ESD PROTECTION CIRCUIT WITH INTEGRAL DEEP TRENCH TRIGGER DIODES

    公开(公告)号:US20180247925A1

    公开(公告)日:2018-08-30

    申请号:US15445671

    申请日:2017-02-28

    CPC classification number: H01L27/0255 H01L29/735

    Abstract: Disclosed examples include integrated circuits, fabrication methods and ESD protection circuits to selectively conduct current between a protected node and a reference node during an ESD event, including a protection transistor, a first diode and a resistor formed in a first region of a semiconductor structure, and a second diode formed in a second region isolated from the first region by a polysilicon filled deep trench, where the first and second diodes include cathodes formed by deep N wells alongside the deep trench in the respective first and second regions to use integrated deep trench diode rings to set the ESD protection trigger voltage and prevent a parasitic deep N well/P buried layer junction from breakdown at lower than the rated voltage of the host circuitry.

    AREA-EFFICIENT BI-DIRECTIONAL ESD STRUCTURE

    公开(公告)号:US20210028163A1

    公开(公告)日:2021-01-28

    申请号:US16518304

    申请日:2019-07-22

    Abstract: A semiconductor device has a protected node and a reference node, and a bi-directional ESD structure electrically coupled between the protected node and the reference node. The bi-directional ESD structure includes a main transistor electrically coupled between the protected node and the reference node, an upper control transistor with current nodes electrically coupled between the protected node and a control node of the main transistor, and a lower control transistor with current nodes electrically coupled between the reference node and a control node of the main transistor. The bi-directional ESD structure also includes an upper trigger network configured to provide a transient on-state signal to the upper control transistor from a positive electrical pulse on the protected node. The bi-directional ESD structure further includes a lower trigger network configured to provide a transient on-state signal to the lower control transistor from a negative electrical pulse on the protected node.

    ESD protection circuit with integral deep trench trigger diodes

    公开(公告)号:US10373944B2

    公开(公告)日:2019-08-06

    申请号:US15445671

    申请日:2017-02-28

    Abstract: Disclosed examples include integrated circuits, fabrication methods and ESD protection circuits to selectively conduct current between a protected node and a reference node during an ESD event, including a protection transistor, a first diode and a resistor formed in a first region of a semiconductor structure, and a second diode formed in a second region isolated from the first region by a polysilicon filled deep trench, where the first and second diodes include cathodes formed by deep N wells alongside the deep trench in the respective first and second regions to use integrated deep trench diode rings to set the ESD protection trigger voltage and prevent a parasitic deep N well/P buried layer junction from breakdown at lower than the rated voltage of the host circuitry.

    Area-efficient active-FET ESD protection circuit

    公开(公告)号:US09614368B2

    公开(公告)日:2017-04-04

    申请号:US14618825

    申请日:2015-02-10

    Abstract: An electrostatic discharge (ESD) protection circuit includes a high power supply rail (VDD) and a low power supply rail (VSS). The ESD protection circuit further includes an active shunt transistor coupled between VDD and VSS. The active shunt transistor includes a gate. The ESD protection circuit also includes a sensing transistor connected between an input/output (I/O) pad and the gate of the active shunt transistor. If an ESD stress event occurs on the I/O pad or on a VDD pad, the sensing transistor is caused to be turned ON thereby permitting a voltage on the I/O or VDD pad experiencing the ESD stress event to turn ON the active shunt transistor in turn causing ESD current to flow from the pad experiencing the ESD event, through VDD, and through the active shunt transistor to VSS.

