公开(公告)号：US10453796B2

公开(公告)日：2019-10-22

申请号：US15706655

申请日：2017-09-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jungwoo Song ,  Ye-Ro Lee ,  Kwangtae Hwang ,  Kwangmin Kim ,  Yong Kwan Kim ,  Jiyoung Kim

IPC: H01L27/108 ,  H01L21/768 ,  H01L23/532 ,  H01L27/02 ,  H01L23/522

Abstract: A semiconductor device including a substrate includes an active region. A bit line structure extends across the active region. A landing pad is disposed on an end portion of the active region. A first spacer is disposed between the bit line structure and the landing pad. A second spacer is disposed between the first spacer and the landing pad. An air spacer is disposed between the first spacer and the second spacer. A capping pattern is disposed between a sidewall of the landing pad and a sidewall of the bit line structure. The capping pattern defines a top surface of the air spacer and comprises a metallic material.

公开(公告)号：US11837545B2

公开(公告)日：2023-12-05

申请号：US17399043

申请日：2021-08-10

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jungwoo Song ,  Ye-Ro Lee ,  Kwangtae Hwang ,  Kwangmin Kim ,  Yong Kwan Kim ,  Jiyoung Kim

IPC: H10B12/00 ,  H01L23/532 ,  H01L27/02 ,  H01L21/768 ,  H01L23/522

CPC classification number: H01L23/5329 ,  H01L21/768 ,  H01L27/0207 ,  H10B12/033 ,  H10B12/053 ,  H10B12/315 ,  H10B12/34 ,  H10B12/482 ,  H10B12/485 ,  H01L21/7682 ,  H01L21/76897 ,  H01L23/5222

Abstract: A semiconductor device including a substrate includes an active region. A bit line structure extends across the active region. A landing pad is disposed on an end portion of the active region. A first spacer is disposed between the bit line structure and the landing pad. A second spacer is disposed between the first spacer and the landing pad. An air spacer is disposed between the first spacer and the second spacer. A capping pattern is disposed between a sidewall of the landing pad and a sidewall of the bit line structure. The capping pattern defines a top surface of the air spacer and comprises a metallic material.