Chemically amplified positive resist composition
    4.
    发明授权
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号:US07893293B2

    公开(公告)日:2011-02-22

    申请号:US12143268

    申请日:2008-06-20

    摘要: A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc. and L represents an anthryl group etc., and (B) at least one acid generator.

    摘要翻译: 一种化学放大正型抗蚀剂组合物,其包含(A)树脂,其包含(i)由式(I)表示的聚合单元:其中R7表示氢原子等,R8表示C1-C4烷基,p表示整数 为1〜3,q为0〜2的整数,(ii)至少一种选自由式(II)表示的聚合单元的聚合单元:其中,R1表示氢原子等,R2 代表C1-C8烷基,X代表脂环族烃基,和由式(Ⅳ)表示的聚合单元:其中R3表示氢原子等,R4和R5独立地表示氢原子等,R10表示 C 1 -C 6烷基等,和(iii)由式(III)表示的聚合单元:其中R3,R4和R5与上述定义相同,E表示二价烃基,G表示单键等 Z表示羰基等,L r 表示蒽基等,和(B)至少一种酸发生剂。

    CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
    5.
    发明申请
    CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
    化学放大正电阻组合物

    公开(公告)号:US20090004600A1

    公开(公告)日:2009-01-01

    申请号:US12143268

    申请日:2008-06-20

    IPC分类号: G03C1/053

    摘要: A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc. and L represents an anthryl group etc., and (B) at least one acid generator.

    摘要翻译: 一种化学放大正型抗蚀剂组合物,其包含(A)树脂,其包含(i)由式(I)表示的聚合单元:其中R7表示氢原子等,R8表示C1-C4烷基,p表示整数 为1〜3,q为0〜2的整数,(ii)至少一种选自由式(II)表示的聚合单元的聚合单元:其中,R1表示氢原子等,R2 代表C1-C8烷基,X代表脂环族烃基,和由式(Ⅳ)表示的聚合单元:其中R3表示氢原子等,R4和R5独立地表示氢原子等,R10表示 C 1 -C 6烷基等,和(iii)由式(III)表示的聚合单元:其中R3,R4和R5与上述定义相同,E表示二价烃基,G表示单键等 Z表示羰基等,L r 表示蒽基等,和(B)至少一种酸发生剂。

    Chemically amplified positive resist composition
    6.
    发明授权
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号:US07759045B2

    公开(公告)日:2010-07-20

    申请号:US12213800

    申请日:2008-06-24

    IPC分类号: G03F7/004

    摘要: A chemically amplified positive resist composition comprising (A) a salt represented by the formula (I): A+−O3S—R  (I) wherein R represents a 9,10-anthraquinonyl group which may be substituted with at least one group selected from the group consisting of a C1-C4 alkyl group, a C1-C4 alkoxy group and a hydroxyl group, and the C1-C4 alkyl group and the C1-C4 alkoxy group may be substituted, and A+ represents an organic counter cation, and (B) a resin which contains a structural unit which has an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.

    摘要翻译: 一种化学放大正型抗蚀剂组合物,其包含(A)由式(I)表示的盐:A + -O3S-R(I)其中R表示9,10-蒽醌基,其可以被至少一个选自 可以被取代为C1-C4烷基,C1-C4烷氧基和羟基,C1-C4烷基和C1-C4烷氧基组成的组,A +表示有机抗衡阳离子,(B )树脂,其含有具有酸不稳定基团的结构单元,其本身在碱性水溶液中不溶或难溶,但通过酸作用而溶于碱水溶液中。

    Chemically amplified positive resist composition
    7.
    发明申请
    Chemically amplified positive resist composition 有权
    化学放大正光刻胶组合物

    公开(公告)号:US20090004601A1

    公开(公告)日:2009-01-01

    申请号:US12213800

    申请日:2008-06-24

    IPC分类号: G03C1/73 G03C1/56

    摘要: A chemically amplified positive resist composition comprising (A) a salt represented by the formula (I): A+−O3S—R  (I) wherein R represents a 9,10-anthraquinonyl group which may be substituted with at least one group selected from the group consisting of a C1-C4 alkyl group, a C1-C4 alkoxy group and a hydroxyl group, and the C1-C4 alkyl group and the C1-C4 alkoxy group may be substituted, and A+ represents an organic counter cation, and (B) a resin which contains a structural unit which has an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.

