CELL REGIONS OF INTEGRATED CIRCUITS AND METHODS OF MAKING SAME

    公开(公告)号:US20230063479A1

    公开(公告)日:2023-03-02

    申请号:US17405626

    申请日:2021-08-18

    IPC分类号: G06F30/392 H01L21/04

    摘要: An integrated circuit (IC) includes a first, second and third semiconductor cell regions. The first cell region includes a first active region having a first dopant type. The second semiconductor cell region abuts the first cell region in a second direction, and includes second and third active regions having correspondingly a second dopant type and the first dopant type. The second active region is between the first and third active regions. The third cell region abuts the second cell region in the second direction, and includes a fourth active region having the second dopant type. The third active region is between the fourth active region and the second active region. The second semiconductor cell region has a height 2H, and the first, second and third semiconductor cell regions collectively have a height 3H.

    INTEGRATED CIRCUIT DEVICE, METHOD AND SYSTEM

    公开(公告)号:US20230067734A1

    公开(公告)日:2023-03-02

    申请号:US17462974

    申请日:2021-08-31

    摘要: An integrated circuit (IC) device includes a circuit region, a lower metal layer over the circuit region, and an upper metal layer over the lower metal layer. The lower metal layer includes a plurality of lower conductive patterns elongated along a first axis. The upper metal layer includes a plurality of upper conductive patterns elongated along a second axis transverse to the first axis. The plurality of upper conductive patterns includes at least one input or output configured to electrically couple the circuit region to external circuitry outside the circuit region. The upper metal layer further includes a first lateral upper conductive pattern contiguous with and projecting, along the first axis, from a first upper conductive pattern among the plurality of upper conductive patterns. The first lateral upper conductive pattern is over and electrically coupled to a first lower conductive pattern among the plurality of lower conductive patterns.

    METHOD OF MAKING CELL REGIONS OF INTEGRATED CIRCUITS

    公开(公告)号:US20230409798A1

    公开(公告)日:2023-12-21

    申请号:US18448115

    申请日:2023-08-10

    摘要: A method of manufacturing an integrated circuit (IC) includes forming a first active region in a first cell. The method includes forming a plurality of second active regions in a second cell, wherein the second cell abuts the first cell. The method includes forming a third active region in a third cell, wherein the second cell is between the first cell and the third cell, and a height of the second cell is different from a height of the first cell or the third cell. The method includes forming a plurality of gate structures extending across each of the first active region, the plurality of second active regions, and the third active region. The method includes removing a first portion of a first gate structure at an interface between the first cell and the second cell between the first active region and the plurality of second active regions.