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公开(公告)号：US20180085019A1
公开(公告)日：2018-03-29
申请号：US15689024
申请日：2017-08-29
IPC分类号： A61B5/0408 , C09J183/04 , C09J175/04 , C09J11/04 , C08K3/04 , C09J157/00
摘要： An adhesive composition including a resin and an electro-conductive material, wherein the electro-conductive material is one or more salts selected from sodium salt, potassium salt, and calcium salt having two fluorosulfonic acid structures per molecule and 5 or more carbon atoms shown by formula (1): −O3S—Y—La-A-Lb-Y—SO3− (Mn+)2/n (1), wherein, A represents a divalent hydrocarbon group having 1-30 carbon atoms and optionally substituted by a heteroatom or optionally interposed by a heteroatom; La and Lb each represent a linking group like an ether group, ester group; Y represents an alkylene group having 2-4 carbon atoms, containing 1-6 fluorine atoms, and optionally containing a carbonyl group; Mn+ represents any of Na+, K+, Ca2+. This can form a living body contact layer for a bio-electrode with excellent electric conductivity, biocompatibility, and light weight, which can be manufactured at low cost and without large lowering of electric conductivity even when it is wetted with water or dried.
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公开(公告)号：US20180072930A1
公开(公告)日：2018-03-15
申请号：US15683914
申请日：2017-08-23
IPC分类号： C09J183/04 , H01B1/02 , H01B13/06 , A61B5/00 , A61B5/0408
CPC分类号： C09J183/04 , A61B5/04087 , A61B5/6832 , A61L15/24 , A61L15/26 , A61L15/58 , A61L2400/12 , C08G77/20 , C08G77/26 , C08G77/28 , C09J183/08 , H01B1/023 , H01B1/026 , H01B13/06 , C08L33/08 , C08L83/04 , C08L83/00 , C08K5/42
摘要： An adhesive composition including resin and electro-conductive material, wherein the electro-conductive material is one or more salts from sodium salt, potassium salt, and calcium salt of fluorosulfonic acid having 5 or more carbon atoms shown by the general formula (1): (R1—X—Y—SO3−)nMn+(1), wherein, R1 represents a monovalent hydrocarbon group having 1-30 carbon atoms and optionally substituted by a heteroatom or optionally interposed by a heteroatom; X represents any of a single bond, ether group, ester group, and amide group; Y represents a linear or branched alkylene group having 2-4 carbon atoms, containing 1-6 fluorine atoms, and optionally containing a carbonyl group; Mn+ represents any of a sodium ion, potassium ion, and calcium ion. This can form a living body contact layer for a bio-electrode with electric conductivity, biocompatibility, and light weight, which can be manufactured at low cost and without electric conductivity large lowering even when wetted with water or dried.
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公开(公告)号：US20140199629A1
公开(公告)日：2014-07-17
申请号：US14099678
申请日：2013-12-06
IPC分类号： G03F7/038
CPC分类号： G03F7/0397 , G03F7/0045
摘要： The present invention provides a sulfonium salt used in a resist composition that can give a pattern having a high resolution, especially an excellent rectangularity of a pattern form and a small roughness, while not readily generating a defect, in the photolithography using a high energy beam as a light source; a resist composition that contains the sulfonium salt; and a patterning process using this resist composition, wherein the sulfonium salt is shown by the following general formula (1a), wherein each of R and R0 independently represents a hydrogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 30 carbon atoms which may be optionally substituted by a heteroatom or interposed by a heteroatom.
