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公开(公告)号:US11050683B2
公开(公告)日:2021-06-29
申请号:US15953179
申请日:2018-04-13
Applicant: Samsung Electronics Co., Ltd
Inventor: Hyong Jin Ban , Yong Suk Kwon , Tae Sun Yeoum , Myeong Cheol Kim , Sung Jin Kim , Yoon Sung Nam , Pei Huang , Qia Wang , Zhinan Zhou
Abstract: An electronic device is provided. The electronic device includes a housing, a display configured to be exposed through one surface of the housing, a communication module configured to communicate over a first network compliant with a first protocol or a second network compliant with a second protocol, a processor configured to be electrically connected with the display and the communication module, and a memory configured to be electrically connected with the processor and store a specified application. The memory stores instructions, that when executed, cause the processor 420 to execute the specified application, designate a CP server by interacting with a platform server over the second network, receive an initial response message generated by the designated CP server over the first network, and verify a first identifier of the designated CP server based on the first protocol from a source of the initial response message.
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公开(公告)号:US09741854B2
公开(公告)日:2017-08-22
申请号:US14959457
申请日:2015-12-04
Applicant: Samsung Electronics Co., Ltd.
Inventor: Keun Hee Bai , Kyoung Hwan Yeo , Seung Seok Ha , Seung Ju Park , Do Hyoung Kim , Myeong Cheol Kim , Jae Hyoung Koo , Ki Byung Park
IPC: H01L21/336 , H01L29/78 , H01L29/66 , H01L29/165
CPC classification number: H01L29/7848 , H01L29/165 , H01L29/66545 , H01L29/66818 , H01L29/7851
Abstract: There is provided a method for manufacturing a semiconductor device including a substrate including a plurality of active regions, a plurality of gate electrodes extending in a first direction to intersect a portion of the plurality of active regions, and including first and second gate electrodes disposed to be adjacent to each other in the first direction, a gate isolation portion disposed between the first and second gate electrodes. The gate isolation portion includes a first layer and second layers disposed on both ends of the first layer in a second direction perpendicular to the first direction.
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