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Patent Agency Ranking
公开(公告)号：US12122702B2
公开(公告)日：2024-10-22
申请号：US18094820
申请日：2023-01-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jongha Yun , Seyoon Kim , Juhui Park , Jiyeon Lee , Cheolmin Shin
IPC: C02F9/00 , B01D15/36 , B01D61/02 , B01D61/08 , B01D61/14 , B01D63/02 , B08B3/02 , B08B3/14 , B08B13/00 , C02F1/28 , C02F1/42 , C02F1/44 , H01L21/67 , C02F103/04 , C02F103/34
CPC classification number: C02F9/00 , B01D15/361 , B01D61/02 , B01D61/025 , B01D61/026 , B01D61/08 , B01D61/14 , B01D63/02 , B08B3/022 , B08B3/14 , B08B13/00 , C02F1/283 , C02F1/42 , C02F1/441 , C02F1/444 , H01L21/67017 , B01D2313/083 , B01D2313/18 , B01D2313/60 , C02F2103/04 , C02F2103/346 , C02F2201/005 , C02F2209/03 , C02F2209/05 , C02F2209/40 , C02F2301/043 , C02F2301/046 , H01L21/67063 , H01L21/67092
Abstract: Ultrapure water supply apparatuses, substrate processing systems, and substrate processing methods are provided. An ultrapure water supply apparatus includes: a first supply device that produces first ultrapure water; a second supply device that produces second ultrapure water; a first reserved supply device that provides the second supply device with a portion of fluid in the first supply device; and a second reserved supply device that provides the first supply device with a portion of fluid in the second supply device. The first supply device includes a first front-side filtering part, a first rear-side filtering part, and a first connection part. The second supply device includes a second front-side filtering part, a second rear-side filtering part, and a second connection part. Each of the first and second reserved supply devices connects the first connection part and the second connection part to each other.
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公开(公告)号：US20230264981A1
公开(公告)日：2023-08-24
申请号：US18083124
申请日：2022-12-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Younhaeng LEE , Cheolmin Shin , Changyeol Ham , Jieun Jang
CPC classification number: C02F1/285 , C02F1/42 , C02F1/46104 , C02F1/72 , C02F1/32 , C02F1/58 , C02F2101/108
Abstract: A management method of a system for producing an ultrapure water, the system including a boron removal tower including an accommodation space through which water to be processed passes and a boron adsorption resin filling the accommodation space of the boron removal tower, and the boron removal tower including a plurality of sample ports through which a plurality of sample waters to be processed passing through portions having different heights of the boron adsorption resin, are respectively discharged, and determining a replacement cycle of the boron adsorption resin by increasing a passing flow rate of the boron removal tower.
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3.发明公开公开(公告)号：US20230398499A1
公开(公告)日：2023-12-14
申请号：US18139828
申请日：2023-04-26
Applicant: Samsung Electronics Co., Ltd.
Inventor： Wuyoung Choi , Cheolmin Shin , Seungyong Yang , Younhaeng Lee , Changyeol Ham
CPC classification number: B01D65/02 , C02F2103/04 , B01D61/145 , C02F1/444
Abstract: A method of cleaning an ultrafiltration membrane module includes installing an ultrafiltration membrane in an ultrafiltration membrane module, supplying deionized water to the ultrafiltration membrane module, and flushing the ultrafiltration membrane module with the deionized water by increasing decreasing a flow rate of the deionized water supplied to the ultrafiltration membrane module.
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公开(公告)号：US20230264997A1
公开(公告)日：2023-08-24
申请号：US18111160
申请日：2023-02-17
Applicant: Samsung Electronics Co., Ltd.
Inventor： Younhaeng Lee , Cheolmin Shin , Seungyong Yang , Wuyoung Choi , Changyeol Ham
CPC classification number: C02F9/00 , B01D19/0031 , B01D61/04 , B01D61/06 , B01D61/026 , C02F1/42
Abstract: An ultrapure water manufacturing facility includes: a first tank; a plurality of reverse osmosis membranes sequentially arranged downstream of the first tank; an electrodeionization device arranged downstream of the plurality of reverse osmosis membranes; an ion exchange resin tower arranged downstream of the electrodeionization device and filled with a boron selective resin; and a chemical supplier arranged between the plurality of reverse osmosis membranes and configured to supply a pH regulator to treatment-target water.
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公开(公告)号：US20230302502A1
公开(公告)日：2023-09-28
申请号：US18094820
申请日：2023-01-09
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Jongha YUN , Seyoon KIM , Juhui PARK , Jiyeon LEE , Cheolmin Shin
IPC: B08B3/14 , C02F1/28 , C02F1/44 , C02F1/42 , B01D61/08 , B01D61/02 , B01D63/02 , B01D15/36 , B08B3/02 , B08B13/00 , H01L21/67
CPC classification number: B08B3/14 , C02F1/283 , C02F1/441 , C02F1/42 , B01D61/08 , B01D61/02 , B01D63/02 , B01D15/361 , B08B3/022 , B08B13/00 , H01L21/67017 , C02F2209/40 , C02F2201/005 , C02F2103/04
Abstract: Ultrapure water supply apparatuses, substrate processing systems, and substrate processing methods are provided. An ultrapure water supply apparatus includes: a first supply device that produces first ultrapure water; a second supply device that produces second ultrapure water; a first reserved supply device that provides the second supply device with a portion of fluid in the first supply device; and a second reserved supply device that provides the first supply device with a portion of fluid in the second supply device. The first supply device includes a first front-side filtering part, a first rear-side filtering part, and a first connection part. The second supply device includes a second front-side filtering part, a second rear-side filtering part, and a second connection part. Each of the first and second reserved supply devices connects the first connection part and the second connection part to each other.
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