detects rotation position information of the rotary table; a substrate specifying unit that specifies a substrate based on the rotation position information; a storage unit that stores first relationship information indicating a relationship between a temperature and a thickness associated with each substrate, and second relationship information indicating a relationship between an amount of change in temperature and an amount of change in optical thickness associated with each substrate; and a temperature calculating unit that calculates a temperature of the substrate based on the optical thickness calculated by the thickness calculating unit, the substrate specified by the substrate specifying unit, the first relationship information, and the second relationship information.

公开(公告)号：US09583318B2

公开(公告)日：2017-02-28

申请号：US15080822

申请日：2016-03-25

Applicant: TOKYO ELECTRON LIMITED

Inventor： Shigehiro Miura ,  Takeshi Kobayashi ,  Katsuaki Sugawara ,  Naohide Ito

IPC: H01L21/67 ,  H01J37/32 ,  C23C16/458 ,  C23C16/52 ,  C23C16/50 ,  H01L21/687

CPC classification number: H01J37/32972 ,  C23C16/45536 ,  C23C16/45551 ,  C23C16/4584 ,  C23C16/4586 ,  C23C16/50 ,  C23C16/52 ,  H01J37/321 ,  H01J37/32935 ,  H01L21/67115 ,  H01L21/68764 ,  H01L21/68771

Abstract: There is provided an apparatus of performing a plasma process on substrates mounted on an upper surface of a rotary table. The apparatus includes: a heater for heating the substrates; a process gas supply part for supplying a process gas toward the upper surface of the rotary table; an antenna for generating an inductively coupled plasma by converting the process gas to plasma; a light detection part for detecting respective light intensities of R, G and B component as light color components; a calculation part for obtaining an evaluation value corresponding to a change amount before and after supplying a high-frequency power to the antenna, with respect to at least one of the respective light intensities; and an ignition determination part for comparing the evaluation value with a threshold value and to determine that ignition of plasma is not generated if the evaluation value does not exceed the threshold value.

Abstract translation: 提供了对安装在旋转台的上表面上的基板上进行等离子体处理的装置。 该装置包括：用于加热基板的加热器; 处理气体供给部，其用于向所述转台的上表面供给处理气体; 用于通过将处理气体转换成等离子体来产生电感耦合等离子体的天线; 用于检测作为浅色分量的R，G和B分量的各个光强度的光检测部分; 相对于各个光强度中的至少一个，获得与向天线供给高频电力前后变化量对应的评价值的计算部; 以及点火确定部分，用于将评估值与阈值进行比较，并且如果评估值不超过阈值，则确定不产生等离子体的点燃。