公开(公告)号：US10150132B2

公开(公告)日：2018-12-11

申请号：US15041967

申请日：2016-02-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Nobuo Hamamoto ,  Miyazaki Hiroshi

IPC: B05B12/20 ,  B05B5/025 ,  B05B5/08 ,  B05B5/053 ,  B05C21/00 ,  H01L51/56 ,  B05D1/32 ,  C23C14/04 ,  H01L51/00

Abstract: A thin film fabricating apparatus includes an electrode part which sprays a thin film material as electrified spray particles, a substrate holder disposed facing the electrode part and holding a substrate to be provided with a thin film, and a mask disposed between the electrode part and the substrate holder and provided with a plurality of pattern grooves, where the mask and the substrate are applied with a mask voltage (Vm) and a substrate voltage (V0), respectively, the mask voltage (Vm) is a variable voltage, and the mask voltage (Vm) has the same polarity as the polarity of spray particles.

公开(公告)号：US09780303B2

公开(公告)日：2017-10-03

申请号：US14719066

申请日：2015-05-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hamamoto Nobuo ,  Miyazaki Hiroshi

IPC: B05B5/08 ,  B05B5/025 ,  H01L51/00 ,  B05B5/035 ,  B05B5/057 ,  B05C5/00 ,  B05C9/00 ,  B05C13/00 ,  B05B13/02

CPC classification number: H01L51/0003 ,  B05B5/0255 ,  B05B5/035 ,  B05B5/057 ,  B05B13/0264 ,  B05C5/00 ,  B05C9/00 ,  B05C13/00 ,  H01L51/0006

Abstract: Embodiments of the invention are directed to a thin film fabricating apparatus which may be employed in mass production and may stably provide a uniform nano-order layer. An exemplary embodiment of a thin film fabricating apparatus includes: an electrode bath which contains a thin film-forming material; a plurality of needle electrodes disposed in the electrode bath; a plurality of ring electrodes disposed on the electrode bath at positions corresponding to the needle electrodes; and a substrate stand disposed opposite to the needle electrodes and the ring electrodes, where the substrate stand holds the substrate, on which a thin film is to be formed.