知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

10 records (took 0.016 seconds)

    Digital holography microscope (DHM), and inspection method and semiconductor manufacturing method using the DHM
    1.
    发明授权
    Digital holography microscope (DHM), and inspection method and semiconductor manufacturing method using the DHM 有权

    公开(公告)号：US11314205B2

    公开(公告)日：2022-04-26

    申请号：US16225638

    申请日：2018-12-19

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Myungjun Lee ,  Wookrae Kim ,  Gwangsik Park ,  Changhoon Choi

    IPC: G03H1/04 ,  G02B21/36 ,  G03H1/00

    Abstract: A low-cost digital holography microscope (DHM) that is capable of performing inspection at high speed while accurately inspecting an inspection object at high resolution, an inspection method using the DHM, and a method of manufacturing a semiconductor device by using the DHM are provided. The DHM includes: a light source configured to generate and output light; a beam splitter configured to cause the light to be incident on an inspection object and output reflected light from the inspection object; and a detector configured to detect the reflected light, wherein, when the reflected light includes interference light, the detector generates a hologram of the interference light, and wherein no lens is present in a path from the light source to the detector.

    WAFER INSPECTION APPARATUS
    3.
    发明申请
    WAFER INSPECTION APPARATUS 有权

    公开(公告)号：US20210082725A1

    公开(公告)日：2021-03-18

    申请号：US16849631

    申请日：2020-04-15

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Jaehwang JUNG ,  Gwangsik Park ,  Wookrae Kim ,  Juntaek Oh

    IPC: H01L21/67 ,  G02B27/28 ,  G02B27/42 ,  G02B27/30 ,  G01N21/25 ,  G01N21/27 ,  G01N21/21 ,  G01N21/88 ,  G01N21/95 ,  G02B27/10 ,  G06T7/00

    Abstract: Provided is a wafer inspection apparatus including a monochromator that extracts monochromatic light, a collimator that outputs the monochromatic light as parallel light, a first polarization assembly that polarizes the parallel light and radiates the polarized light to a wafer, an imaging optical system that condenses light reflected from the wafer, a spectroscope that splits the condensed light into a plurality of spectrums, a first lens that condenses the plurality of spectrums, a second polarization assembly that outputs the plurality of spectrums as a plurality of polarized lights having different diffraction orders and a difference of 90°, a second lens that condenses the plurality of polarized lights, a third polarization assembly that outputs common polarized light based on the plurality of polarized interfering with each other, a camera that generates a phase difference image based on the common polarized light, and a signal processor that analyzes the phase difference image.

    Digital Holography Microscope (DHM), and Inspection Method and Semiconductor Manufacturing Method Using the DHM
    7.
    发明申请
    Digital Holography Microscope (DHM), and Inspection Method and Semiconductor Manufacturing Method Using the DHM 有权

    公开(公告)号：US20220276607A1

    公开(公告)日：2022-09-01

    申请号：US17716257

    申请日：2022-04-08

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Myungjun Lee ,  Wookrae Kim ,  Gwangsik Park ,  Changhoon Choi

    IPC: G03H1/04 ,  G02B21/36

    Abstract: A low-cost digital holography microscope (DHM) that is capable of performing inspection at high speed while accurately inspecting an inspection object at high resolution, an inspection method using the DHM, and a method of manufacturing a semiconductor device by using the DHM are provided. The DHM includes: a light source configured to generate and output light; a beam splitter configured to cause the light to be incident on an inspection object and output reflected light from the inspection object; and a detector configured to detect the reflected light, wherein, when the reflected light includes interference light, the detector generates a hologram of the interference light, and wherein no lens is present in a path from the light source to the detector.

    Wafer inspection apparatus
    9.
    发明授权
    Wafer inspection apparatus 有权

    公开(公告)号：US11264256B2

    公开(公告)日：2022-03-01

    申请号：US16849631

    申请日：2020-04-15

    Applicant: SAMSUNG ELECTRONICS CO., LTD.

    Inventor： Jaehwang Jung ,  Gwangsik Park ,  Wookrae Kim ,  Juntaek Oh

    IPC: G01N21/21 ,  H01L21/67 ,  G02B27/28 ,  G02B27/42 ,  G02B27/30 ,  G01N21/25 ,  G01N21/27 ,  G01N21/88 ,  G01N21/95 ,  G02B27/10 ,  G06T7/00 ,  G01N21/17

    Abstract: Provided is a wafer inspection apparatus including a monochromator that extracts monochromatic light, a collimator that outputs the monochromatic light as parallel light, a first polarization assembly that polarizes the parallel light and radiates the polarized light to a wafer, an imaging optical system that condenses light reflected from the wafer, a spectroscope that splits the condensed light into a plurality of spectrums, a first lens that condenses the plurality of spectrums, a second polarization assembly that outputs the plurality of spectrums as a plurality of polarized lights having different diffraction orders and a difference of 90°, a second lens that condenses the plurality of polarized lights, a third polarization assembly that outputs common polarized light based on the plurality of polarized interfering with each other, a camera that generates a phase difference image based on the common polarized light, and a signal processor that analyzes the phase difference image.

Patent Agency Ranking