Abstract:
A display device includes: a light emitting element on a base layer and including a first electrode, a second electrode, and a light emitting part electrically connected between the first electrode and the second electrode; a pixel defining layer on the base layer; a barrier layer on the pixel defining layer; and an electrode on the barrier layer, wherein the first electrode includes a (1_1)-th electrode and a (1_2)-th electrode, the pixel defining layer is between the (1_1)-th electrode and the (1_2)-th electrode, the light emitting part includes a first light emitting part electrically connected to the (1_1)-th electrode and a second light emitting part electrically connected to the (1_2)-th electrode, and the electrode and the barrier layer are between the first light emitting part and the second light emitting part in a plan view.
Abstract:
A method for manufacturing a display device according to an embodiment includes forming a first light emitting material layer on a substrate; forming a first photosensitive pattern on the first light emitting material layer; and forming a first emission layer according to a first dry etching process with the first photosensitive pattern as a mask, wherein the forming of a first photosensitive pattern includes irradiating vacuum ultraviolet rays to a photosensitive material layer.
Abstract:
A thin film transistor array panel includes: a gate line on a substrate and including a gate electrode; a first gate insulating layer on the substrate and the gate line, the first gate insulting layer including a first portion adjacent to the gate line and a second portion overlapping the gate line and having a smaller thickness than that of the first portion; a second gate insulating layer on the first gate insulating layer; a semiconductor layer on the second gate insulating layer; a source electrode and a drain electrode spaced apart from each other on the semiconductor layer; a passivation layer on the second gate insulating layer, the source electrode and the drain electrode; and a pixel electrode on the passivation layer and connected with the drain electrode. The first gate insulating layer and the second gate insulating layer have stress in opposite directions from each other.
Abstract:
A method of fabricating a mask includes defining cell areas and a mask frame area on a silicon substrate, the mask frame area excluding the cell areas, the mask frame area may include a mask rib region partitioning the cell areas and an outer frame region disposed at an outermost position of the silicon substrate, forming a groove in the mask rib region, forming a metal mask rib by forming a metal in the groove, forming a photoresist pattern including openings in each of the cell areas, growing a plating film in each of the cell areas, forming a mask membrane formed of the plating film by removing the photoresist pattern, and etching a rear surface of the silicon substrate to form cell openings associated with the cell areas, respectively.
Abstract:
A liquid crystal display includes: a substrate; a gate line and a data line disposed on the substrate; a semiconductor layer disposed on the substrate; first and second field generating electrodes disposed on the substrate; and a first protecting layer formed from the same layer as the first field generating electrode and covering at least a portion of the data line.
Abstract:
A deposition device may include a substrate supporter that supports a substrate; a source supply part that supplies a deposition material to the substrate; a deposition mask positioned between the substrate and the source supply part; and a light supply part that is detachably disposed or detachable to face the substrate via the deposition mask between the substrate and the light supply part.