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公开(公告)号:US20230194987A1
公开(公告)日:2023-06-22
申请号:US18084718
申请日:2022-12-20
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hyunji SONG , Sumin KIM , Hyunwoo KIM , Juhyeon PARK
IPC: G03F7/039
CPC classification number: G03F7/0392
Abstract: A photoresist polymer and a photoresist composition, the photoresist polymer including a first repeating unit represented by Chemical Formula 1:
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公开(公告)号:US20210223692A1
公开(公告)日:2021-07-22
申请号:US16994957
申请日:2020-08-17
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hyunji SONG , Sukkoo HONG , Sumin KIM , Yechan KIM , Juyoung KIM , Jinjoo KIM , Hyunwoo KIM , Juhyeon PARK , Songse YI
IPC: G03F7/004 , G03F7/039 , C07D277/26 , C07D263/32 , C07D233/64 , C07D213/68
Abstract: A photo-decomposable compound, a photoresist composition, and a method of manufacturing an IC device, the compound generating acid upon exposure and acts as a quenching base that neutralizes acid in an unexposed state and being represented by Formula 1: wherein, in Formula 1, Ra is a C5 to C40 substituted or unsubstituted cyclic hydrocarbon group including at least one nitrogen atom, Ya is a C1 to C20 divalent linear or cyclic hydrocarbon group, n is an integer of 1 to 5, and A+ is a counter ion.
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公开(公告)号:US20230005948A1
公开(公告)日:2023-01-05
申请号:US17940441
申请日:2022-09-08
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yong-Hoon SON , Jae Hoon KIM , Kwang-ho PARK , Hyunji SONG , Gyeonghee LEE , Seungjae JUNG
IPC: H01L27/11573 , H01L27/1157 , H01L23/528 , H01L27/11565 , H01L23/522 , H01L27/11582
Abstract: A semiconductor memory device is disclosed. The device includes a peripheral circuit structure on a substrate, a semiconductor layer on the peripheral circuit structure, an electrode structure on the semiconductor layer, the electrode structure including electrodes stacked on the semiconductor layer, a vertical channel structure penetrating the electrode structure and being connected to the semiconductor layer, a separation structure penetrating the electrode structure, extending in a first direction, and horizontally dividing the electrode of the electrode structure into a pair of electrodes, an interlayered insulating layer covering the electrode structure, and a through contact penetrating the interlayered insulating layer and being electrically connected to the peripheral circuit structure.
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公开(公告)号:US20210239983A1
公开(公告)日:2021-08-05
申请号:US17059374
申请日:2019-03-22
Applicant: Samsung Electronics Co., Ltd.
Inventor: Hyunji SONG , Wootaek SONG , Taekyung LEE
IPC: G02B27/01 , G06F3/0346
Abstract: An electronic device according to various embodiments of the present disclosure includes one or more cameras having a designated field of view, a display, a communication circuitry and a processor wherein the procesor is configured to identify an external electronic device among one or more external objects included in the designated field of view using the camera, display a graphic object corresponding to the external electronic device on the display based on first location information of the external electronic device identified based at least on the image information obtained using the camera, and when the external electronic device is out of the designated field of view, display the graphic object on the display based on second location information of the external electronic device identified using the camera before the external electronic device is out of the designated field of view and information related to the movement of the external electronic device received from the external electronic via the communication circuitry after the external electronic device is out of the designated field of view.
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公开(公告)号:US20210255544A1
公开(公告)日:2021-08-19
申请号:US17003414
申请日:2020-08-26
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Yechan KIM , Suk Koo HONG , Su Min KIM , Ju-Young KIM , Jinjoo KIM , Hyunwoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI
Abstract: A resist composition including a polymer; a photoacid generator; and a material represented by Formula 1:
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公开(公告)号:US20210125991A1
公开(公告)日:2021-04-29
申请号:US16923572
申请日:2020-07-08
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jae Hoon KIM , Kwang-Ho PARK , Yong-Hoon SON , Hyunji SONG , Gyeonghee LEE , Seungjae JUNG
IPC: H01L27/108 , G11C11/4097
Abstract: A semiconductor memory device may include a bit line extending in a first direction, a first conductive pattern extending in a second direction intersecting the first direction, a semiconductor pattern connecting the bit line and the first conductive pattern, a second conductive pattern including an insertion portion in the first conductive pattern, and a dielectric layer between the first conductive pattern and the second conductive pattern. The insertion portion of the second conductive pattern may have a width which increases as a distance from the semiconductor pattern increases.
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公开(公告)号:US20210082941A1
公开(公告)日:2021-03-18
申请号:US16857507
申请日:2020-04-24
Applicant: Samsung Electronics Co., Ltd.
Inventor: Yong-Hoon SON , Jae Hoon KIM , Kwang-ho PARK , Hyunji SONG , Gyeonghee LEE , Seungjae JUNG
IPC: H01L27/11573 , H01L27/1157 , H01L27/11582 , H01L27/11565 , H01L23/522 , H01L23/528
Abstract: A semiconductor memory device is disclosed. The device includes a peripheral circuit structure on a substrate, a semiconductor layer on the peripheral circuit structure, an electrode structure on the semiconductor layer, the electrode structure including electrodes stacked on the semiconductor layer, a vertical channel structure penetrating the electrode structure and being connected to the semiconductor layer, a separation structure penetrating the electrode structure, extending in a first direction, and horizontally dividing the electrode of the electrode structure into a pair of electrodes, an interlayered insulating layer covering the electrode structure, and a through contact penetrating the interlayered insulating layer and being electrically connected to the peripheral circuit structure.
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公开(公告)号:US20230120542A1
公开(公告)日:2023-04-20
申请号:US18080348
申请日:2022-12-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sumin KIM , Hyunwoo KIM , Sukkoo HONG , Yechan KIM , Juyoung KIM , Jinjoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI
IPC: G03F7/004 , C07C381/12 , G03F7/039 , C07C309/12
Abstract: A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern.
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公开(公告)号:US20220359530A1
公开(公告)日:2022-11-10
申请号:US17874512
申请日:2022-07-27
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hyunji SONG , Jaehoon KIM , Kwangho PARK , Yonghoon SON , Gyeonghee LEE , Seungjae JUNG
IPC: H01L27/108
Abstract: An integrated circuit device includes a plurality of semiconductor layers stacked on a substrate to overlap each other in a vertical direction and longitudinally extending along a first horizontal direction. The plurality of semiconductor layers may have different thicknesses in the vertical direction.
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公开(公告)号:US20210240078A1
公开(公告)日:2021-08-05
申请号:US17005636
申请日:2020-08-28
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Sumin KIM , Hyunwoo KIM , Sukkoo HONG , Yechan KIM , Juyoung KIM , Jinjoo KIM , Juhyeon PARK , Hyunji SONG , Songse YI
IPC: G03F7/004 , C07C381/12 , C07C309/12 , G03F7/039
Abstract: A photo-decomposable compound includes an anion component including an adamantyl group and a cation component including a C5 to C40 cyclic hydrocarbon group and forming a complex with the anion component. At least one of the adamantyl group and the cyclic hydrocarbon group has a substituent, which decomposes by acid and generates an alkali soluble group. The substituent includes an acid-labile protecting group. A photoresist composition includes a chemically amplified polymer, the photo-decomposable compound, and a solvent. To manufacture an integrated circuit (IC) device, a photoresist film is formed using the photoresist composition on a feature layer, a first area of the photoresist film is exposed to generate a plurality of acids from the photo-decomposable compound in the first area, the chemically amplified polymer is deprotected due to the plurality of acids, and the first area is removed to form a photoresist pattern.
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