Ion implanter
    1.
    发明授权
    Ion implanter 失效
    离子注入机

    公开(公告)号:US4634931A

    公开(公告)日:1987-01-06

    申请号:US636996

    申请日:1984-08-02

    CPC分类号: H01J37/3007 H01J37/3171

    摘要: Ions emitted from an ion source are dispersed by a dispersion means, and those ions of a predetermined mass number are extracted from the thus-dispersed ions and are selectively implanted into a sample. A plane of incidence of ions in the mass-dispersing means is so formed that the angle of incidence of ions thereon has a negative value, and a plane of emission of ions therein is so formed that the angle of emission of ions of the predetermined mass number therefrom has a positive value.

    摘要翻译: 从离子源发出的离子通过分散装置分散,从这样分散的离子中提取出预定质量的离子,并选择性地将其注入到样品中。 质量分散装置中的离子入射面被形成为使得其上的离子的入射角具有负值,并且其中的离子的发射面形成为使得预定质量的离子的发射角 其数量为正值。

    Monochromator and scanning electron microscope using the same

    公开(公告)号:US07022983B2

    公开(公告)日:2006-04-04

    申请号:US10751907

    申请日:2004-01-07

    IPC分类号: H01J37/05

    摘要: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

    Monochromator and scanning electron microscope using the same
    4.
    发明授权
    Monochromator and scanning electron microscope using the same 有权
    单色器和扫描电子显微镜使用相同

    公开(公告)号:US07838827B2

    公开(公告)日:2010-11-23

    申请号:US11987018

    申请日:2007-11-26

    IPC分类号: H01J37/05

    摘要: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

    摘要翻译: 本发明提供一种扫描电子显微镜,该扫描电子显微镜由能够高分辨率,单色化能量和降低色差的单色仪组成,而不会显着降低一次电子束的电流强度。 扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场,以聚焦电子束,然后通过狭缝限制能量宽度,并且安装相同形状的另一对扇形磁场和电场 在与包含狭缝的表面形成对称镜的位置处。 该结构用于抵消物点和对称镜位置的能量分散,并通过会聚透镜系统空间收缩点聚光点光束,提高扫描电子显微镜的图像分辨率。

    Electrostatic lens arrangement of multi-stages of multi-pole electrodes
and mass spectrometer using the same
    6.
    发明授权
    Electrostatic lens arrangement of multi-stages of multi-pole electrodes and mass spectrometer using the same 失效
    使用多极电极和质谱仪的多级静电透镜布置

    公开(公告)号:US5291016A

    公开(公告)日:1994-03-01

    申请号:US9006

    申请日:1993-01-26

    申请人: Shunroku Taya

    发明人: Shunroku Taya

    摘要: An electrostatic lens arrangement of three stages of quadrupole electrodes comprising first, second and third stage electrostatic lens unit connected in series, each electrostatic lens unit including first, second, third and fourth electrode arranged around a circle surrounding a center axis of an ion beam passage with an equal interval of 90.degree. C., wherein the respective first, second, third and fourth electrodes for the first, second and third stage electrostatic lens unit are respectively supported by first, second, third and fourth common supporting rod along respective straight lines while electrically insulating each other.

    摘要翻译: 包括串联连接的第一,第二和第三级静电透镜单元的三级四极电极的静电透镜装置,每个静电透镜单元包括围绕离子束通道的中心轴的圆周布置的第一,第二,第三和第四电极 相等间隔为90摄氏度,其中用于第一,第二和第三级静电透镜单元的相应的第一,第二,第三和第三电极分别由第一,第二,第三和第四公共支撑杆沿着相应的直线 同时电绝缘。

    Monochromator and scanning electron microscope using the same
    7.
    发明授权
    Monochromator and scanning electron microscope using the same 有权
    单色器和扫描电子显微镜使用相同

    公开(公告)号:US07315024B2

    公开(公告)日:2008-01-01

    申请号:US11344529

    申请日:2006-02-01

    IPC分类号: G21K7/00 G01N23/00

    摘要: An invention providing a scanning electron microscope composed of a monochromator capable of high resolution, monochromatizing the energy and reducing chromatic aberrations without significantly lowering the electrical current strength of the primary electron beam. A scanning electron microscope is installed with a pair of sectorial magnetic and electrical fields having opposite deflection directions to focus the electron beam and then limit the energy width by means of slits, and another pair of sectorial magnetic and electrical fields of the same shape is installed at a position forming a symmetrical mirror versus the surface containing the slits. This structure acts to cancel out energy dispersion at the object point and symmetrical mirror positions, and by spatially contracting the point-converged spot beam with a converging lens system, improves the image resolution of the scanning electron microscope.

    摘要翻译: 本发明提供一种扫描电子显微镜,该扫描电子显微镜由能够高分辨率,单色化能量和降低色差的单色仪组成,而不会显着降低一次电子束的电流强度。 扫描电子显微镜安装有一对具有相反偏转方向的扇形磁场和电场,以聚焦电子束,然后通过狭缝限制能量宽度,并且安装相同形状的另一对扇形磁场和电场 在与包含狭缝的表面形成对称镜的位置处。 该结构用于抵消物点和对称镜位置的能量分散,并通过会聚透镜系统空间收缩点聚光点光束,提高扫描电子显微镜的图像分辨率。

    Projecting type charged particle microscope and projecting type substrate inspection system
    10.
    发明授权
    Projecting type charged particle microscope and projecting type substrate inspection system 有权
    投影式带电粒子显微镜和突出型基片检查系统

    公开(公告)号:US06310341B1

    公开(公告)日:2001-10-30

    申请号:US09253456

    申请日:1999-02-22

    IPC分类号: H01J4944

    CPC分类号: H01J37/28 H01J37/05

    摘要: An irradiation electron beam emitted from an electron gun is deflected by an energy filter, and passes through a first projective lens and an objective lens, and then irradiated onto a sample to produce secondary electrons. The secondary electron beam accelerated by a negative voltage applied to the sample passes through the objective lens and the first projective lens, and deflected by the energy filter to be energy dispersed. Only the secondary electrons having a specified energy pass through energy selecting aperture, and further pass through a second projective lens to form a projected image of the secondary electrons on an imager. Such an electron-optical system may be used for dimension evaluation or inspection of semiconductor substrates.

    摘要翻译: 从电子枪发射的照射电子束被能量过滤器偏转,并通过第一投射透镜和物镜,然后照射到样品上以产生二次电子。 施加到样品的负电压加速的二次电子束通过物镜和第一投射透镜,并被能量过滤器偏转以进行能量分散。 只有具有指定能量的二次电子通过能量选择孔,并且进一步通过第二投影透镜以在成像器上形成二次电子的投影图像。 这样的电子 - 光学系统可以用于半导体衬底的尺寸评估或检查。