摘要翻译： 本发明提供了一种抗蚀剂组合物中使用的锍盐，其可以在使用高能量束的光刻法中产生具有高分辨率，特别是图案形式的极好的矩形性和小的粗糙度，同时不容易产生缺陷的图案 作为光源; 含有锍盐的抗蚀剂组合物; 以及使用该抗蚀剂组合物的图案化工序，其中，所述锍盐由以下通式（1a）表示，其中R和R0各自独立地表示氢原子，或者具有1〜 30个碳原子，其可以任选地被杂原子取代或被杂原子插入。
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4.发明申请ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS 有权酸发生器，化学放大电阻组合物和方法公开(公告)号：US20130224657A1
公开(公告)日：2013-08-29
申请号：US13768377
申请日：2013-02-15
CPC分类号： G03F7/0045 , G03F7/004 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/20 , G03F7/2041
摘要： The present invention provides an acid generator generates a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat:To provide a novel acid generator which is suitably used as an acid generator for a resist composition, which solves the problems of LER and a depth of focus and can be effectively and widely used particularly without degradation of a resolution, a chemically amplified resist composition using the same, and a patterning process.
摘要翻译： 本发明提供一种酸反应器，其响应于高能束或热而产生由以下通式（1）表示的磺酸：提供适合用作抗蚀剂组合物的酸发生剂的新型酸产生剂，其中 解决了LER和焦点深度的问题，可以在不降低分辨率的情况下进行有效且广泛的应用，使用其的化学放大抗蚀剂组合物和图案化工艺。
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公开(公告)号：US20210200083A1
公开(公告)日：2021-07-01
申请号：US17198575
申请日：2021-03-11
发明人： Teppei ADACHI , Shinya YAMASHITA , Masaki OHASHI , Tomohiro KOBAYASHI , Kenichi OIKAWA , Takayuki FUJIWARA
IPC分类号： G03F7/004 , G03F7/039 , C07D493/18 , C08F220/18 , G03F7/11 , C07D327/04 , G03F7/038 , C07D307/93 , C07C381/12
摘要： A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.
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公开(公告)号：US20200301274A1
公开(公告)日：2020-09-24
申请号：US16798842
申请日：2020-02-24
摘要： A chemically-amplified negative resist composition includes: (A) a quencher containing an onium salt shown by the following formula (A-1); (B) a base polymer containing repeating units shown by the following formulae (B1) and (B2); and (C) a photo-acid generator which generates an acid. Thus, the present invention provides: a negative resist composition which can form a favorable profile with high sensitivity and low LWR and CDU in a pattern; and a resist patterning process using the composition.
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公开(公告)号：US20210141306A1
公开(公告)日：2021-05-13
申请号：US17082175
申请日：2020-10-28
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , G03F7/11 , C07D307/93 , C07C381/12 , C07D493/18 , C07D327/04 , C08F220/18
摘要： A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group and not containing a repeating unit having an aromatic substituent; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.
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8.发明申请公开(公告)号：US20170058059A1
公开(公告)日：2017-03-02
申请号：US15230684
申请日：2016-08-08
CPC分类号： C08F20/38 , C08F12/20 , C08F12/22 , C08F12/30 , C08F14/18 , C08F18/20 , C08F20/22 , C08F22/24 , C08F28/02 , C08F114/18 , C08F120/22 , C08F120/38 , C08F122/24 , C08F128/02 , C08F212/14 , C08F212/32 , C08F214/18 , C08F220/22 , C08F220/38 , C08F222/24 , C08F228/02 , H01B1/125 , C08F2220/382 , C08F2220/281 , C08F2220/301
