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公开(公告)号:US11148247B2
公开(公告)日:2021-10-19
申请号:US15664166
申请日:2017-07-31
Applicant: Samsung Display Co., Ltd.
Inventor: Hyun Jin Cho , Joon-Hwa Bae , Byoung Kwon Choo , Byung Hoon Kang , Jun Hyuk Cheon , Jeong-Hye Choi , Young Ho Jeong , Woo Jin Cho
IPC: B24B37/34 , B24B53/017 , B24B37/10
Abstract: A substrate polishing system includes: a polishing machine and a substrate transporter. The polishing machine includes: a lower surface plate to which a substrate is mounted, and an upper surface plate which faces the lower surface plate and polishes the substrate in cooperation with the lower surface plate, the upper surface plate having a larger area than the substrate mounted on the lower surface plate. The substrate transporter is adjacent to the polishing machine and commonly transports the substrate to and from the polishing machine in a first direction, attaches the substrate to the lower surface plate before polishing thereof, and separates from the lower surface plate the substrate after polishing thereof.
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公开(公告)号:US20190189973A1
公开(公告)日:2019-06-20
申请号:US16155413
申请日:2018-10-09
Applicant: Samsung Display Co., Ltd.
Inventor: Byung Hoon Kang , Seung Jun Moon , Hee Kyun Shin , Min-Woo Lee , Woo Jin Cho
CPC classification number: H01L51/56 , H01L51/003 , H01L51/0097 , H01L51/5237 , H01L2251/5338
Abstract: A method for manufacturing a transparent display device includes: providing a transparent flexible substrate on a support substrate; forming a display unit on a front side of the transparent flexible substrate; separating the transparent flexible substrate from the support substrate; and cleaning a rear side of the transparent flexible substrate with plasma.
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公开(公告)号:US20180136095A1
公开(公告)日:2018-05-17
申请号:US15816943
申请日:2017-11-17
Applicant: Samsung Display Co., Ltd.
Inventor: Cheol Min Park , Jeong Woo Park , Seung Kim , Seung Ho Kim , Hoi Kwan Lee , Woo Jin Cho , Hee Kyun Shin , Hyun Joon Oh
IPC: G01N1/30 , G01N21/958
Abstract: A method of detecting defects of a glass substrate includes cutting a glass mother substrate into a plurality of glass substrates, penetrating ions into an incision surface of the glass substrate to visualize defects of the incision surface, and photographing the defects of the incision surface to determine a bending strength of the glass substrate based on a size of the defects.
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公开(公告)号:US12225809B2
公开(公告)日:2025-02-11
申请号:US17029855
申请日:2020-09-23
Applicant: Samsung Display Co., LTD. , DONGJIN SEMICHEM CO., LTD.
Inventor: Hee Kyun Shin , Dong Kyun Seo , Jun Ho Sim , Woo Jin Cho , Byung Hoon Kang , Seung Jun Moon , Sun Chan Park , Hee Won Seo , Ji Eun Cho , Kyu Soon Shin
Abstract: The present disclosure is directed to a coating composition including a graphene oxide and a solvent. At least one of a carboxyl group and an epoxide group of the graphene oxide is functionalized by an amine. The amine has an activation energy to an epoxide group of the graphene oxide of about −3 kcal/mol to about 8 kcal/mol. A method of forming a stacked structure using the coating composition is provided. A method of manufacturing a display device using the coating composition is provided.
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公开(公告)号:US10481053B2
公开(公告)日:2019-11-19
申请号:US15816943
申请日:2017-11-17
Applicant: Samsung Display Co., Ltd.
Inventor: Cheol Min Park , Jeong Woo Park , Seung Kim , Seung Ho Kim , Hoi Kwan Lee , Woo Jin Cho , Hee Kyun Shin , Hyun Joon Oh
IPC: G01N1/30 , G01N21/958 , G01N21/91 , C03C15/00 , C03C19/00 , C03C23/00 , G02F1/13 , G02F1/1333 , H01L51/00
Abstract: A method of detecting defects of a glass substrate includes cutting a glass mother substrate into a plurality of glass substrates, penetrating ions into an incision surface of the glass substrate to visualize defects of the incision surface, and photographing the defects of the incision surface to determine a bending strength of the glass substrate based on a size of the defects.
