公开(公告)号：US10532377B2

公开(公告)日：2020-01-14

申请号：US14882902

申请日：2015-10-14

Applicant: Samsung Display Co., Ltd.

Inventor： Jaemin Hong ,  Hyunseung Kang ,  Hanul Kwen ,  Jeunghoon Kim ,  Hanyoung Kim ,  Younghoon Roh ,  Jihye Seo ,  Wooyoung Jung ,  Pilseon Ji

IPC: B05D1/32 ,  B05C21/00 ,  C23C14/04 ,  B05B12/20

Abstract: A mask assembly for thin film deposition includes: a mask frame including an opening, the mask frame disposed surrounding the opening; and a mask unit including: first masks mounted on the mask frame, the first masks extending in a first direction; a second mask disposed on the first masks, the second mask including: one open hole; and at least one foreign substance discharge hole; and a third mask disposed on the second mask, the third mask extending in a second direction and including deposition holes, wherein the second direction crosses the first direction, and wherein a substrate is disposed on the third mask.

公开(公告)号：US20160296966A1

公开(公告)日：2016-10-13

申请号：US14882902

申请日：2015-10-14

Applicant: Samsung Display Co., Ltd.

Inventor： Jaemin HONG ,  Hyunseung Kang ,  Hanul Kwen ,  Jeunghoon Kim ,  Hanyoung Kim ,  Younghoon Roh ,  Jihye Seo ,  Wooyoung Jung ,  Pilseon Ji

IPC: B05D1/32

Abstract: A mask assembly for thin film deposition includes: a mask frame including an opening, the mask frame disposed surrounding the opening; and a mask unit including: first masks mounted on the mask frame, the first masks extending in a first direction; a second mask disposed on the first masks, the second mask including: one open hole; and at least one foreign substance discharge hole; and a third mask disposed on the second mask, the third mask extending in a second direction and including deposition holes, wherein the second direction crosses the first direction, and wherein a substrate is disposed on the third mask.

Abstract translation: 用于薄膜沉积的掩模组件包括：掩模框架，其包括开口，所述掩模框架围绕所述开口设置; 以及掩模单元，包括：安装在所述掩模框架上的第一掩模，所述第一掩模沿第一方向延伸; 设置在所述第一掩模上的第二掩模，所述第二掩模包括：一个开孔; 和至少一个异物排出孔; 以及设置在所述第二掩模上的第三掩模，所述第三掩模在第二方向上延伸并且包括沉积孔，其中所述第二方向跨越所述第一方向，并且其中在所述第三掩模上设置衬底。