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公开(公告)号：US11940737B2
公开(公告)日：2024-03-26
申请号：US17315087
申请日：2021-05-07
发明人： Hsueh-Yi Chung , Yung-Cheng Chen , Fei-Gwo Tsai , Chi-Hung Liao , Shih-Chi Fu , Wei-Ti Hsu , Jui-Ping Chuang , Tzong-Sheng Chang , Kuei-Shun Chen , Meng-Wei Chen
CPC分类号： G03F7/70433 , G03F1/50 , G03F1/68 , G03F1/70 , G03F1/78 , G03F7/20 , G03F7/70141 , G03F7/70158 , G03F7/70716 , H01L22/30
摘要： A method includes receiving a device design layout and a scribe line design layout surrounding the device design layout. The device design layout and the scribe line design layout are rotated in different directions. An optical proximity correction (OPC) process is performed on the rotated device design layout and the rotated scribe line design layout. A reticle includes the device design layout and the scribe line design layout is formed after performing the OPC process.
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公开(公告)号：US11923187B2
公开(公告)日：2024-03-05
申请号：US18066771
申请日：2022-12-15
发明人： Min-Cheng Wu , Chi-Hung Liao
IPC分类号： H01L21/02 , H01L21/027 , H01L21/324 , H01L21/687
CPC分类号： H01L21/02057 , H01L21/0274 , H01L21/324 , H01L21/68707 , H01L21/68742
摘要： A method includes transferring a wafer to a position over a wafer chuck; lifting a lifting pin through the wafer chuck to a first position to support the wafer; holding the wafer on the lifting pin using a negative pressure source in gaseous communication with an inner gas passage of the lifting pin; introducing a gas to a region between the wafer and the wafer chuck through an outer gas passage of the lifting pin, wherein in a top view of the lifting pin, the inner gas passage has a circular profile, while the outer gas passage has a ring-shape profile; and lowering the lifting to dispose the wafer over the wafer chuck.
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公开(公告)号：US11675264B2
公开(公告)日：2023-06-13
申请号：US17208468
申请日：2021-03-22
发明人： Wei-Chang Cheng , Chi-Hung Liao
摘要： A reticle cleaning system includes a casing, a reticle holder, and a static charge reducing device. The reticle holder is in the casing and configured to hold a reticle. The static charge reducing device is above the reticle holder and includes a fluid generator, an ionizer, and a static charge sensor. The fluid generator is configured to control a humidity condition in the casing. The ionizer is configured to provide ionized air molecules to the reticle. The static charge sensor is configured to detect a static charge value on the reticle, wherein the ionizer is between the fluid generator and the static charge sensor.
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公开(公告)号：US11550233B2
公开(公告)日：2023-01-10
申请号：US16410426
申请日：2019-05-13
发明人： Chi-Hung Liao , Min-Cheng Wu
摘要： A method including steps as follows is provided. A primary droplet and a satellite droplet are shot toward an excitation zone. The satellite droplet is deflected away from the excitation zone. A laser beam is emitted toward the excitation zone to excite the primary droplet to generate an extreme ultraviolet (EUV) light. The EUV light is directed onto a reticle using a first optical reflector, such that the EUV light is imparted with a pattern of the reticle. The EUV light with the pattern is directed onto a wafer using a second optical reflector.
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公开(公告)号：US11448955B2
公开(公告)日：2022-09-20
申请号：US16255654
申请日：2019-01-23
发明人： Chi-Hung Liao , Yueh-Lin Yang
IPC分类号： G03F1/22 , G03F1/24 , G03F1/48 , G03F1/60 , G03F7/20 , H01L21/033 , H01L21/3213 , H01L21/308 , H01L21/683
摘要： A mask includes a substrate, a light-reflecting structure, a patterned layer, and a plurality of bumps. The substrate has a first surface and a second surface. The light-reflecting structure is located on the first surface of the substrate. The patterned layer is located on the light-reflecting structure. The bumps are located on the second surface of the substrate. The bumps define a plurality of voids therebetween and protrude in a direction away from the second surface of the substrate.
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公开(公告)号：US11237483B2
公开(公告)日：2022-02-01
申请号：US16901552
申请日：2020-06-15
发明人： Chi-Hung Liao , Yueh-Lin Yang
IPC分类号： G03F7/20 , H01L21/027 , H05G2/00
摘要： A lithography method in semiconductor fabrication is provided. The method includes generating multiple groups of small drops of a target material through a number of nozzles in such a way that small drops in each of the groups are aggregated to an elongated droplet of the target material. The method also includes generating a laser pulse from a laser generator to convert the elongated droplets to plasma which generates an EUV radiation. The method further includes exposing a semiconductor wafer to the EUV radiation.
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公开(公告)号：US11035619B2
公开(公告)日：2021-06-15
申请号：US15472428
申请日：2017-03-29
发明人： Wei-Chang Cheng , Chi-Hung Liao , Chien-Hung Wang , Guan-Yu Lin , Yung-Yao Lee
摘要： A drainage device includes a tank, a pipe and an air duct. The tank has a base plate and at least one first wall. The first wall is disposed on the base plate. The base plate and the first wall define a space. The pipe defines a channel. The pipe connects with the base plate. The channel communicates with the space. The air duct is disposed partially in the space and partially in the channel. There exists at least one gap between an outer surface of the air duct and an inner surface of the pipe.
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公开(公告)号：US10955741B2
公开(公告)日：2021-03-23
申请号：US16172075
申请日：2018-10-26
发明人： Wei-Chang Cheng , Chi-Hung Liao
摘要： A method for cleaning a reticle includes rotating the reticle, providing a cleaning liquid to clean the reticle, detecting a static charge value on the reticle during rotating the reticle, and reducing static charges on the reticle in response to the detected static charge value. Hence, the electrostatic discharge (ESD) occurred to the reticle can be prevented.
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公开(公告)号：US10775706B2
公开(公告)日：2020-09-15
申请号：US16143715
申请日：2018-09-27
发明人： Chi-Hung Liao , Min-Cheng Wu
IPC分类号： G03F7/20 , G02B27/09 , G02F1/1343
摘要： A method of lithography includes obtaining a profile of a single field of a substrate that having a photoresist layer thereon, in which the profile includes a first feature and a second feature having different heights. A depth of focus distribution map is generated according to the profile. A project lens is tuned based on the generated depth of focus distribution map, such that the project lens provides a first focus length in a first project pixel of the project lens and a second focus length in a second project pixel of the project lens, wherein the first focus length and the second focus lengths. The single field of the substrate is exposed by using the tuned project lens.
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公开(公告)号：US10770327B2
公开(公告)日：2020-09-08
申请号：US15941568
申请日：2018-03-30
发明人： Cheng-Mu Lin , Chi-Hung Liao , Yi-Ming Dai , Yueh Lin Yang
摘要： A scanner includes a light source configured to apply a light to a backside of a wafer. The light is reflected from the backside of the wafer. A first mirror is configured to receive the light from the backside of the wafer and reflect the light. A sensor is configured to receive the light from the first mirror and generate an output signal indicative of a backside topography of the wafer.
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