-
公开(公告)号:US09780305B2
公开(公告)日:2017-10-03
申请号:US14576394
申请日:2014-12-19
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Hanul Kwen , Junghoon Kim , Hanyoung Kim , Younghoon Roh , Wooyoung Jung , Cheolgyu Jeong , Pilseon Ji , Jaemin Hong
CPC classification number: H01L51/0011 , C23C14/042 , C23C16/042 , H01L51/56
Abstract: Provided is a mask frame assembly for thin film deposition. The mask frame assembly includes a mask frame having an opening surrounded by the mask frame; and a support extending across the opening to support a mask on the mask frame. The support includes a support body, a plurality of ribs in the support body, and one or more patterned portions in spaces between the plurality of ribs, the one or more patterned portions having a different thickness than the ribs.
-
2.
公开(公告)号:US20160167083A1
公开(公告)日:2016-06-16
申请号:US14719155
申请日:2015-05-21
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Jeunghoon Kim , Yoonchan Oh , Jangwoo Kim , Heeseak Noh , Bongjun Park , Taeyong An , Daesik Jang , Cheolgyu Jeong , Jaemin Hong
CPC classification number: B05B12/20 , B05C21/005 , C23C14/042 , H01L51/0011 , H01L51/56
Abstract: A mask frame assembly includes a frame and a mask including a pattern portion having a pattern hole and a shape memory alloy portion. A method of manufacturing a mask frame assembly includes forming a pattern portion having a pattern hole and a shape memory alloy portion on a mask, the shape memory alloy portion extending in a first direction at a deposition temperature, and coupling the mask to a frame by extending the mask at a room temperature in a second direction perpendicular to the first direction.
Abstract translation: 荫罩框架组件包括框架和掩模,其包括具有图形孔的图案部分和形状记忆合金部分。 一种掩模框架组件的制造方法包括在掩模上形成具有图案孔和形状记忆合金部分的图案部分,所述形状记忆合金部分在沉积温度下沿第一方向延伸,并将所述掩模与框架相连 在垂直于第一方向的第二方向上在室温下延伸掩模。
-