    摘要翻译: 一种化学放大阳性抗蚀剂组合物,其包含(A)由式(I)表示的盐:<?in-line-formula description =“In-line Formulas”end =“lead”?> A + -O3S-R(I) <?in-line-formula description =“In-line Formulas”end =“tail”?>其中R表示9,10-蒽醌基,其可被至少一个选自以下的基团取代:C1- C4烷基,C1-C4烷氧基和羟基,C1-C4烷基和C1-C4烷氧基可以被取代,A +表示有机抗衡阳离子,(B)含有 结构单元,其具有酸不稳定基团,其本身在碱性水溶液中不溶或难溶,但通过酸的作用变得可溶于碱水溶液。

    Chemical amplification type positive resist composition
    8.
    发明授权
    Chemical amplification type positive resist composition 有权
    化学放大型正光刻胶组合物

    公开(公告)号:US06893794B2

    公开(公告)日:2005-05-17

    申请号:US10622692

    申请日:2003-07-21

    摘要: A chemical amplification type positive resist composition comprising: (A) a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and which contains a structural unit derived from p-hydroxystyrene and a structural unit represented by the formula (Ia) or (Ib) wherein R1 and R2 each independently represents hydrogen or methyl, and R3 to R5 each independently represents alkyl having 1 to 8 carbon atoms; and (B) radiation-sensitive acid generator comprising sulfonic acid ester of N-hydroxyimide compound; and onium salt is provided.

    摘要翻译: 一种化学放大型正性抗蚀剂组合物,其包含:(A)本身在碱性水溶液中不溶或难溶于但在酸性溶液中溶于碱性水溶液的树脂,其含有衍生自p的结构单元 - 羟基苯乙烯和由式(Ia)或(Ib)表示的结构单元,其中R 1和R 2各自独立地表示氢或甲基,R 3 R 5各自独立地表示具有1至8个碳原子的烷基; 和(B)包含N-羟基酰亚胺化合物的磺酸酯的辐射敏感酸产生剂; 并提供鎓盐。

    Pigment compositions
    10.
    发明授权
    Pigment compositions 失效
    颜料组成

    公开(公告)号:US5556456A

    公开(公告)日:1996-09-17

    申请号:US363882

    申请日:1994-12-27

    CPC分类号: C09B67/0034 C09B19/02

    摘要: A pigment composition which comprises an organic pigment and a dioxazine pigment derivative represented by the following formula (I); ##STR1## wherein R.sub.1 and R.sub.2 each independently represents a substituted or unsubstituted and saturated or unsaturated aliphatic hydrocarbon group or aromatic hydrocarbon group, or R.sub.1 and R.sub.2 form a heterocyclic ring; L is an integer of 1-6; m is 0.5-3; and n is 0.5-3.5 provided that total of m and n is 1-5 or a salt thereof; andthe pigment composition can be used with excellent pigment characteristics for various uses, and particularly, when they are used for paints or printing inks in the form of non-aqueous dispersion system, the dispersion system has lower dispersion viscosity and exhibits good flowability and there occurs no color segregation in the dispersion system and it has high coloring power and gives good prints or coats having good gloss and high transparency.

    摘要翻译: 一种颜料组合物,其包含由下式(I)表示的有机颜料和二恶嗪颜料衍生物; (I)其中R 1和R 2各自独立地表示取代或未取代的饱和或不饱和的脂族烃基或芳族烃基,或者R 1和R 2形成杂环; L为1-6的整数; m为0.5-3; 并且n为0.5-3.5,条件是m和n的总和为1-5或其盐; 并且颜料组合物可以用于各种用途的优异的颜料特性,特别是当以非水分散体系形式用于油漆或印刷油墨时,分散体系具有较低的分散粘度和显示出良好的流动性,并且在那里 在分散系统中没有发生颜色偏析,并且具有高着色力,并且具有良好的光泽度和高透明度的良好的印刷品或涂层。