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    Pattern measuring method and electron microscope
    1.
    发明授权
    Pattern measuring method and electron microscope 有权
    图案测量方法和电子显微镜

    公开(公告)号：US07795581B2

    公开(公告)日：2010-09-14

    申请号：US12038116

    申请日：2008-02-27

    Applicant: Shuichi Nakagawa ,  Sho Takami

    Inventor： Shuichi Nakagawa ,  Sho Takami

    IPC: G01N21/00 ,  G01N23/00 ,  G21K7/00

    CPC classification number: H01J37/28 ,  H01J37/1472 ,  H01J37/265 ,  H01J37/3045 ,  H01J2237/22 ,  H01J2237/2816 ,  H01J2237/2817

    Abstract: An object of the present invention is to provide a pattern measuring method and an electron microscope that achieve truly high measurement throughput by achieving both precise location of a measurement target position and high-speed movement of the scanning position of an electron beam to the measurement target position. In order to attain the object described above, according to an aspect of the present invention, there is provided a pattern measuring method and an apparatus that move the scanning position of an electron beam based on coordinate information about a first pattern, which is a target to be measured with the electron beam, move the scanning position of the electron beam to a region comprising a second pattern, the relative distance of which from the first pattern is previously registered, in a case where detection of the first pattern at the point of arrival fails, and move the scanning position of the electron beam based on detection of the second pattern and information about the relative distance.

    Abstract translation: 本发明的目的是提供一种图形测量方法和电子显微镜，其通过实现测量目标位置的精确定位和电子束的扫描位置的高速移动到测量目标而实现真正高的测量吞吐量 位置。 为了实现上述目的，根据本发明的一个方面，提供了一种图案测量方法和装置，其基于关于作为目标的第一图案的坐标信息来移动电子束的扫描位置 要用电子束测量，将电子束的扫描位置移动到包括第一图案的第一图案在第一图案的检测的情况下包括第二图案的区域，该第二图案的距离与第一图案的相对距离被预先登记 到达失败，并且基于第二图案的检测和关于相对距离的信息移动电子束的扫描位置。

    Pattern Measuring Method and Electron Microscope
    2.
    发明申请
    Pattern Measuring Method and Electron Microscope 有权
    图案测量方法和电子显微镜

    公开(公告)号：US20080210865A1

    公开(公告)日：2008-09-04

    申请号：US12038116

    申请日：2008-02-27

    Applicant: Shuichi NAKAGAWA ,  Sho Takami

    Inventor： Shuichi NAKAGAWA ,  Sho Takami

    IPC: G01N23/00

    CPC classification number: H01J37/28 ,  H01J37/1472 ,  H01J37/265 ,  H01J37/3045 ,  H01J2237/22 ,  H01J2237/2816 ,  H01J2237/2817

    Abstract: An object of the present invention is to provide a pattern measuring method and an electron microscope that achieve truly high measurement throughput by achieving both precise location of a measurement target position and high-speed movement of the scanning position of an electron beam to the measurement target position. In order to attain the object described above, according to an aspect of the present invention, there is provided a pattern measuring method and an apparatus that move the scanning position of an electron beam based on coordinate information about a first pattern, which is a target to be measured with the electron beam, move the scanning position of the electron beam to a region comprising a second pattern, the relative distance of which from the first pattern is previously registered, in a case where detection of the first pattern at the point of arrival fails, and move the scanning position of the electron beam based on detection of the second pattern and information about the relative distance.

    Abstract translation: 本发明的目的是提供一种图形测量方法和电子显微镜，其通过实现测量目标位置的精确定位和电子束的扫描位置的高速移动到测量目标而实现真正高的测量吞吐量 位置。 为了实现上述目的，根据本发明的一个方面，提供了一种图案测量方法和装置，其基于关于作为目标的第一图案的坐标信息来移动电子束的扫描位置 要用电子束测量，将电子束的扫描位置移动到包括第一图案的第一图案在第一图案的检测的情况下包括第二图案的区域，该第二图案的距离与第一图案的相对距离被预先登记 到达失败，并且基于第二图案的检测和关于相对距离的信息移动电子束的扫描位置。

    Electron beam apparatus and method for production of its specimen chamber
    4.
    发明授权
    Electron beam apparatus and method for production of its specimen chamber 有权
    电子束装置及其试样室的制造方法

    公开(公告)号：US07435958B2

    公开(公告)日：2008-10-14

    申请号：US11356438

    申请日：2006-02-17

    Applicant: Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

    Inventor： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

    IPC: H01J37/10

    CPC classification number: H01J37/09 ,  H01J37/16 ,  H01J2237/1405 ,  H01J2237/16 ,  H01J2237/2614 ,  H01J2237/2617 ,  H01J2237/28

    Abstract: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

    Abstract translation: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室，其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金，镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

    Electron beam apparatus and method for production of its specimen chamber
    5.
    发明授权
    Electron beam apparatus and method for production of its specimen chamber 有权
    电子束装置及其试样室的制造方法

