Ion implanter
    1.
    发明授权
    Ion implanter 失效
    离子注入机

    公开(公告)号:US4634931A

    公开(公告)日:1987-01-06

    申请号:US636996

    申请日:1984-08-02

    CPC分类号: H01J37/3007 H01J37/3171

    摘要: Ions emitted from an ion source are dispersed by a dispersion means, and those ions of a predetermined mass number are extracted from the thus-dispersed ions and are selectively implanted into a sample. A plane of incidence of ions in the mass-dispersing means is so formed that the angle of incidence of ions thereon has a negative value, and a plane of emission of ions therein is so formed that the angle of emission of ions of the predetermined mass number therefrom has a positive value.

    摘要翻译: 从离子源发出的离子通过分散装置分散,从这样分散的离子中提取出预定质量的离子,并选择性地将其注入到样品中。 质量分散装置中的离子入射面被形成为使得其上的离子的入射角具有负值,并且其中的离子的发射面形成为使得预定质量的离子的发射角 其数量为正值。