Abstract:
A substrate polishing system includes: a polishing machine and a substrate transporter. The polishing machine includes: a lower surface plate to which a substrate is mounted, and an upper surface plate which faces the lower surface plate and polishes the substrate in cooperation with the lower surface plate, the upper surface plate having a larger area than the substrate mounted on the lower surface plate. The substrate transporter is adjacent to the polishing machine and commonly transports the substrate to and from the polishing machine in a first direction, attaches the substrate to the lower surface plate before polishing thereof, and separates from the lower surface plate the substrate after polishing thereof.
Abstract:
The present invention discloses an alignment substrate that includes a base substrate and an alignment layer arranged on the base substrate. A plurality of unit pixels is defined in the base substrate. The alignment layer includes at least two sub-alignment portions dividing the unit pixel into at least two domains. Each sub-alignment portion is arranged in a different domain of the at least two domains and is aligned to have a different pretilt direction from the other sub-alignment portions.
Abstract:
A photoalignment material includes an alignment polymer, a photoalignment additive including a compound represented by the following Chemical Formula 1 and an organic solvent. In Chemical Formula 1, R1 represents a cyclic compound. A and B independently represent a single bond or —(CnH2n)—. “n” represents an integer in a range of 1 to 12. Each —CH2— of A and/or B may be replaced with R3 represents an alkyl group having 1 to 12 carbon atoms, and each —CH2— of A and/or B may be replaced with —O—. R4 represents In Chemical Formula 1, each hydrogen atom excluding hydrogen atoms of R4 may be replaced with chlorine (Cl) or fluorine (F).
Abstract translation:光取向材料包括取向聚合物,包含由以下化学式1表示的化合物和有机溶剂的光对准添加剂。 在化学式1中,R 1表示环状化合物。 A和B独立地表示单键或 - (C n H 2n) - 。 “n”表示1〜12的整数.A和/或B的-CH 2 - 可以被R 3代替,R 3表示碳原子数1〜12的烷基,A和/或 B可以用-O-代替。 R4表示在化学式1中,除了R4的氢原子以外的各个氢原子可以被氯(Cl)或氟(F)代替。
Abstract:
A photoalignment material includes an alignment polymer, a photoalignment additive including a compound represented by the following Chemical Formula 1 and an organic solvent. In Chemical Formula 1, R1 represents a cyclic compound. A and B independently represent a single bond or —(CnH2n)—. “n” represents an integer in a range of 1 to 12. Each —CH2— of A and/or B may be replaced with R3 represents an alkyl group having 1 to 12 carbon atoms, and each —CH2— of A and/or B may be replaced with —O—. R4 represents In Chemical Formula 1, each hydrogen atom excluding hydrogen atoms of R4 may be replaced with chlorine (Cl) or fluorine (F).
Abstract translation:光取向材料包括取向聚合物,包含由以下化学式1表示的化合物和有机溶剂的光对准添加剂。 在化学式1中,R 1表示环状化合物。 A和B独立地表示单键或 - (C n H 2n) - 。 n表示1至12范围内的整数.A和/或B的每个-CH 2可以被R 3代替,R 3表示具有1至12个碳原子的烷基,A和/或B的每个-CH 2可以 用-O-代替。 R4表示在化学式1中,除了R4的氢原子以外的各个氢原子可以被氯(Cl)或氟(F)代替。