    公开(公告)号：US07205550B2

    公开(公告)日：2007-04-17

    申请号：US11450382

    申请日：2006-06-12

    Applicant: Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

    Inventor： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

    IPC: H03M1/22

    CPC classification number: H01J37/09 ,  H01J37/16 ,  H01J2237/1405 ,  H01J2237/16 ,  H01J2237/2614 ,  H01J2237/2617 ,  H01J2237/28

    Abstract: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

    Abstract translation: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室，其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金，镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

    Scanning electron microscope
    6.
    发明授权
    Scanning electron microscope 有权

    公开(公告)号：US06444981B1

    公开(公告)日：2002-09-03

    申请号：US09427000

    申请日：1999-10-26

    Applicant: Hideo Todokoro ,  Sho Takami ,  Makoto Ezumi

    Inventor： Hideo Todokoro ,  Sho Takami ,  Makoto Ezumi

    IPC: H01J3728

    CPC classification number: H01J37/28 ,  H01J2237/047

    Abstract: A scanning electron microscope using the retarding method and the boosting method includes a sample holder for holding a sample on the sample holder; a shield electrode arranged between an object lens and the sample, in which an aperture for passing said primary electron beam is formed; a negative-voltage applying circuit for applying a negative voltage to the sample holder and the shield electrode; an acceleration tube located in an electron-beam passing hole in the object lens, provided to pass a primary electron beam, for further accelerating the primary electron beam; and a control electrode located between the acceleration tube and the sample, in which an aperture whose size is smaller than the aperture formed in said shield electrode is provided to pass the primary electron beam, a positive voltage in the positive direction to the negative voltage being applied to the control electrode, superimposed on the negative voltage.

    Electron Beam Apparatus and Method for Production of Its Specimen Chamber
    8.
    发明申请
    Electron Beam Apparatus and Method for Production of Its Specimen Chamber 有权
    电子束装置及其试样室的制造方法

    公开(公告)号：US20080048118A1

    公开(公告)日：2008-02-28

    申请号：US11907375

    申请日：2007-10-11

    Applicant: Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

    Inventor： Tsuyoshi Inanobe ,  Sho Takami ,  Yoichi Ose ,  Katsuhiro Sasada

    IPC: G01N23/00

    CPC classification number: H01J37/09 ,  H01J37/16 ,  H01J2237/1405 ,  H01J2237/16 ,  H01J2237/2614 ,  H01J2237/2617 ,  H01J2237/28

    Abstract: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

    Abstract translation: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室，其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金，镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。

    Charged particle beam apparatus
    10.
    发明申请
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US20090294697A1

    公开(公告)日：2009-12-03

    申请号：US12453986

    申请日：2009-05-28

    Applicant: Souichi Katagiri ,  Takashi Ohshima ,  Sho Takami ,  Makoto Ezumi ,  Takashi Doi ,  Yuji Kasai

    Inventor： Souichi Katagiri ,  Takashi Ohshima ,  Sho Takami ,  Makoto Ezumi ,  Takashi Doi ,  Yuji Kasai

    IPC: A61N5/00 ,  G21F5/02

    CPC classification number: H01J37/18 ,  H01J2237/06341 ,  H01J2237/182 ,  H01J2237/188

    Abstract: The present invention provides a charged particle beam apparatus that keeps the degree of vacuum in the vicinity of the electron source to ultra-high vacuum such as 10−8 to 10−9 Pa even in the state where electron beams are emitted using a non-evaporable getter pump and is not affected by dropout foreign particles.The present invention includes a vacuum vessel in which a charged particle source (electron source, ion source, etc.) is disposed and a non-evaporable getter pump disposed at a position that does not directly face electron beams and includes a structure that makes the non-evaporable getter pump upward with respect to a horizontal direction to drop out foreign particles into a bottom in a groove, so that the foreign particles dropped out from the non-evaporable getter pump do not face an electron optical system. Or, the present invention includes a structure that is covered by a shield means, or a means that is disposed immediately on a surface of the non-evaporable getter pump but at a position where the electron beams are not seen and has a concave structure capable of trapping the dropout foreign particles on a lower portion of the non-evaporable getter pump.

    Abstract translation: 本发明提供了一种带电粒子束装置，其将电子源附近的真空度保持为10-8至10-9Pa的超高真空度，即使在使用非电子束发射电子束的状态下， 可蒸发吸气泵，不受脱落异物的影响。 本发明包括设置有带电粒子源（电子源，离子源等）的真空容器和设置在不直接面向电子束的位置的非蒸发性吸气泵，并且包括使 不可蒸发的吸气剂相对于水平方向向上泵送以将异物排出到槽中的底部，使得从非蒸发性吸气泵排出的异物不面向电子光学系统。 或者，本发明包括被屏蔽装置覆盖的结构，或者立即设置在不可蒸发的吸气泵的表面上，但是在不能看到电子束的位置处并具有凹形结构的装置 在非蒸发性吸气泵的下部捕获脱落的异物。

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