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公开(公告)号:US20190140216A1
公开(公告)日:2019-05-09
申请号:US15967750
申请日:2018-05-01
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Hee Kyun Shin , Seung Jun Moon , Byung Hoon Kang , Min Woo Lee , Woo Jin Cho
Abstract: A display device includes a base, a light emitting device on a first surface of the base, and a plate-like inorganic layer on a second surface of the base, the plate-like inorganic layer including a first plate-like inorganic particle with a first size and a second plate-like inorganic particle with a second size different from the first size.
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公开(公告)号:US11832503B2
公开(公告)日:2023-11-28
申请号:US17149964
申请日:2021-01-15
Applicant: Samsung Display Co. Ltd.
Inventor: Hee Kyun Shin , Seung Jun Moon , Byung Hoon Kang , Min Woo Lee , Woo Jin Cho
IPC: B32B5/16 , H10K71/00 , B32B7/12 , H10K71/80 , H10K77/10 , H10K50/844 , H10K59/12 , H10K102/00
CPC classification number: H10K71/00 , B32B5/16 , B32B7/12 , H10K71/80 , H10K77/111 , B32B2264/102 , B32B2457/206 , H10K50/8445 , H10K59/12 , H10K59/1201 , H10K2102/311
Abstract: A display device includes a base, a light emitting device on a first surface of the base, and a plate-like inorganic layer on a second surface of the base, the plate-like inorganic layer including a first plate-like inorganic particle with a first size and a second plate-like inorganic particle with a second size different from the first size.
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公开(公告)号:US20210327927A1
公开(公告)日:2021-10-21
申请号:US17074947
申请日:2020-10-20
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: YONG-HWAN RYU , Woo Jin Cho , Jong-Hyun Choung , Jae Uoon Kim , Sun-Jin Song , Hyun Duck Cho
Abstract: A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.
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公开(公告)号:US10204935B2
公开(公告)日:2019-02-12
申请号:US15702797
申请日:2017-09-13
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Hyun Jin Cho , Joon-Hwa Bae , Byoung Kwon Choo , Byung Hoon Kang , Kwang Suk Kim , Woo Jin Cho , Jun Hyuk Cheon
IPC: H01L27/12 , B24B31/00 , C09G1/02 , H01L21/3105 , H01L21/66 , G09G3/3233 , H01L21/02 , H01L27/32 , H01L29/786
Abstract: A method for manufacturing a display device includes forming a first gate metal wire on a substrate, forming a first insulation layer that covers the first gate metal wire, forming a second gate metal wire on the first insulation layer, forming a second main insulation layer that covers the second gate metal wire, forming a second auxiliary insulation layer on the second main insulation layer, forming an exposed portion of an upper surface of the second main insulation layer by polishing the second auxiliary insulation layer, and forming a first data metal wire on the second main insulation layer and the second auxiliary insulation layer.
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公开(公告)号:US10043860B2
公开(公告)日:2018-08-07
申请号:US15605431
申请日:2017-05-25
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Byung Hoon Kang , Kwang Suk Kim , Joon-Hwa Bae , Woo Jin Cho , Hyun Jin Cho , Jun Hyuk Cheon , Byoung Kwon Choo
Abstract: A method of manufacturing a display device includes: forming an active layer on a substrate; forming a first insulation layer covering the active layer; forming a gate metal line on the first insulation layer; forming a third insulation layer covering the gate metal line and including a silicon oxide; forming a fourth insulation layer including a silicon nitride on the third insulation layer; forming a fifth insulation layer including a silicon oxide on the fourth insulation layer; arranging a blocking member over a region in which the active layer and the gate metal line overlap; forming a fifth auxiliary insulation layer by doping nitrogen ions in the fifth insulation layer; and exposing a part of an upper surface of the fourth insulation layer by removing a portion of a fifth main insulation layer of the fifth insulation layer which does not overlap the fifth auxiliary insulation layer.
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