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公开(公告)号:US10532377B2
公开(公告)日:2020-01-14
申请号:US14882902
申请日:2015-10-14
Applicant: Samsung Display Co., Ltd.
Inventor: Jaemin Hong , Hyunseung Kang , Hanul Kwen , Jeunghoon Kim , Hanyoung Kim , Younghoon Roh , Jihye Seo , Wooyoung Jung , Pilseon Ji
Abstract: A mask assembly for thin film deposition includes: a mask frame including an opening, the mask frame disposed surrounding the opening; and a mask unit including: first masks mounted on the mask frame, the first masks extending in a first direction; a second mask disposed on the first masks, the second mask including: one open hole; and at least one foreign substance discharge hole; and a third mask disposed on the second mask, the third mask extending in a second direction and including deposition holes, wherein the second direction crosses the first direction, and wherein a substrate is disposed on the third mask.
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公开(公告)号:US09780305B2
公开(公告)日:2017-10-03
申请号:US14576394
申请日:2014-12-19
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Hanul Kwen , Junghoon Kim , Hanyoung Kim , Younghoon Roh , Wooyoung Jung , Cheolgyu Jeong , Pilseon Ji , Jaemin Hong
CPC classification number: H01L51/0011 , C23C14/042 , C23C16/042 , H01L51/56
Abstract: Provided is a mask frame assembly for thin film deposition. The mask frame assembly includes a mask frame having an opening surrounded by the mask frame; and a support extending across the opening to support a mask on the mask frame. The support includes a support body, a plurality of ribs in the support body, and one or more patterned portions in spaces between the plurality of ribs, the one or more patterned portions having a different thickness than the ribs.
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公开(公告)号:US20160296966A1
公开(公告)日:2016-10-13
申请号:US14882902
申请日:2015-10-14
Applicant: Samsung Display Co., Ltd.
Inventor: Jaemin HONG , Hyunseung Kang , Hanul Kwen , Jeunghoon Kim , Hanyoung Kim , Younghoon Roh , Jihye Seo , Wooyoung Jung , Pilseon Ji
IPC: B05D1/32
Abstract: A mask assembly for thin film deposition includes: a mask frame including an opening, the mask frame disposed surrounding the opening; and a mask unit including: first masks mounted on the mask frame, the first masks extending in a first direction; a second mask disposed on the first masks, the second mask including: one open hole; and at least one foreign substance discharge hole; and a third mask disposed on the second mask, the third mask extending in a second direction and including deposition holes, wherein the second direction crosses the first direction, and wherein a substrate is disposed on the third mask.
Abstract translation: 用于薄膜沉积的掩模组件包括:掩模框架,其包括开口,所述掩模框架围绕所述开口设置; 以及掩模单元,包括:安装在所述掩模框架上的第一掩模,所述第一掩模沿第一方向延伸; 设置在所述第一掩模上的第二掩模,所述第二掩模包括:一个开孔; 和至少一个异物排出孔; 以及设置在所述第二掩模上的第三掩模,所述第三掩模在第二方向上延伸并且包括沉积孔,其中所述第二方向跨越所述第一方向,并且其中在所述第三掩模上设置衬底。
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