摘要： The present invention provides a polymer compound for a conductive polymer comprising one or more repeating units “a” shown by the formula (1), and having a weight-average molecular weight in the range of 1,000 to 500,000. There can be provided a polymer compound for a conductive polymer having a specific superacidic sulfo group which is soluble in an organic solvent, and suitably used for a fuel cell or a dopant for a conductive material. wherein R1 represents a hydrogen atom or a methyl group; R2 represents any of a single bond, an ester group, and a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms, the hydrocarbon group optionally containing an ether group, an ester group, or both; “Z” represents any of a single bond, a phenylene group, a naphthylene group, an ether group, and an ester group; and “a” is a number satisfying 0
摘要翻译： 其中R1表示氢原子或甲基; R2代表具有1至12个碳原子的单键，酯基和直链，支链或环状烃基中的任何一种，所述烃基任选地含有醚基，酯基或二者; “Z”表示单键，亚苯基，亚萘基，醚基和酯基中的任一种。 “a”是满足0
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9.发明申请公开(公告)号：US20170038683A1
公开(公告)日：2017-02-09
申请号：US15195395
申请日：2016-06-28
IPC分类号： G03F7/039 , C08F220/68 , C08F216/16 , C08F216/10 , G03F7/038 , C07D327/08 , G03F7/20 , G03F7/38 , G03F7/32 , C07C309/12 , C07C321/30 , C08F224/00 , G03F7/16
CPC分类号： G03F7/039 , C07C309/12 , C07C2601/14 , C07C2602/42 , C07C2603/74 , C07D327/08 , C08F220/20 , C08F220/38 , C08F2220/1891 , C08F2220/283 , C08F2220/302 , C08F2220/303 , C08F2220/382 , G03F7/0045 , G03F7/0046 , G03F7/038 , G03F7/0397 , G03F7/11 , G03F7/168 , G03F7/2004 , G03F7/2041 , G03F7/322 , G03F7/38
摘要： The present invention provides a compound shown by the formula (1), wherein R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; A represents a single bond or a linear divalent hydrocarbon group having 1 to 30 carbon atoms or a branched or cyclic divalent hydrocarbon group having 3 to 30 carbon atoms, in which the hydrocarbon group may contain a heteroatom, and a part or all of hydrogen atoms in the hydrocarbon group may be substituted with a group containing a heteroatom; “n” represents 0 or 1, provided that “n” is 0 when A is a single bond; and M+ represents a cation. This compound is suitable as a raw material of a polymer compound usable for a base resin of a resist composition that has high resolution and high sensitivity and is excellent in balance of lithography properties such as LWR and CDU.
摘要翻译： 其中R1表示氢原子，氟原子，甲基或三氟甲基; A表示单键或碳原子数为1〜30的直链二价烃基或碳原子数3〜30的支链状或环状的二价烃基，该烃基可含有杂原子，部分或全部为氢原子 在烃基中可以被含有杂原子的基团取代; “n”表示0或1，条件是当A为单键时“n”为0; M +表示阳离子。 该化合物适合作为抗蚀剂组合物的基础树脂的高分子化合物的原料，其具有高分辨率和高灵敏度，并且平版印刷性能如LWR和CDU之间的平衡优异。
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10.发明申请SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, PATTERNING PROCESS, AND SULFONIUM SALT MONOMER AND MAKING METHOD 审中-公开含硫酸钠聚合物，耐腐蚀组合物，花纹过程和硫酸钡单体及其制备方法公开(公告)号：US20140296561A1
公开(公告)日：2014-10-02
申请号：US14306523
申请日：2014-06-17
IPC分类号： C07C309/24 , C07C303/02 , C07C309/23
CPC分类号： C07C309/20 , C07C69/54 , C07C303/32 , C07C309/12 , C07C381/12 , C08F20/38 , C08F220/18 , C08F220/24 , C08F220/38 , C08F228/02 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/2041 , G03F7/38 , Y10S430/106 , Y10S430/111 , Y10S430/122
摘要： A sulfonium salt having a 4-fluorophenyl group is introduced as recurring units into a polymer comprising hydroxyphenyl(meth)acrylate units and acid labile group-containing (meth)acrylate units to form a polymer which is useful as a base resin in a resist composition. The resist composition has a high sensitivity, high resolution and minimized LER.
摘要翻译： 将具有4-氟苯基的锍盐作为重复单元引入到包含羟基苯基（甲基）丙烯酸酯单元和含酸不稳定基团的（甲基）丙烯酸酯单元的聚合物中，以形成可用作抗蚀剂组合物中的基础树脂的聚合物 。 抗蚀剂组合物具有高灵敏度，高分辨率和最小化的LER。
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