发明申请
- 专利标题： ACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS
- 专利标题（中）： 酸发生器，化学放大电阻组合物和方法
-
申请号： US13768377申请日： 2013-02-15
-
公开(公告)号： US20130224657A1公开(公告)日： 2013-08-29
- 发明人: Masaki OHASHI , Tomohiro KOBAYASHI , Masayoshi SAGEHASHI
- 申请人： SHIN-ETSU CHEMICAL CO., LTD.
- 申请人地址： JP Tokyo
- 专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2012-042321 20120228
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/20
摘要：
The present invention provides an acid generator generates a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat:To provide a novel acid generator which is suitably used as an acid generator for a resist composition, which solves the problems of LER and a depth of focus and can be effectively and widely used particularly without degradation of a resolution, a chemically amplified resist composition using the same, and a patterning process.
公开/授权文献
信息查询
IPC分类:
