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    Spectral Ellipsometry Measurement and Data Analysis Device and Related Systems and Methods
    3.
    发明申请
    Spectral Ellipsometry Measurement and Data Analysis Device and Related Systems and Methods 有权
    光谱椭偏仪测量和数据分析设备及相关系统和方法

    公开(公告)号：US20160025618A1

    公开(公告)日：2016-01-28

    申请号：US14806775

    申请日：2015-07-23

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Sung-Yoon Ryu ,  Woo-Seok KO ,  Yu-Sin YANG ,  Sang-Kil LEE ,  Chung-Sam JUN

    IPC: G01N21/21 ,  G01N21/95

    CPC classification number: G01N21/211 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/213

    Abstract: Spectral ellipsometry measurement systems are provided including a polarizer that rotates at a first angle and adjusts a polarizing direction of incident light of a measurement sample; a compensator that rotates at a second angle, different from the first angle, and adjusts a phase difference of the incident light; an analyzer that rotates at a third angle and adjusts a polarizing direction of light reflected on the measurement sample; a detector that detects a spectral image from the reflected light; a controller that controls one of the polarizer, the compensator, and the analyzer according to polarizer-compensator-analyzer (PCA) angle sets including the first to third angles; and a processor that receives, from the detector, a first spectral image corresponding to a first PCA angle set and a first wavelength and a second spectral image corresponding to a second PCA angle set and a second wavelength, different from the first wavelength, and generates a polarizer-compensator-analyzer rotating (PCAR) spectral matrix using the first and second spectral images.

    Abstract translation: 提供了光谱椭圆测量系统，其包括以第一角度旋转并调节测量样品的入射光的偏振方向的偏振器; 补偿器，其以与第一角度不同的第二角度旋转，并调节入射光的相位差; 分析器，其以第三角度旋转并调节在测量样品上反射的光的偏振方向; 从反射光检测光谱图像的检测器; 根据包括第一至第三角度的偏振器 - 补偿器分析器（PCA）角度集合控制偏振器，补偿器和分析器之一的控制器; 以及处理器，其从所述检测器接收对应于与所述第一波长不同的第一PCA角度集合和对应于第二PCA角度集合和第二波长的第一波长和第二光谱图像的第一光谱图像，并且生成 使用第一和第二光谱图像的偏振器 - 补偿器分析器旋转（PCAR）光谱矩阵。

    Spectral ellipsometry measurement and data analysis device and related systems and methods
    5.
    发明授权
    Spectral ellipsometry measurement and data analysis device and related systems and methods 有权

    公开(公告)号：US09733178B2

    公开(公告)日：2017-08-15

    申请号：US14806775

    申请日：2015-07-23

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Sung-Yoon Ryu ,  Woo-Seok Ko ,  Yu-Sin Yang ,  Sang-Kil Lee ,  Chung-Sam Jun

    IPC: G01N21/21 ,  G01N21/95 ,  G01N21/956

    CPC classification number: G01N21/211 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/213

    Abstract: Spectral ellipsometry measurement systems are provided including a polarizer that rotates at a first angle and adjusts a polarizing direction of incident light of a measurement sample; a compensator that rotates at a second angle, different from the first angle, and adjusts a phase difference of the incident light; an analyzer that rotates at a third angle and adjusts a polarizing direction of light reflected on the measurement sample; a detector that detects a spectral image from the reflected light; a controller that controls one of the polarizer, the compensator, and the analyzer according to polarizer-compensator-analyzer (PCA) angle sets including the first to third angles; and a processor that receives, from the detector, a first spectral image corresponding to a first PCA angle set and a first wavelength and a second spectral image corresponding to a second PCA angle set and a second wavelength, different from the first wavelength, and generates a polarizer-compensator-analyzer rotating (PCAR) spectral matrix using the first and second spectral images.

    Apparatus for measuring thickness of thin film, system including the apparatus, and method for measuring thickness of thin film
    6.
    发明授权
    Apparatus for measuring thickness of thin film, system including the apparatus, and method for measuring thickness of thin film 有权
    用于测量薄膜厚度的装置，包括该装置的系统以及用于测量薄膜厚度的方法

    公开(公告)号：US09417055B2

    公开(公告)日：2016-08-16

    申请号：US14799107

    申请日：2015-07-14

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Sung-Yoon Ryu ,  Sang-Kil Lee ,  Chung-Sam Jun ,  Woo-Seok Ko ,  Ho-Jeong Kwak ,  Souk Kim ,  Kwan-Woo Ryu ,  Yu-Sin Yang

    IPC: G01B11/28 ,  G01B11/06

    CPC classification number: G01B11/0633

    Abstract: An apparatus and a system for measuring the thickness of a thin film are provided. The apparatus includes a signal detector, a Fast Fourier Transform (FFT) generator, an Inverse Fast Fourier Transform (IFFT) generator, and a thickness analyzer. The signal detector detects an electric field signal with respect to a reflected light that is reflected from a thin film. The FFT generator performs FFT with respect to the electric field signal to separate a DC component from an AC component of the electric field signal. The IFFT generator receives the separated AC component of the electric field signal, performs IFFT with respect to the AC component, and extracts a phase value of the AC component. The thickness analyzer measures the thickness of the thin film using the extracted phase value.

    Abstract translation: 提供了用于测量薄膜厚度的装置和系统。 该装置包括信号检测器，快速傅里叶变换（FFT）发生器，快速傅里叶逆变换（IFFT）发生器和厚度分析器。 信号检测器检测相对于从薄膜反射的反射光的电场信号。 FFT发生器相对于电场信号执行FFT，以将DC分量与电场信号的AC分量分离。 IFFT发生器接收电场信号的分离的AC分量，相对于AC分量执行IFFT，并提取AC分量的相位值。 厚度分析器使用提取的相位值来测量薄膜的厚度。

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