公开(公告)号：US20240407245A1

公开(公告)日：2024-12-05

申请号：US18418645

申请日：2024-01-22

Applicant: Samsung Display Co., LTD.

Inventor： Jeong Kuk KIM ,  Sung Woon KIM ,  Sug Woo JUNG ,  Sung Won CHO

IPC: H10K71/16 ,  H10K50/11 ,  H10K59/12

Abstract: A deposition mask, method for manufacturing the same, and display device manufactured using the same. The deposition mask includes a mask substrate including an opening, and a mask pattern disposed on the mask substrate and including multiple hole patterns spaced apart from each other, wherein the mask pattern includes a first portion on the mask substrate, and a second portion protruding from the first portion in a direction opposite to the mask substrate, the second portion includes a first protruding portion and a second protruding portion disposed to be adjacent to the hole patterns, and a recessed portion disposed between the first protruding portion and the second protruding portion, and a height of the recessed portion may be smaller than heights of the first protruding portion and the second protruding portion.

公开(公告)号：US20250101626A1

公开(公告)日：2025-03-27

申请号：US18680397

申请日：2024-05-31

Applicant: Samsung Display Co., LTD.

Inventor： Jeong Kuk KIM ,  Jin Woo LEE ,  Sung Won CHO

IPC: C25D5/02 ,  C23C14/04 ,  C25D3/38 ,  C25D3/54 ,  C25D5/10 ,  C25D7/12

Abstract: A method of fabricating a deposition mask includes forming a wrinkle pattern in a mask rib region and including grooves by partially etching a front surface of a silicon substrate, forming a first photoresist pattern including first openings on a front surface of the silicon substrate in each of cell areas, growing a first plating film covering the grooves of the wrinkle pattern and a second plating film covering first openings of the first photoresist pattern, removing the first photoresist pattern, forming a second photoresist pattern in outer frame areas on a rear surface of the silicon substrate, and exposing a rear surface of metal mask ribs formed with the first plating film and a rear surface of a mask membrane formed with the second plating film by partially etching the rear surface of the silicon substrate using the second photoresist pattern.

公开(公告)号：US20240384388A1

公开(公告)日：2024-11-21

申请号：US18435058

申请日：2024-02-07

Applicant: Samsung Display Co., LTD.

Inventor： Duck Jung LEE ,  Jeong Kuk KIM ,  Sung Soon IM

IPC: C23C14/04

Abstract: A mask includes a body frame defining at least one opening arranged on a plane, at least one sub-mask overlapping the opening, and defining holes through which a deposition material is able to pass, and an aligner between the sub-mask and the body frame, and configured to move the sub-mask within the opening in response to applied voltages.

公开(公告)号：US20250075305A1

公开(公告)日：2025-03-06

申请号：US18642578

申请日：2024-04-22

Applicant: Samsung Display Co., LTD.

Inventor： Jin Woo LEE ,  Jeong Kuk KIM ,  Duck Jung LEE ,  Sug Woo JUNG ,  Sung Won CHO ,  Jun Ho JO

IPC: C23C14/04 ,  H10K71/16

Abstract: A method for manufacturing a deposition mask includes depositing a seed metal layer on a front surface of a silicon substrate, forming a first photoresist pattern defining first openings on the seed metal layer, growing a plating layer in the first openings of the first photoresist pattern, forming a mask membrane by removing the first photoresist pattern and leaving the plating layer, depositing a protection layer to cover a front surface of the mask membrane, forming a second photoresist pattern defining cell opening corresponding to unit masks, respectively, on a back surface of the silicon substrate, exposing the seed metal layer by etching the back surface of the silicon substrate using the second photoresist pattern as a mask, exposing a back surface of the mask membrane by etching the seed metal layer using the second photoresist pattern as a mask, and removing the protection layer.

公开(公告)号：US20250101567A1

公开(公告)日：2025-03-27

申请号：US18734300

申请日：2024-06-05

Applicant: Samsung Display Co., LTD.

Inventor： Jeong Kuk KIM ,  Young Min MOON ,  Jun Ho JO

IPC: C23C14/04 ,  C25D5/02 ,  C25D5/54 ,  H10K59/12

Abstract: A method of fabricating a mask includes defining cell areas and a mask frame area on a silicon substrate, the mask frame area excluding the cell areas, the mask frame area may include a mask rib region partitioning the cell areas and an outer frame region disposed at an outermost position of the silicon substrate, forming a groove in the mask rib region, forming a metal mask rib by forming a metal in the groove, forming a photoresist pattern including openings in each of the cell areas, growing a plating film in each of the cell areas, forming a mask membrane formed of the plating film by removing the photoresist pattern, and etching a rear surface of the silicon substrate to form cell openings associated with the cell areas, respectively.

公开(公告)号：US20250059637A1

公开(公告)日：2025-02-20

申请号：US18636359

申请日：2024-04-16

Applicant: Samsung Display Co., LTD.

Inventor： Jun Ho JO ,  Sung Woon KIM ,  Jeong Kuk KIM ,  Duck Jung LEE ,  Il Soo LEE ,  Jin Woo LEE ,  Sug Woo JUNG ,  Sung Won CHO

IPC: C23C14/04 ,  H10K59/12

Abstract: A deposition mask includes a mask body including a silicon substrate, where a plurality of holes is defined through the mask body, and the mask body further includes mask grids extending to define the holes. A cross section of each mask grid has a reverse tapered shape having a width increasing from a back surface to an upper surface of the deposition mask, and each side surface of each mask grid defining a hole includes a first concave curved surface.