发明申请
- 专利标题: Chemically amplified positive resist composition
- 专利标题(中): 化学放大正光刻胶组合物
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申请号: US12213800申请日: 2008-06-24
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公开(公告)号: US20090004601A1公开(公告)日: 2009-01-01
- 发明人: Makoto Akita , Isao Yoshida , Yukako Harada
- 申请人: Makoto Akita , Isao Yoshida , Yukako Harada
- 申请人地址: JP Tokyo
- 专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人: SUMITOMO CHEMICAL COMPANY, LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP2007-168689 20070627
- 主分类号: G03C1/73
- IPC分类号: G03C1/73 ; G03C1/56
摘要:
A chemically amplified positive resist composition comprising (A) a salt represented by the formula (I): A+−O3S—R (I) wherein R represents a 9,10-anthraquinonyl group which may be substituted with at least one group selected from the group consisting of a C1-C4 alkyl group, a C1-C4 alkoxy group and a hydroxyl group, and the C1-C4 alkyl group and the C1-C4 alkoxy group may be substituted, and A+ represents an organic counter cation, and (B) a resin which contains a structural unit which has an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.
公开/授权文献
- US07759045B2 Chemically amplified positive resist composition 公开/授权日:2010-07-20
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