公开(公告)号：US20230264981A1

公开(公告)日：2023-08-24

申请号：US18083124

申请日：2022-12-16

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Younhaeng LEE ,  Cheolmin Shin ,  Changyeol Ham ,  Jieun Jang

IPC: C02F1/28 ,  C02F1/42 ,  C02F1/461 ,  C02F1/72 ,  C02F1/32 ,  C02F1/58

CPC classification number: C02F1/285 ,  C02F1/42 ,  C02F1/46104 ,  C02F1/72 ,  C02F1/32 ,  C02F1/58 ,  C02F2101/108

Abstract: A management method of a system for producing an ultrapure water, the system including a boron removal tower including an accommodation space through which water to be processed passes and a boron adsorption resin filling the accommodation space of the boron removal tower, and the boron removal tower including a plurality of sample ports through which a plurality of sample waters to be processed passing through portions having different heights of the boron adsorption resin, are respectively discharged, and determining a replacement cycle of the boron adsorption resin by increasing a passing flow rate of the boron removal tower.

公开(公告)号：US20240317622A1

公开(公告)日：2024-09-26

申请号：US18475898

申请日：2023-09-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Juhui PARK ,  Jongha YUN ,  Younhaeng LEE

IPC: C02F9/00 ,  H01L21/02 ,  H01L21/306

CPC classification number: C02F9/00 ,  H01L21/02041 ,  H01L21/30604 ,  H01L21/30625 ,  C02F1/20 ,  C02F1/283 ,  C02F1/325 ,  C02F1/42 ,  C02F2001/422 ,  C02F2101/10 ,  C02F2101/30 ,  C02F2103/04 ,  C02F2103/346 ,  C02F2201/326 ,  C02F2209/20 ,  C02F2209/22

Abstract: Disclosed are ultrapure water production systems, semiconductor processing systems, and semiconductor fabrication methods. An ultrapure water production system may include a front filtering part that filters a fluid and a rear filtering part that filters the fluid released from the front filtering part. The rear filtering part may include a UV irradiator that irradiates a UV ray to the fluid to remove an organic material from the fluid, an ANP that removes hydrogen peroxide from the fluid released from the UV irradiator, a connection line that connects the UV irradiator to the ANP, a hydrogen peroxide detector that is on the connection line and detects a concentration of hydrogen peroxide in the fluid released from the UV irradiator, and a DO detector between the hydrogen peroxide detector and the ANP to measure a concentration of dissolved oxygen in the fluid released from the UV irradiator.