    Area-efficient bi-directional ESD structure

    公开(公告)号:US10998308B2

    公开(公告)日:2021-05-04

    申请号:US16518304

    申请日:2019-07-22

    Abstract: A semiconductor device has a protected node and a reference node, and a bi-directional ESD structure electrically coupled between the protected node and the reference node. The bi-directional ESD structure includes a main transistor electrically coupled between the protected node and the reference node, an upper control transistor with current nodes electrically coupled between the protected node and a control node of the main transistor, and a lower control transistor with current nodes electrically coupled between the reference node and a control node of the main transistor. The bi-directional ESD structure also includes an upper trigger network configured to provide a transient on-state signal to the upper control transistor from a positive electrical pulse on the protected node. The bi-directional ESD structure further includes a lower trigger network configured to provide a transient on-state signal to the lower control transistor from a negative electrical pulse on the protected node.

    ESD robust level shifter
    8.
    发明授权
    ESD robust level shifter 有权
    ESD鲁棒电平转换器

    公开(公告)号:US09154133B2

    公开(公告)日:2015-10-06

    申请号:US13630721

    申请日:2012-09-28

    CPC classification number: H03K19/00384 H01L27/0266 H02H9/046

    Abstract: An inverter type level shifter includes a first power supply voltage and a first ground voltage. A first inverter operates on the first power supply voltage and the first ground voltage to generate a first inverter output. The first inverter includes a first PMOS transistor having a drain coupled to a source of a blocking PMOS transistor and a first NMOS transistor having a drain coupled to a source of a blocking NMOS transistor. The level shifter further includes a second power supply voltage and a second ground voltage, and a second inverter coupled to the first inverter output and operates on the second power supply voltage and the second ground voltage. The blocking PMOS provides the required blocking on the event of the voltage spike in the second power supply voltage w.r.t the first power supply voltage and the blocking NMOS transistor provides the required blocking on the event of the voltage spike in the second ground voltage with respect to the first ground voltage.

    Abstract translation: 逆变器型电平移位器包括第一电源电压和第一接地电压。 第一逆变器对第一电源电压和第一接地电压进行操作以产生第一逆变器输出。 第一反相器包括第一PMOS晶体管,其具有耦合到阻塞PMOS晶体管的源极的漏极和具有耦合到阻塞NMOS晶体管的源极的漏极的第一NMOS晶体管。 电平移位器还包括第二电源电压和第二接地电压,以及第二反相器,耦合到第一反相器输出并对第二电源电压和第二接地电压进行操作。 阻塞PMOS在第一电源电压的第二电源电压中的电压尖峰的事件上提供所需的阻塞,并且阻塞NMOS晶体管相对于第二电源电压在第二接地电压中的电压尖峰的事件上提供所需的阻塞 第一接地电压。

    Integrated power-ground reverse wiring protection circuit

    公开(公告)号:US11133143B2

    公开(公告)日:2021-09-28

    申请号:US16585259

    申请日:2019-09-27

    Abstract: A two-wire current loop system includes a current loop with a transmitter and a host. The system also includes a monolithic integrated circuit included with the transmitter. The monolithic integrated circuit includes: 1) a power supply terminal coupled to the current loop; 2) a loop ground terminal coupled to the current loop and configured to output a current to the current loop; 3) device circuitry with a power supply node and an internal ground node, wherein the power supply node is coupled to the power supply terminal; and 4) a reverse wiring protection circuit coupled between the internal ground node of the device circuitry and the loop ground terminal.

    Electrostatic discharge devices
    10.
    发明授权

    公开(公告)号:US10446537B2

    公开(公告)日:2019-10-15

    申请号:US15835396

    申请日:2017-12-07

    Abstract: In accordance with at least one embodiment, an ESD device comprises: a semiconductor; a pad; a ground rail; a p-well formed in the semiconductor; a first p-type region formed in the p-well and electrically coupled to the ground rail; a first n-type region formed in the p-well and electrically coupled to the pad; a second n-type region formed in the p-well and electrically coupled to the ground rail; an n-well formed in the semiconductor; a first n-type region formed in the n-well; a first p-type region formed in the n-well and electrically coupled to the pad; and a second p-type region formed in the n-well and electrically coupled to the first n-type region formed in the n-well.

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